Patents by Inventor Takanobu Ishihara
Takanobu Ishihara has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20140034684Abstract: A target supply apparatus includes a tank for storing a liquid target material, a nozzle for outputting the liquid target material in the tank, and a gas supply source for supplying gas into the tank, and controls a gas pressure inside the tank with a pressure of the gas supplied from the gas supply source which is provided with a pressure regulator. The target supply apparatus also includes a pressure-decrease gas passage of which one end is connected to the tank and the other end forms an exhaust port, a pressure-decrease valve provided on the pressure-decrease gas passage, and a controller for controlling open/close of the pressure-decrease valve. The controller, when the target material is caused not to output from the nozzle, opens the pressure-decrease valve and decreases the pressure inside the tank.Type: ApplicationFiled: October 7, 2013Publication date: February 6, 2014Applicants: CKD CORPORATION, GIGAPHOTON, INC.Inventors: Takanobu ISHIHARA, Hiroshi ITAFUJI
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Patent number: 8629417Abstract: An extreme ultraviolet light generation apparatus used in combination with a laser system, the apparatus may include: a chamber provided with at least one inlet port for introducing a laser beam outputted from the laser system into the chamber; a target supply unit provided to the chamber for supplying a target material to a predetermined region inside the chamber, where the target material is irradiated with the laser beam; at least one optical element disposed inside the chamber; a magnetic field generation unit for generating a magnetic field around the predetermined region; an ion collection unit disposed in a direction of a line of magnetic force of the magnetic field for collection an ion which is generated when the target material is irradiated with the laser beam and is flowing along the line of magnetic force; and a gas introduction unit for introducing an etching gas into the chamber.Type: GrantFiled: July 2, 2012Date of Patent: January 14, 2014Assignee: Gigaphoton Inc.Inventors: Shinji Nagai, Tamotsu Abe, Takanobu Ishihara, Osamu Wakabayashi
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Patent number: 8604451Abstract: A target supply apparatus controls a gas pressure inside a tank storing a liquid target material to be outputted from a nozzle by a pressure of gas supplied from a gas supply having a pressure regulator. The target supply apparatus comprises a gas passage introducing gas supplied from the gas supply into the tank, and a high-precision pressure regulator arranged on the gas passage and regulating a pressure of gas flowing the gas passage. The high-precision pressure regulator is able to regulate pressure with accuracy higher than the pressure regulator.Type: GrantFiled: December 18, 2009Date of Patent: December 10, 2013Assignee: Gigaphoton Inc.Inventors: Takayuki Yabu, Masaki Nakano, Hitoshi Nagano, Takanobu Ishihara
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Patent number: 8581220Abstract: A target supply apparatus includes a tank for storing a liquid target material, a nozzle for outputting the liquid target material in the tank, and a gas supply source for supplying gas into the tank, and controls a gas pressure inside the tank with a pressure of the gas supplied from the gas supply source which is provided with a pressure regulator. The target supply apparatus also includes a pressure-decrease gas passage of which one end is connected to the tank and the other end forms an exhaust port, a pressure-decrease valve provided on the pressure-decrease gas passage, and a controller for controlling open/close of the pressure-decrease valve. The controller, when the target material is caused not to output from the nozzle, opens the pressure-decrease valve and decreases the pressure inside the tank.Type: GrantFiled: December 23, 2009Date of Patent: November 12, 2013Assignees: Gigaphoton Inc., CDK CorporationInventors: Takanobu Ishihara, Hiroshi Itafuji
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Patent number: 8569723Abstract: An extreme ultraviolet light source apparatus has a magnetic field generator which generates a magnetic field region around a direction of the magnetic field passing through a plasma region in which a plasma is to be generated and converges charged particles including ion emitted from the plasma region toward the direction of the magnetic field, a first charged particle collector (receiver) mounted at both sides of an axis of the magnetic field in the magnetic field region in order to collect (receive) the charged particles converged by the magnetic field, a target supply unit supplying a target from a nozzle located outside a converging region in which the charged particles are to be converged inside the magnetic field region in an extreme ultraviolet light generating chamber, and a target collector located at a position opposite to the nozzle, the target retrieval portion retrieving a residual target which does not contribute to generation of the plasma.Type: GrantFiled: July 14, 2011Date of Patent: October 29, 2013Assignee: Gigaphoton Inc.Inventors: Shinji Nagai, Takanobu Ishihara, Kouji Kakizaki, Tamotsu Abe
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Publication number: 20130240645Abstract: A target supply device may include a tank formed cylindrically with a first material, a cylindrical portion for covering the tank, the cylindrical portion being formed of a second material having higher tensile strength than the first material, a first lid formed of the second material and having a through-hole, the first lid being provided at one end in an axial direction of the cylindrical portion, a second lid formed of the second material and provided at another end opposite the one end in the axial direction of the cylindrical portion, and a nozzle provided to be in fluid communication with the interior of the tank and to pass through the through-hole, the nozzle being formed of the first material.Type: ApplicationFiled: December 14, 2012Publication date: September 19, 2013Applicant: GIGAPHOTON INCInventors: Takanobu Ishihara, Toshihiro Nishisaka, Hiroshi Someya, Osamu Wakabayashi
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Patent number: 8530869Abstract: An extreme ultraviolet light source apparatus comprises a target supply unit supplying a target into a vacuum chamber, a laser oscillator outputting a laser light into the vacuum chamber, a collector mirror outputting an extreme ultraviolet light outside by reflecting the extreme ultraviolet light emitted from the target being ionized as a plasma by irradiation with the laser light at a plasma luminescence point in the vacuum chamber, and an ion debris removal unit at least a part of which is located in an obscuration region including the plasma luminescence point.Type: GrantFiled: July 15, 2011Date of Patent: September 10, 2013Assignees: Gigaphoton Inc., Ebara Corporation, Kabushiki Kaisha TopconInventors: Shinji Nagai, Takanobu Ishihara, Kouji Kakizaki, Hiroshi Sobukawa, Takeshi Murakami, Masahiro Inoue
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Patent number: 8507883Abstract: An extreme ultraviolet light source apparatus provided with a magnetic field forming unit having sufficient capability of protection against ions radiated from plasma while using a relatively small magnetic source. The apparatus includes: a target nozzle for injecting a target material; a driver laser for applying a laser beam to the target material to generate plasma; a collector mirror for collecting extreme ultraviolet light radiated from the plasma; and a magnetic field forming unit including at least one magnetic source and at least one magnetic material having two leading end parts projecting from the at least one magnetic source to face each other with a plasma emission point in between, and forming a magnetic field between a trajectory of the target material and the collector mirror.Type: GrantFiled: September 15, 2009Date of Patent: August 13, 2013Assignee: Gigaphoton Inc.Inventors: Akira Endo, Hideo Hoshino, Kouji Kakizaki, Tamotsu Abe, Akira Sumitani, Takanobu Ishihara, Shinji Nagai, Osamu Wakabayashi, Hakaru Mizoguchi
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Patent number: 8343429Abstract: In a target supply unit of an extreme ultraviolet light source apparatus for generating extreme ultraviolet light by applying a laser beam to a target material to turn the target material into plasma, clogging of a target nozzle for supplying the target material to a laser beam application point is suppressed. The target supply unit includes: a target container for accommodating the target material; a target nozzle for injecting the target material supplied from the target container; and a reducing gas supply unit for supplying a reducing gas into the target container. Instead of using the reducing gas, a carbon-based material having a reduction action may be provided within the target container for causing reduction reaction.Type: GrantFiled: October 19, 2009Date of Patent: January 1, 2013Assignee: Gigaphoton Inc.Inventors: Takayuki Yabu, Takanobu Ishihara, Masaki Nakano
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Publication number: 20120311969Abstract: In a target supply unit of an extreme ultraviolet light source apparatus for generating extreme ultraviolet light by applying a laser beam to a target material to turn the target material into plasma, clogging of a target nozzle for supplying the target material to a laser beam application point is suppressed. The target supply unit includes: a target container for accommodating the target material; a target nozzle for injecting the target material supplied from the target container; and a reducing gas supply unit for supplying a reducing gas into the target container. Instead of using the reducing gas, a carbon-based material having a reduction action may be provided within the target container for causing reduction reaction.Type: ApplicationFiled: August 21, 2012Publication date: December 13, 2012Inventors: Takayuki Yabu, Takanobu Ishihara, Masaki Nakano
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Publication number: 20120267553Abstract: An extreme ultraviolet light generation apparatus used in combination with a laser system, the apparatus may include: a chamber provided with at least one inlet port for introducing a laser beam outputted from the laser system into the chamber; a target supply unit provided to the chamber for supplying a target material to a predetermined region inside the chamber, where the target material is irradiated with the laser beam; at least one optical element disposed inside the chamber; a magnetic field generation unit for generating a magnetic field around the predetermined region; an ion collection unit disposed in a direction of a line of magnetic force of the magnetic field for collection an ion which is generated when the target material is irradiated with the laser beam and is flowing along the line of magnetic force; and a gas introduction unit for introducing an etching gas into the chamber.Type: ApplicationFiled: July 2, 2012Publication date: October 25, 2012Applicant: Gigaphoton Inc.Inventors: Shinji NAGAI, Tamotsu ABE, Takanobu ISHIHARA, Osamu WAKABAYASHI
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Publication number: 20120217422Abstract: An apparatus, configured to generate extreme ultraviolet light by irradiating a target material by a laser beam from a laser apparatus to turn the target material into plasma, includes a chamber with an inlet for introducing the laser beam into the chamber, the chamber including an electrically conductive structural member; and a target generator including an electrode having a first through-hole through which a charged target passes, an electrical insulator for holding the electrode, and a shielding member having a second through-hole, through which the charged target passes, the shielding member being positioned between a plasma generation region and at least the electrical insulator. The target generator generates the charged target of a liquid target material and output the charged target toward the plasma generation region inside the chamber, and the shielding member has electrically conductive properties and is connected electrically to the electrically conductive structural member of the chamber.Type: ApplicationFiled: February 14, 2012Publication date: August 30, 2012Inventors: Takayuki YABU, Kouji Kakizaki, Takanobu Ishihara, Tamotsu Abe, Osamu Wakabayashi
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Patent number: 8242474Abstract: An extreme ultraviolet light generation apparatus used in combination with a laser system, the apparatus may include: a chamber provided with at least one inlet port for introducing a laser beam outputted from the laser system into the chamber; a target supply unit provided to the chamber for supplying a target material to a predetermined region inside the chamber, where the target material is irradiated with the laser beam; at least one optical element disposed inside the chamber; a magnetic field generation unit for generating a magnetic field around the predetermined region; an ion collection unit disposed in a direction of a line of magnetic force of the magnetic field for collection an ion which is generated when the target material is irradiated with the laser beam and is flowing along the line of magnetic force; and a gas introduction unit for introducing an etching gas into the chamber.Type: GrantFiled: February 22, 2011Date of Patent: August 14, 2012Assignee: Gigaphoton Inc.Inventors: Shinji Nagai, Tamotsu Abe, Takanobu Ishihara, Osamu Wakabayashi
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Publication number: 20110284774Abstract: A target output device may include: a main body for storing a target material; a nozzle unit, connected to the main body, for outputting the target material as a target; an electrode unit provided so as to face the nozzle unit; a voltage control unit that applies predetermined voltage between the electrode unit and the target material to generate electrostatic force therebetween for pulling out the target material through the nozzle unit; a pressure control unit that applies predetermined pressure to the target material; and an output control unit that causes the target to be outputted through the nozzle unit by controlling signal output timing of each of a first timing signal and a second timing signal, the first timing signal causing the voltage control unit to apply the predetermined voltage between the target material and the electrode unit at first timing, and the second timing signal causing the pressure control unit to apply the predetermined pressure to the target material at second timing.Type: ApplicationFiled: July 28, 2011Publication date: November 24, 2011Applicant: GIGAPHOTON INC.Inventors: Takanobu ISHIHARA, Youichi Sasaki, Kouji Kakizaki, Masahiro Inoue, Takayuki Yabu, Hideo Hoshino
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Publication number: 20110266467Abstract: An extreme ultraviolet light source apparatus has a magnetic field generator which generates a magnetic field region around a direction of the magnetic field passing through a plasma region in which a plasma is to be generated and converges charged particles including ion emitted from the plasma region toward the direction of the magnetic field, a first charged particle collector (receiver) mounted at both sides of an axis of the magnetic field in the magnetic field region in order to collect (receive) the charged particles converged by the magnetic field, a target supply unit supplying a target from a nozzle located outside a converging region in which the charged particles are to be converged inside the magnetic field region in an extreme ultraviolet light generating chamber, and a target collector located at a position opposite to the nozzle, the target retrieval portion retrieving a residual target which does not contribute to generation of the plasma.Type: ApplicationFiled: July 14, 2011Publication date: November 3, 2011Applicant: Gigaphoton Inc.Inventors: Shinji NAGAI, Takanobu Ishihara, Kouji Kakizaki, Tamotsu Abe
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Publication number: 20110266468Abstract: An extreme ultraviolet light source apparatus comprises a target supply unit supplying a target into a vacuum chamber, a laser oscillator outputting a laser light into the vacuum chamber, a collector mirror outputting an extreme ultraviolet light outside by reflecting the extreme ultraviolet light emitted from the target being ionized as a plasma by irradiation with the laser light at a plasma luminescence point in the vacuum chamber, and an ion debris removal unit at least a part of which is located in an obscuration region including the plasma luminescence point.Type: ApplicationFiled: July 15, 2011Publication date: November 3, 2011Applicants: Gigaphoton Inc., Kabushiki Kaisha Topcon, Ebara CorporationInventors: Shinji NAGAI, Takanobu Ishihara, Kouji Kakizaki, Hiroshi Sobukawa, Takeshi Murakami, Masahiro Inoue
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Publication number: 20110204249Abstract: An extreme ultraviolet light generation apparatus used in combination with a laser system, the apparatus may include: a chamber provided with at least one inlet port for introducing a laser beam outputted from the laser system into the chamber; a target supply unit provided to the chamber for supplying a target material to a predetermined region inside the chamber, where the target material is irradiated with the laser beam; at least one optical element disposed inside the chamber; a magnetic field generation unit for generating a magnetic field around the predetermined region; an ion collection unit disposed in a direction of a line of magnetic force of the magnetic field for collection an ion which is generated when the target material is irradiated with the laser beam and is flowing along the line of magnetic force; and a gas introduction unit for introducing an etching gas into the chamber.Type: ApplicationFiled: February 22, 2011Publication date: August 25, 2011Inventors: Shinji NAGAI, Tamotsu Abe, Takanobu Ishihara, Osamu Wakabayashi
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Patent number: 8003963Abstract: An extreme ultraviolet light source apparatus comprises a target supply unit supplying a target into a vacuum chamber, a laser oscillator outputting a laser light into the vacuum chamber, a collector mirror outputting an extreme ultraviolet light outside by reflecting the extreme ultraviolet light emitted from the target being ionized as a plasma by irradiation with the laser light at a plasma luminescence point in the vacuum chamber, and an ion debris removal unit at least a part of which is located in an obscuration region including the plasma luminescence point.Type: GrantFiled: October 26, 2009Date of Patent: August 23, 2011Assignees: Gigaphton Inc., Ebara Corporation, Kabushiki Kaisha TopconInventors: Shinji Nagai, Takanobu Ishihara, Kouji Kakizaki, Hiroshi Sobukawa, Takeshi Murakami, Masahiro Inoue
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Patent number: 7999241Abstract: An extreme ultraviolet light source apparatus has a magnetic field generator which generates a magnetic field region around a direction of the magnetic field passing through a plasma region in which a plasma is to be generated and converges charged particles including ion emitted from the plasma region toward the direction of the magnetic field, a first charged particle collector (receiver) mounted at both sides of an axis of the magnetic field in the magnetic field region in order to collect (receive) the charged particles converged by the magnetic field, a target supply unit supplying a target from a nozzle located outside a converging region in which the charged particles are to be converged inside the magnetic field region in an extreme ultraviolet light generating chamber, and a target collector located at a position opposite to the nozzle, the target retrieval portion retrieving a residual target which does not contribute to generation of the plasma.Type: GrantFiled: October 23, 2009Date of Patent: August 16, 2011Assignee: Gigaphoton Inc.Inventors: Shinji Nagai, Takanobu Ishihara, Kouji Kakizaki, Tamotsu Abe
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Publication number: 20100213275Abstract: A target supply apparatus includes a tank for storing a liquid target material, a nozzle for outputting the liquid target material in the tank, and a gas supply source for supplying gas into the tank, and controls a gas pressure inside the tank with a pressure of the gas supplied from the gas supply source which is provided with a pressure regulator. The target supply apparatus also includes a pressure-decrease gas passage of which one end is connected to the tank and the other end forms an exhaust port, a pressure-decrease valve provided on the pressure-decrease gas passage, and a controller for controlling open/close of the pressure-decrease valve. The controller, when the target material is caused not to output from the nozzle, opens the pressure-decrease valve and decreases the pressure inside the tank.Type: ApplicationFiled: December 23, 2009Publication date: August 26, 2010Inventors: Takanobu ISHIHARA, Hiroshi Itafuji