Abstract: A system comprises a substrate 4, an incident optical waveguide 5 formed on the substrate for receiving a light beam incident thereto, two phase-shift optical waveguides 6 formed on the substrate 4 to be branched from the incident optical waveguide 4 for varying a phase of a transmitted light beam in response to an electric field intensity, an outgoing optical waveguide 7 formed on the substrate 4 to join the phase-shift optical waveguides 6. At least one of the phase-shift optical waveguides 6 has a reversely polarized portion 8 reversely polarized. A light transmission film may be formed at one or a plurality of portions on the phase-shift optical waveguides 6. A buffer layer 14 may be formed on a part on or in the vicinity of the phase-shift optical waveguides 6. A transparent substance film for imparting a stress to one of the phase-shift optical waveguides 6 may be formed on a part or a whole of a portion without the buffer layer 14.

Abstract: A system comprises a substrate 4, an incident optical waveguide 5 formed on the substrate for receiving a light beam incident thereto, two phase-shift optical waveguides 6 formed on the substrate 4 to be branched from the incident optical waveguide 4 for varying a phase of a transmitted light beam in response to an electric field intensity, an outgoing optical waveguide 7 formed on the substrate 4 to join the phase-shift optical waveguides 6. At least one of the phase-shift optical waveguides 6 has a reversely polarized portion 8 reversely polarized. A light transmission film may be formed at one or a plurality of portions on the phase-shift optical waveguides 6. A buffer layer 14 may be formed on a part on or in the vicinity of the phase-shift optical waveguides 6. A transparent substance film for imparting a stress to one of the phase-shift optical waveguides 6 may be formed on a part or a whole of a portion without the buffer layer 14.

Abstract: An optical electric field sensor comprises optical components 2 through 4 and 11 through 13 including an optical crystal and is for measuring the intensity of an electric field, spontaneously or forcedly generated, by the use of variation of at least one of an intensity, a phase, and a polarization direction of a light beam passing through the electric field. The above-mentioned optical components are arranged and sealed in a package 7 made of at least one of a glass material such as quartz, a ceramics material, and a plastic material such as vinyl chloride having an antistatic-treated surface. More effectively, a main portion of the surface of the package 7 is subjected to abrasion. On the other hand, the optical crystal having an electrooptical effect is fixedly surrounded by a heat insulation material. The entire surface of the optical crystal substrate is coated with conductive resin. Silicone is applied in an area between modulation electrodes.