Abstract: A radiation-sensitive resin composition includes an acid generating agent to generate an organic acid by irradiation with a radioactive ray. The organic acid has a cyclic hydrocarbon group and an organic group including a bond that is cleavable by an acid or a base to produce a polar group. The organic acid is preferably represented by a following formula (I). Z represents an organic acid group. R2 represents an alkanediyl group, wherein a part or all of hydrogen atoms of the alkanediyl group represented by R1 are optionally substituted by a fluorine atom. X represents a single bond, O, OCO, COO, CO, SO3 or SO2. R2 represents a cyclic hydrocarbon group. R3 represents a monovalent organic group having a functional group represented by a following formula (x). n is an integer of 1 to 3.

Abstract: A magnetic disk device including: one or more disk-shaped magnetic disks; a spindle motor; a magnetic head; an arm for supporting the magnetic head; an enclosure base for housing the above components; an adjacent facing surface which lies in the enclosure base adjacent to the magnetic disk; a non-adjacent facing surface which lies in the enclosure opposite the magnetic disk and is further from the magnetic disk than the adjacent facing surface; a connecting surface for connecting the adjacent facing surface and the non-adjacent facing surface; and a groove which extends in the circumferential direction of the magnetic disk on the magnetic disk inner circumferential side of the adjacent facing surface, wherein one end of the groove is exposed at the connecting surface, while the other end has an end face which is perpendicular to the direction of rotation of the magnetic disk.

Abstract: A radiation-sensitive resin composition includes a compound represented by a following formula (1), and a first polymer that serves as a base resin. R1 represents a monovalent alicyclic hydrocarbon group having 3 to 20 carbon atoms, or the like. The M+ represents a monovalent cation. The first polymer (B) is preferably insoluble or hardly soluble in alkali, the polymer including a structure unit represented by a formula (5) or a structure unit represented by a formula (6), and a structure unit represented by a formula (7).

Abstract: A radiation-sensitive resin composition includes a first polymer, a second polymer and a radiation-sensitive acid generator. The first polymer has a structure unit represented by a following formula (1-1), a structure unit represented by a following formula (1-2), or both thereof, and has a content of fluorine atoms of no less than 5% by mass to a total mass of the first polymer. The second polymer has an acid-dissociable group, and has a content of fluorine atoms of less than 5% by mass to a total mass of the second polymer.

Abstract: A radiation-sensitive resin composition includes a first polymer including an acid-labile group, an acid generator to generate an acid upon exposure to radiation, and a second polymer including a fluorine atom and a functional group shown by a general formula (x). The second polymer has a fluorine atom content higher than a fluorine atom content of the first polymer. R1 represents an alkali-labile group. A represents an oxygen atom, —NR?—, —CO—O—# or —SO2—O—##, wherein the oxygen atom represented by A is not an oxygen atom bonded directly to an aromatic ring, a carbonyl group, or a sulfoxyl group, R? represents a hydrogen atom or an alkali-labile group, and “#” and “##” indicates a bonding hand bonded to R1.

Abstract: A radiation-sensitive resin composition includes a first polymer that includes a repeating unit having an acid-labile group and becomes alkali-soluble upon dissociation of the acid-labile group, and a radiation-sensitive acid-generating agent. The acid-labile group has a structure shown by a general formula (1). R1 represents a methyl group or the like, R2 represents a hydrocarbon group that forms a cyclic structure, R3 represents a fluorine atom or the like, R4 represents a carbon atom, and n1 is an integer from 1 to 7.

Abstract: The radiation-sensitive resin composition includes a first polymer, a second polymer and a radiation sensitive acid generator. The first polymer includes a repeating unit represented by formula (1). The second polymer includes an acid labile group and is dissociated by an action of acid so that alkali solubility is given by dissociation of said acid labile group. R1 represents a hydrogen atom, a methyl group or a trifluoromethyl group. R2 represents a single bond or a divalent linear, branched or cyclic, saturated or unsaturated hydrocarbon group having 1-20 carbon atoms. X represents a fluorine atom-substituted methylene group or a linear or branched fluoroalkylene group having 2-20 carbon atoms. R3 represents a hydrogen atom or a monovalent organic group.

Abstract: A radiation-sensitive resin composition includes an acid-dissociable group-containing resin, a radiation-sensitive acid generator, and a solvent. The acid-dissociable group-containing resin includes a copolymer containing a repeating unit. The reparing unit includes an acid-dissociable group-containing repeating unit in an amount of more than about 55 mol % of a total amount of the repeating units in the copolymer. A content of the copolymer in the acid-dissociable group-containing resin is about 90 mass % or more of a total amount of the acid-dissociable group-containing resin.

Abstract: A compound is shown by the following formula (5) in which at least one of Rf groups represents a fluorine atom or a linear or branched perfluoroalkyl group having 1 to 10 carbon atoms, A? represents a substituted or unsubstituted, linear or branched alkylene group having 1 to 20 carbon atoms, an alkylene group having at least one hetero atom, or a single bond, G represents a divalent organic group having a fluorine atom or a single bond, Mm+ represents an onium cation, m represents a natural number of 1 to 3, and p represents a natural number of 1 to 8.

Abstract: A compound is shown by the following formula (5) in which at least one of Rf groups represents a fluorine atom or a linear or branched perfluoroalkyl group having 1 to 10 carbon atoms, A? represents a substituted or unsubstituted, linear or branched alkylene group having 1 to 20 carbon atoms, an alkylene group having at least one hetero atom, or a single bond, G represents a divalent organic group having a fluorine atom or a single bond, Mm+ represents an onium cation, m represents a natural number of 1 to 3, and p represents a natural number of 1 to 8.

Abstract: A radiation-sensitive resin composition is provided which has high transparency to radiation, excelling in basic properties as a resist such as sensitivity, resolution, and pattern shape, and, in particular, a high resolution radiation-sensitive resin composition providing a wide DOF and excelling in LER. Also provided are a polymer which can be used in the composition and a novel compound useful for synthesizing the polymer. The novel compound is shown by the following formula (2), wherein R4 represents a methyl group, a trifluoromethyl group, or a hydrogen atom, at least one of the Rfs represents a fluorine atom or a linear or branched perfluoroalkyl group having 1 to 10 carbon atoms, A represents a divalent organic group or a single bond, G represents a divalent organic group having a fluorine atom or a single bond, Mm+ represents a metal ion or an onium cation, m represents an integer of 1 to 3, and p is an integer of 1 to 8.

Abstract: A radiation-sensitive resin composition includes (A) an acid labile group-containing resin which becomes alkali-soluble by an action of an acid, (B) a radiation-sensitive acid generator, and (C) a solvent. The resin (A) includes repeating units shown by formulas (1) and (2), wherein R1 and R2 represent a hydrogen atom or a substituted or unsubstituted alkyl group having 1 to 4 carbon atoms, R3 represents a substituted or unsubstituted alkyl group having 1 to 4 carbon atoms, X represents a hydrogen atom, a hydroxyl group, or an acyl group, m represents an integer from 1 to 18, and n represents an integer from 4 to 8.

Abstract: A radiation-sensitive resin composition includes an acid-dissociable group-containing resin, a radiation-sensitive acid generator, and a solvent. The acid-dissociable group-containing resin includes a copolymer containing a repeating unit. The reparing unit includes an acid-dissociable group-containing repeating unit in an amount of more than about 55 mol % of a total amount of the repeating units in the copolymer. A content of the copolymer in the acid-dissociable group-containing resin is about 90 mass % or more of a total amount of the acid-dissociable group-containing resin.

Abstract: A rotating disk storage device has a stopper mechanism and a latch mechanism for diminishing a shock imposed on an actuator head suspension assembly (AHSA) and permits positive retraction of the AHSA upon occurrence of an external shock or runaway. In one embodiment, the latch mechanism comprises an AHSA which is supported pivotably, a stopper which restricts a pivotal movement in a pivot direction of the AHSA, an inertia member adapted to move pivotally in a corresponding pivot direction when the AHSA moves pivotally in the pivot direction while causing the stopper to be deformed elastically, and a latch member which has an engaging portion and which, upon receipt of the torque from the inertia member, moves pivotally in a direction opposite from the corresponding pivot direction, and causes the engaging portion to move to a latching position. Shock energy of the AHSA is attenuated by both stopper and inertia member.

Abstract: A radiation-sensitive resin composition is provided which has high transparency to radiation, excelling in basic properties as a resist such as sensitivity, resolution, and pattern shape, and, in particular, a high resolution radiation-sensitive resin composition providing a wide DOF and excelling in LER. Also provided are a polymer which can be used in the composition and a novel compound useful for synthesizing the polymer. The novel compound is shown by the following formula (2), wherein R4 represents a methyl group, a trifluoromethyl group, or a hydrogen atom, at least one of the Rfs represents a fluorine atom or a linear or branched perfluoroalkyl group having 1 to 10 carbon atoms, A represents a divalent organic group or a single bond, G represents a divalent organic group having a fluorine atom or a single bond, Mm+ represents a metal ion or an onium cation, m represents an integer of 1 to 3, and p is an integer of 1 to 8.

Abstract: A rotating disk storage device has a mechanism for latching an actuator head suspension assembly (AHSA) positively in a retraction area upon occurrence of an external shock or runaway. In one embodiment, a latch mechanism comprises an AHSA which is supported pivotably, an elastic member which restricts a pivotal movement of the AHSA in a pivot direction A1 of the AHSA, an inertia member adapted to move pivotally in a corresponding pivot direction B2 when the AHSA moves pivotally in the pivot direction A1 while deforming the elastic member elastically, and a latch member having an engaging portion and adapted to move pivotally in a direction A2 opposite from the corresponding pivot direction B2 upon receipt of torque from the inertia member, thereby causing the engaging portion to move to a latching position. The AHSA has two to-be-engaged portions, i.e., a first to-be-engaged portion and a second to-be-engaged portion.

Abstract: Embodiments of the present invention provide a rotating disk storage device adopting a thin yoke structure. In one embodiment, the yoke structure of a voice coil motor includes a base of a casing formed from a ferromagnetic material; an auxiliary yoke disposed so as to be magnetically coupled to the base; a magnet disposed so as to be magnetically coupled to a front surface of the auxiliary yoke; and a main yoke provided with yoke legs magnetically coupled to the auxiliary yoke and an opposing surface that confronts a front surface of the magnet. In addition, a yoke gap is defined between the opposing surface and the front surface of the magnet. The base and the auxiliary yoke form a magnetic path, which allows a dedicated yoke on a lower portion to be eliminated.

Abstract: Embodiments of the invention provide a retaining ring attaching device capable of improving assembling efficiency and a data storage device fabricating method. In one embodiment, a C ring attaching device included in a hard disk drive assembling apparatus expands a C ring, puts the expanded C ring on a pivot, and contracts the C ring on the pivot. The C ring attaching device moves chuck arms holding the C ring such that the C ring is moved so that a gap in the C ring moves away from the pivot while the C ring is being contracted.

Abstract: Embodiments of the invention prevent the magnetic head from dropping to the magnetic disk when it is retracted. If the power supply Vcc to the drive is interrupted, a power supply voltage detecting section detects that the power supply to the drive is interrupted. A control section sets switches to the ON state in order to discharge the charged retract capacitor and supply the discharge current to a voice coil. The control section retains the switches in the ON state for a period which is determined based on the discharge period specifying control data stored in a register and the count signal from a counter. A voice coil motor, to which the current is supplied, turns the actuator in the unloading direction to retract the actuator to the ramp.

Abstract: Embodiments of the invention provide a retaining ring attaching device capable of improving assembling efficiency and a data storage device fabricating method. In one embodiment, a C ring attaching device included in a hard disk drive assembling apparatus expands a C ring, puts the expanded C ring on a pivot, and contracts the C ring on the pivot. The C ring attaching device moves chuck arms holding the C ring such that the C ring is moved so that a gap in the C ring moves away from the pivot while the C ring is being contracted.