Patents by Inventor Takanori Koshikawa

Takanori Koshikawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photoemission electron microscopy and measuring method using the microscopy
    Patent number: 7034295
    Abstract: A photoemission electron microscopy having a light source system for carrying out a high-resolution measurement such as work function distribution measurement or magnetic domain distribution with reliability, and a high-sensitivity measurement method using the photoemission electron microscopy. A photoemission electron microscopy having an excitation light source system in which a specimen is irradiated with irradiation light from a light source uses a vacuum chamber in which the specimen is placed and an objective lens which collects the irradiation light on a specimen surface. The objective lens is accommodated in the vacuum chamber. The light source may be placed outside the vacuum chamber. A condenser lens which makes the irradiation light from the light source generally parallel may be placed between the light source and the vacuum chamber. A transmission window which transmits the irradiation light while the vacuum chamber is sealed may be placed between the condenser lens and the objective lens.
    Type: Grant
    Filed: September 10, 2004
    Date of Patent: April 25, 2006
    Assignees: ULVAC-PHI, Inc., Takanori Koshikawa
    Inventors: Takanori Koshikawa, Takashi Ikuta, Tsuneo Yasue, Masami Taguchi, Ibuki Tanaka
  • Photoemission electron microscopy and measuring method using the microscopy
    Publication number: 20050067566
    Abstract: A photoemission electron microscopy having a light source system for carrying out a high-resolution measurement such as work function distribution measurement or magnetic domain distribution with reliability, and a high-sensitivity measurement method using the photoemission electron microscopy. A photoemission electron microscopy having an excitation light source system in which a specimen is irradiated with irradiation light from a light source uses a vacuum chamber in which the specimen is placed and an objective lens which collects the irradiation light on a specimen surface. The objective lens is accommodated in the vacuum chamber. The light source may be placed outside the vacuum chamber. A condenser lens which makes the irradiation light from the light source generally parallel may be placed between the light source and the vacuum chamber. A transmission window which transmits the irradiation light while the vacuum chamber is sealed may be placed between the condenser lens and the objective lens.
    Type: Application
    Filed: September 10, 2004
    Publication date: March 31, 2005
    Inventors: Takanori Koshikawa, Takashi Ikuta, Tsuneo Yasue, Masami Taguchi, Ibuki Tanaka