Patents by Inventor Takanori Kudo

Takanori Kudo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220246326
    Abstract: A shielded cable includes at least one electric wire or cable, a shield being provided around the at least one electric wire or cable and including a plurality of wires comprising a metal material, an insulating coating being provided around the shield in direct- and plane-contact with the plurality of wires. The insulating coating includes a base resin composed of acid-modified fluoropolymer, and a heat-dissipating filler included in the base resin. The heat-dissipating filler is electrically insulating and has at least one functional group of NH2 group and OH group on its surface.
    Type: Application
    Filed: February 1, 2022
    Publication date: August 4, 2022
    Inventors: Atsuro YAGUCHI, Takanobu WATANABE, Takanori KOMURO, Kimika KUDO, Koki HIRANO, Detian HUANG
  • Publication number: 20210382390
    Abstract: The present invention relates to resist compositions comprising a polymer component, a photoacid generator component (PAG), a photoactive diazonaphthoquinone component (PAC), a base component, a solvent component, and optionally, a heterocyclic thiol component. The polymer component is a Novolak derivative, comprising Novolak repeat units with free phenolic hydroxy moieties, and Novolak repeat units comprising phenolic hydroxy moieties protected with an acid cleavable acetal moiety.
    Type: Application
    Filed: May 22, 2019
    Publication date: December 9, 2021
    Inventors: Medhat A. Toukhy, Weihong Liu, Takanori Kudo, Hung-Yang Chen, Jian Yin
  • Patent number: 9274426
    Abstract: The present invention relates to a novel absorbing antireflective coating composition comprising a novel crosslinkable polymer comprising at least one repeat unit (A) having structure (1), at least one repeat unit (B) having a structure (2), and at least one repeat unit (C) having structure (3) where D is a direct valence bound or C(R1)(R2) methylene moiety where R1 and R2 are independently H, C1-C8 alkyl, C3-C24 cycloalkyl or C6-C24 aryl; Ari, Arii, Ariii and Ariv are independently phenylenic and naphthalenic moiety, R3 and R4 are independently hydrogen or C1-C8 alkyl; and R5 and R6 are independently hydrogen or C1-C8 alkyl; and a solvent. The invention also relates to a process for forming an image using the novel antireflective coating composition.
    Type: Grant
    Filed: June 4, 2014
    Date of Patent: March 1, 2016
    Assignee: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
    Inventors: M. Dalil Rahman, Takanori Kudo, Alberto D. Dioses, Douglas McKenzie, Clement Anyadiegwu, Munirathna Padmanaban, Salem K. Mullen
  • Publication number: 20150309410
    Abstract: The present invention relates to a novel absorbing antireflective coating composition comprising a novel crosslinkable polymer comprising at least one repeat unit (A) having structure (1), at least one repeat unit (B) having a structure (2), and at least one repeat unit (C) having structure (3) where D is a direct valence bound or C(R1)(R2) methylene moiety where R1 and R2 are independently H, C1-C5 alkyl, C3-C24 cycloalkyl or C6-C24 aryl; Ari, Arii, Ariii and Ariv are independently phenylenic and naphthalenic moiety, R3 and R4 are independently hydrogen or C1-C8 alkyl; and R5 and R6 are independently hydrogen or C1-C8 alkyl; and a solvent. The invention also relates to a process for forming an image using the novel antireflective coating composition.
    Type: Application
    Filed: June 4, 2014
    Publication date: October 29, 2015
    Inventors: M. Dalil RAHMAN, Takanori KUDO, Alberto D. DIOSES, Douglas MCKENZIE, Clement ANYADIEGWU, Munirathna PADMANABAN, Salem K. MULLEN
  • Publication number: 20150309403
    Abstract: The present invention relates to a novel absorbing antireflective coating composition comprising a novel crosslinkable polymer comprising at least one repeat unit (A) having structure (1), at least repeat (B) unit having a structure (2), and at least one repeat unit (C) having structure (3) where D is a direct valence bound or C(R1)(R2) methylene moiety where R1 and R2 are independently H, C1-C8 alkyl, C3-C24 cycloalkyl or C6-C24 aryl; Ari, Arii, Ariii and Ariv are independently phenylenic and naphthalenic moiety, R3 and R4 are independently hydrogen or C1-C8 alkyl; and R5 and R6 are independently hydrogen or C1-C8 alkyl; and a solvent. The invention also relates to a process for forming an image using the novel antireflective coating composition.
    Type: Application
    Filed: April 29, 2014
    Publication date: October 29, 2015
    Applicant: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
    Inventors: M. Dalil RAHMAN, Takanori KUDO, Alberto D. DIOSES, Douglas MCKENZIE, Clement ANYADIEGWU, Munirathna PADMANABAN, Salem K. Mullen
  • Patent number: 9152051
    Abstract: The present invention relates to an absorbing hard mask antireflective coating composition comprising a novel polymer, where the novel polymer comprises in the backbone of the polymer four repeat units -A-, -B-, -C- and -D-, where A is repeat unit which comprises a fused aromatic ring in its backbone, B has the structure (1), C is a hydroxylbiphenyl of structure (2) and D is a derivatized fluorene of structure (3), where R1 is C1-C4alkyl, R2 is C1-C4alkyl, R3 and R4 are independently hydrogen or C1-C4 alkyl, and Ar? and Ar? are independently phenylenic, or naphthalenic derived moieties, R5 and R6 are independently —OH or —(CH2)nOH where n=2-4, and R7 and R8 are independently hydrogen or C1-C4 alkyl. This invention also relates to a process for forming an image using the novel antireflective coating composition.
    Type: Grant
    Filed: June 13, 2013
    Date of Patent: October 6, 2015
    Assignee: AZ ELECTRONICS MATERIALS (LUXEMBOURG) S.A.R.L.
    Inventors: M. Dalil Rahman, Clement Anyadiegwu, Douglas McKenzie, Takanori Kudo, Elizabeth Wolfer, Salem K. Mullen
  • Publication number: 20140370444
    Abstract: The present invention relates to an absorbing hard mask antireflective coating composition comprising a novel polymer, where the novel polymer comprises in the backbone of the polymer four repeat units -A-, -B-, -C- and -D-, where A is repeat unit which comprises a fused aromatic ring in its backbone, B has the structure (1), C is a hydroxylbiphenyl of structure (2) and D is a derivatized fluorene of structure (3), where R1 is C1-C4alkyl, R2 is C1-C4alkyl, R3 and R4 are independently hydrogen or C1-C4 alkyl, and Ar? and Ar? are independently phenylenic, or naphthalenic derived moieties, R5 and R6 are independently —OH or —CH2)nOH where n=2-4, and R7 and R8 are independently hydrogen or C1-C4 alkyl. This invention also relates to a process for forming an image using the novel antireflective coating composition.
    Type: Application
    Filed: June 13, 2013
    Publication date: December 18, 2014
    Applicant: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
    Inventors: M. Dalil RAHMAN, Clement ANYADIEGWU, Douglas MCKENZIE, Takanori KUDO, Elizabeth WOLFER, Salem K. MULLEN
  • Patent number: 8623589
    Abstract: The present invention relates to an antireflective coating composition comprising a crosslinking agent, a polymer comprising at least one chromophore group and at least one hydroxyl and/or a carboxyl group, and an additive, further where the additive has structure 1 and comprises at least one arylene-hydroxyl moiety, where Y is selected from an carboxylate anion or sulfonate anion, R1, R2, and R3 are independently selected from unsubstituted C1-C8 alkyl, substituted C1-C8 alkyl, aryl and arylene-hydroxyl; X1, X2, and X3 are independently selected from direct valence bond and C1-C8 alkylene group, and, n=1, 2 or 3. The invention further relates to a process for using the composition.
    Type: Grant
    Filed: June 6, 2011
    Date of Patent: January 7, 2014
    Assignee: AZ Electronic Materials USA Corp.
    Inventors: Takanori Kudo, Alberto Dioses, Edward Ng, Srinivasan Chakrapani, Munirathna Padmanaban
  • Publication number: 20120308939
    Abstract: The present invention relates to an antireflective coating composition comprising a crosslinking agent, a polymer comprising at least one chromophore group and at least one hydroxyl and/or a carboxyl group, and an additive, further where the additive has structure 1 and comprises at least one arylene-hydroxyl moiety, where Y is selected from an carboxylate anion or sulfonate anion, R1, R2, and R3 are independently selected from unsubstituted C1-C8 alkyl, substituted C1-C8 alkyl, aryl and arylene-hydroxyl; X1, X2, and X3 are independently selected from direct valence bond and C1-C8 alkylene group, and, n=1, 2 or 3. The invention further relates to a process for using the composition.
    Type: Application
    Filed: June 6, 2011
    Publication date: December 6, 2012
    Applicant: AZ ELECTRONIC MATERIALS USA CORP.
    Inventors: Takanori Kudo, Alberto Dioses, Edward Ng, Srinivasan Chakrapani, Munirathna Padmanaban
  • Patent number: 8252503
    Abstract: Photoresist compositions are disclosed.
    Type: Grant
    Filed: August 24, 2007
    Date of Patent: August 28, 2012
    Assignee: AZ Electronic Materials USA Corp.
    Inventors: Srinivasan Chakrapani, Munirathna Padmanaban, Muthiah Thiyagarajan, Takanori Kudo, David L. Rentkiewicz
  • Publication number: 20120122029
    Abstract: The present invention relates to a photoimageable underlayer composition comprising a polymer, a crosslinker comprising a vinyl ether group, and a thermal acid generator comprising a salt of a mono or polycarboxylic acid and an amine, where the amine has a boiling point of at least 150° C. The invention also relates to a process for forming an image in the underlayer comprising the novel composition.
    Type: Application
    Filed: November 11, 2010
    Publication date: May 17, 2012
    Inventors: Takanori Kudo, Alberto Dioses, Edward Ng, Srinivasan Chakrapani, Munirathna Padmanaban
  • Publication number: 20110086312
    Abstract: The present invention relates to a positive bottom photoimageable antireflective coating composition which is capable of being developed in an aqueous alkaline developer, wherein the antireflective coating composition comprises a polymer comprising at least one recurring unit with a chromophore group and one recurring unit with a hydroxyl and/or a carboxyl group, a vinyl ether terminated crosslinking agent of structure (7), and optionally, a photoacid generator and/or an acid and/or a thermal acid generator, where structure (7) is wherein W is selected from (C1-C30) linear, branched or cyclic alkyl moiety, substituted or unsubstituted (C3-C40) alicyclic hydrocarbon moiety and substituted is or unsubstituted (C3-C40) cycloalkylalkylene moiety; R is selected from C1-C10 linear or branched alkylene and n?2. The invention further relates to a process for using such a composition.
    Type: Application
    Filed: October 9, 2009
    Publication date: April 14, 2011
    Inventors: Ralph R. Dammel, Srinivasan Chakrapani, Munirathna Padmanaban, Shinji Miyazaki, Edward W. Ng, Takanori Kudo, Alberto D. Dioses, Francis M. Houlihan
  • Patent number: 7601480
    Abstract: The present application relates to a compound of formula where X is selected from the group CF3SO3, C4F9SO3, N(SO2C2F5)2, N(SO2CF3SO2C4F9), N(SO2C3F7)2, N(SO2C4F9)2, CF3CHFO(CF2)2SO3, and CH3CH2CH2O(CF2)4SO3. A photoresist composition comprising a polymer containing an acid labile group, the above compounds, and one or more additional photoacid generators is also provided for.
    Type: Grant
    Filed: December 20, 2006
    Date of Patent: October 13, 2009
    Assignee: AZ Electronic Materials USA Corp.
    Inventors: M. Dalil Rahman, Takanori Kudo
  • Patent number: 7595141
    Abstract: The present invention relates to an aqueous coating composition for coating a photoresist pattern comprising a polymer containing amino group. The present invention also relates to a process for manufacturing a microelectronic device comprising providing a substrate with a photoresist pattern, coating the photoresist pattern with the novel coating material reacting a portion of the coating material in contact with the photoresist pattern, and removing a portion of the coating material which is not reacted with a removal solution.
    Type: Grant
    Filed: October 26, 2004
    Date of Patent: September 29, 2009
    Assignee: AZ Electronic Materials USA Corp.
    Inventors: Takanori Kudo, Munirathna Padmanaban, Ralph R. Dammel
  • Publication number: 20090053652
    Abstract: Photoresist compositions are disclosed.
    Type: Application
    Filed: August 24, 2007
    Publication date: February 26, 2009
    Inventors: Srinivasan Chakrapani, Munirathna Padmanaban, Muthiah Thiyagarajan, Takanori Kudo, David L. Rentkiewicz
  • Publication number: 20080153032
    Abstract: The present application relates to a compound of formula where X is selected from the group CF3SO3, C4F9SO3, N(SO2C2F5)2, N(SO2CF3SO2C4F9), N(SO2C3F7)2, N(SO2C4F9)2, CF3CHFO(CF2)2SO3, and CH3CH2CH2O(CF2)4SO3. A photoresist composition comprising a polymer containing an acid labile group, the above compounds, and one or more additional photoacid generators is also provided for.
    Type: Application
    Filed: December 20, 2006
    Publication date: June 26, 2008
    Inventors: M. Dalil Rahman, Takanori Kudo
  • Patent number: 7122291
    Abstract: The present invention provides for a photoresist composition comprising a mixture of two different copolymers.
    Type: Grant
    Filed: August 2, 2004
    Date of Patent: October 17, 2006
    Assignee: AZ Electronic Materials USA Corp.
    Inventors: Munirathna Padmanaban, Guanyang Lin, Takanori Kudo, Chi-Sun Hong, M. Dalil Rahman
  • Publication number: 20060088788
    Abstract: The present invention relates to an aqueous coating composition for coating a photoresist pattern comprising a polymer containing amino group. The present invention also relates to a process for manufacturing a microelectronic device comprising providing a substrate with a photoresist pattern, coating the photoresist pattern with the novel coating material reacting a portion of the coating material in contact with the photoresist pattern, and removing a portion of the coating material which is not reacted with a removal solution.
    Type: Application
    Filed: October 26, 2004
    Publication date: April 27, 2006
    Inventors: Takanori Kudo, Munirathna Padmanaban, Ralph Dammel
  • Publication number: 20060024610
    Abstract: The present invention provides for a photoresist composition comprising a mixture of two different copolymers.
    Type: Application
    Filed: August 2, 2004
    Publication date: February 2, 2006
    Inventors: Munirathna Padmanaban, Guanyang Lin, Takanori Kudo, Chi-Sun Hong, M. Dalil Rahman
  • Patent number: 6991888
    Abstract: The present invention relates to a novel photoresist composition that can be developed with an aqueous alkaline solution, and is capable of being imaged at exposure wavelengths in the deep ultraviolet. The invention also relates to a process for imaging the novel photoresist as well as novel photoacid generators. The novel photoresist comprises a) a polymer containing an acid labile group, and b) a novel mixture of photoactive compounds, where the mixture comprises a lower absorbing compound selected from structure 1 and 2, and a higher absorbing compound selected from structure 4 and 5, where, R1 and R2 R5, R6, R7, R8, and R9 are defined herein; m=1–5; X? is an anion, and Ar is selected from naphthyl, anthracyl, and structure 3, where R30, R31, R32, R33, and R34 are defined herein.
    Type: Grant
    Filed: May 16, 2003
    Date of Patent: January 31, 2006
    Assignee: AZ Electronic Materials USA Corp.
    Inventors: Munirathna Padmanaban, Takanori Kudo, Sangho Lee, Ralph R. Dammel, M. Dalil Rahman