Patents by Inventor Takanori Nakatsuka

Takanori Nakatsuka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220375726
    Abstract: A plasma processing method which can realize a reduction of process variation in the first one of lot processing includes a first step of supplying gas to a processing chamber and a second step of etching the sample by using plasma after the first step. The gas is a gas containing a carbon element and a hydrogen element, a gas containing a chlorine element, or a mixed gas containing all of the gases used in the second step.
    Type: Application
    Filed: February 10, 2020
    Publication date: November 24, 2022
    Inventors: Kosa Hirota, Masahiro Sumiya, Hirofumi Eitoku, Takanori Nakatsuka
  • Patent number: 9991052
    Abstract: Provided is a biaxially stretched polypropylene film for capacitors which has high withstand voltage characteristics when used as a dielectric for capacitors and which has highly suitable processability into elements. The biaxially stretched polypropylene film for capacitors has projections on both surfaces and has a thickness (t1, ?m) of 4-20 ?m. When one of the surfaces is expressed by surface A and the other by surface B, all of the following relationships are satisfied. 800?SRzB?1,300 (nm) 0.1?SRzA/SRzB?0.8 PBmin?100 (nm) PBmax?1,500 (nm) 0.4?PB450-750/PB?0.7.
    Type: Grant
    Filed: April 19, 2011
    Date of Patent: June 5, 2018
    Assignee: Toray Industries, Inc.
    Inventors: Takanori Nakatsuka, Masami Sugata, Tetsuya Asano
  • Patent number: 9805868
    Abstract: A biaxially stretched polypropylene film for capacitors which has protrusions on both sides and has a thickness (t1[?m]) of 1 ?m to 3 ?m, wherein Formulae (1) to (4) are satisfied by an A-side as one film surface and a B-side as another film surface: |Pa?Pb|?200;??(1) 0.350?Pa/SRzA?0.700;??(2) 500 nm?SRzA?1,200 nm;??(3) 50 nm?SRzB?500 nm;??(4) wherein, in Formulae (1) to (4), Pa is a number per 0.1 mm2 of protrusions on the A-side, Pb is a number per 0.1 mm2 of protrusions on the B-side, SRzA is a ten-point average roughness of the A-side, and SRzB is a ten-point average roughness of the B-side.
    Type: Grant
    Filed: March 15, 2013
    Date of Patent: October 31, 2017
    Assignee: Toray Industries, Inc.
    Inventors: Takanori Nakatsuka, Tetsuya Asano, Masami Sugata
  • Patent number: 9123471
    Abstract: A biaxially stretched polypropylene film includes protrusions on both surfaces, in which the biaxially stretched polypropylene film has a thickness t1 of 1 ?m to 3 ?m, has a tensile strength in the machine direction of 120 MPa to 250 MPa, has a tensile strength in the transverse direction of 250 MPa to 400 MPa, has a minimum protrusion height Pmin of 100 nm or greater and a maximum protrusion height Pmax of 1,600 nm or smaller for either surface, and satisfies all of Formulae (1) to (3) when one of the surfaces is surface A and the other is surface B: 0.5?Pa250-450/Pa?1.0 (1), 0.5?Pb450-1600/Pb?1.0 (2), and 600?Pa+Pb?1,200 (3).
    Type: Grant
    Filed: March 6, 2012
    Date of Patent: September 1, 2015
    Assignee: Toray Industries, Inc.
    Inventors: Teruo Monno, Tetsuya Asano, Masami Sugata, Takanori Nakatsuka
  • Publication number: 20150050456
    Abstract: A biaxially stretched polypropylene film for capacitors which has protrusions on both sides and has a thickness (t1 [?m]) of 1 ?m to 3 ?m, wherein Formulae (1) to (4) are satisfied by an A-side as one film surface and a B-side as another film surface: |Pa?Pb|?200;??(1) 0.350?Pa/SRzA?0.700;??(2) 500 nm?SRzA?1,200 nm;??(3) 50 nm?SRzB?500 nm;??(4) wherein, in Formulae (1) to (4), Pa is a number per 0.1 mm2 of protrusions on the A-side, Pb is a number per 0.1 mm2 of protrusions on the B-side, SRzA is a ten-point average roughness of the A-side, and SRzB is a ten-point average roughness of the B-side.
    Type: Application
    Filed: March 15, 2013
    Publication date: February 19, 2015
    Applicant: Toray Industries, Inc.
    Inventors: Takanori Nakatsuka, Tetsuya Asano, Masami Sugata
  • Publication number: 20140268493
    Abstract: Provided is a biaxially stretched polypropylene film for capacitors which has high withstand voltage characteristics when used as a dielectric for capacitors and which has highly suitable processability into elements. The biaxially stretched polypropylene film for capacitors has projections on both surfaces and has a thickness (t1, ?m) of 4-20 ?m. When one of the surfaces is expressed by surface A and the other by surface B, all of the following relationships are satisfied. 800?SRzB?1,300 (nm) 0.1?SRzA/SRzB?0.8 PBmin?100 (nm) PBmax?1,500 (nm) 0.4?PB450-750/PB?0.7.
    Type: Application
    Filed: April 19, 2011
    Publication date: September 18, 2014
    Applicant: Toray Industries, Inc.
    Inventors: Takanori Nakatsuka, Masami Sugata, Tetsuya Asano
  • Publication number: 20140016244
    Abstract: A biaxially stretched polypropylene film includes protrusions on both surfaces, in which the biaxially stretched polypropylene film has a thickness t1 of 1 ?m to 3 ?m, has a tensile strength in the machine direction of 120 MPa to 250 MPa, has a tensile strength in the transverse direction of 250 MPa to 400 MPa, has a minimum protrusion height Pmin of 100 nm or greater and a maximum protrusion height Pmax of 1,600 nm or smaller for either surface, and satisfies all of Formulae (1) to (3) when one of the surfaces is surface A and the other is surface B: 0.5 Pa250-450/Pa?1.0 (1), 0.5?Pb450-1600/Pb?1.0 (2), and 600?Pa+Pb?1,200 (3).
    Type: Application
    Filed: March 6, 2012
    Publication date: January 16, 2014
    Applicant: Toray Industries, Inc,
    Inventors: Teruo Monno, Tetsuya Asano, Masami Sugata, Takanori Nakatsuka
  • Patent number: 7194821
    Abstract: The downtime of a vacuum processing apparatus due to wet cleaning is reduced. In a vacuum processing apparatus that requires aging for its chamber or process container after vacuum evacuation of the apparatus and before actual processing of a workpiece, when the chamber has been opened to atmosphere for the purpose of wet cleaning or component replacement, the apparatus comprises a high precision absolute pressure gauge for use in processing, a wide range gauge capable of measuring a wide range of pressures, and a controller, wherein the controller uses a pressure trend during vacuum evacuation to determine whether the vacuum evacuation is satisfactory, and starts aging upon determining that the vacuum evacuation is satisfactory even if the actual pressure is not below a prescribed value.
    Type: Grant
    Filed: March 2, 2005
    Date of Patent: March 27, 2007
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Manabu Edamura, Akitaka Makino, Motohiko Yoshigai, Takanori Nakatsuka, Susumu Tauchi
  • Publication number: 20060168844
    Abstract: The downtime of a vacuum processing apparatus due to wet cleaning is reduced. In a vacuum processing apparatus that requires aging for its chamber or process container after vacuum evacuation of the apparatus and before actual processing of a workpiece, when the chamber has been opened to atmosphere for the purpose of wet cleaning or component replacement, the apparatus comprises a high precision absolute pressure gauge for use in processing, a wide range gauge capable of measuring a wide range of pressures, and a controller, wherein the controller uses a pressure trend during vacuum evacuation to determine whether the vacuum evacuation is satisfactory, and starts aging upon determining that the vacuum evacuation is satisfactory even if the actual pressure is not below a prescribed value.
    Type: Application
    Filed: March 2, 2005
    Publication date: August 3, 2006
    Inventors: Manabu Edamura, Akitaka Makino, Motohiko Yoshigai, Takanori Nakatsuka, Susumu Tauchi