Patents by Inventor Takanori Takeda

Takanori Takeda has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20030039769
    Abstract: The invention relates to a liquid-crystalline medium based on a mixture of polar compounds having negative dielectric anisotropy, which contains at least one compound of formula I 1
    Type: Application
    Filed: April 22, 2002
    Publication date: February 27, 2003
    Applicant: Merck Patent GmbH
    Inventors: Seung-Eun Lee, Nobuo Kubo, Masahiro Iijima, Hideo Ichinose, Yukiomi Takana, Shinji Nakajima, Yasushi Sugiyama, Takanori Takeda
  • Publication number: 20030033715
    Abstract: In a manufacturing method of a heat exchanger including a core portion having a plurality of tubes and a plurality of radiation fins connected to surfaces of the tubes, and a tank portion communicating with the tubes, a preheating step, a brazing step, a gradual cooling step and a cooling step are performed in this order. In the preheating step, temperature of the tank portion having a large heat capacity is increased earlier than that of the core portion having a small heat capacity. Therefore, the temperature of the tank portion is rapidly increased, and the temperature of the core portion is obediently increased in accordance with the temperature increase of the tank portion.
    Type: Application
    Filed: June 17, 2002
    Publication date: February 20, 2003
    Inventors: Syoji Iriyama, Koji Hirao, Hiroshi Ogawa, Takanori Takeda, Hiroshi Nishikawa, Satoshi Nohira
  • Patent number: 3959810
    Abstract: A method for manufacturing a PNP type planar transistor, diffusing an acceptor impurity in a non-oxidizing atmosphere to form a P type emitter region in one portion of an N type base region with a first silicon oxide film as a selective mask, depositing a second silicon oxide film from vapor phase on the surface of said emitter region, diffusing selectively a donor impurity in another portion of said base region with said first and second silicon oxide films as selective masks thereby to form an N type highly doped region in said base region.
    Type: Grant
    Filed: June 18, 1970
    Date of Patent: May 25, 1976
    Assignee: Hitachi, Ltd.
    Inventor: Takanori Takeda