Patents by Inventor Takanori Tsunoda

Takanori Tsunoda has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8372239
    Abstract: An inductively-coupled-plasma (ICP) type plasma processing apparatus is provided. The plasma processing includes an antenna which is substantially straight in a plan view of the antenna. A plasma is generated for performing a plasma treatment to a substrate when a high frequency current is applied to the antenna to form an electric field in a vacuum container. The antenna includes two go-and-return conductors closely disposed to each other in an up-down direction, wherein the up-down direction is perpendicular to a surface of the substrate, and the high frequency current is applied to flow in opposite directions between the two go-and-return conductors. An interval is defined by a distance between the two go-and-return conductors in the up-down direction, varies in a longitudinal direction of the antenna.
    Type: Grant
    Filed: April 17, 2012
    Date of Patent: February 12, 2013
    Assignee: Nissin Electric Co., Ltd.
    Inventors: Takanori Tsunoda, Yoshio Matsubara, Yasunori Ando, Masayuki Tsuji
  • Publication number: 20120325404
    Abstract: An inductively-coupled-plasma (ICP) type plasma processing apparatus is provided. The plasma processing includes an antenna which is substantially straight in a plan view of the antenna. A plasma is generated for performing a plasma treatment to a substrate when a high frequency current is applied to the antenna to form an electric field in a vacuum container. The antenna includes two go-and-return conductors closely disposed to each other in an up-down direction, wherein the up-down direction is perpendicular to a surface of the substrate, and the high frequency current is applied to flow in opposite directions between the two go-and-return conductors. An interval is defined by a distance between the two go-and-return conductors in the up-down direction, varies in a longitudinal direction of the antenna.
    Type: Application
    Filed: April 17, 2012
    Publication date: December 27, 2012
    Applicant: NISSIN ELECTRIC CO., LTD.
    Inventors: TAKANORI TSUNODA, YOSHIO MATSUBARA, YASUNORI ANDO, MASAYUKI TSUJI
  • Patent number: 5480675
    Abstract: An apparatus for plating a printed circuit board including a non-through hole for connecting between a surface conductive layer and an interlayer wiring layer has a jig, a vessel, a supporting body carrying the jig for causing it to vibrate and swing in a plating liquid contained in the vessel, and a vacuum pump connected to the vessel for exhausting the air in the vessel thereby enhancing removal of bubbles in the non-through hole. A method of plating a printed circuit board includes the step of reducing the pressure inside the vessel simultaneously with the printed circuit board being subjected to the vibration and swinging actions thereby to remove a bubble existing inside the non-through hole. The removal of the bubble makes it possible to have a uniform plating film formed in an inner wall of the non-through hole and ensures the reliable electric connection to be established through the non-through hole between a surface conductive layer and interlayer conductive layers.
    Type: Grant
    Filed: March 10, 1994
    Date of Patent: January 2, 1996
    Assignee: NEC Corporation
    Inventors: Tomoo Murakami, Hidebumi Ohnuki, Takanori Tsunoda, Ryo Maniwa
  • Patent number: 5464662
    Abstract: A fabrication method of a printed wiring board in which the halation effect of light irradiated to a solder resist film is utilized in a process of selectively removing the solder resist film. After a conductive layer is patterned to a given circuit pattern including soldering pads, the solder resist film is formed on the base material to cover the patterned conductive layer. The solder resist film is selectively exposed to light utilizing reflection of the irradiated light from the insulating base material and developed so that the solder resist film is selectively left in areas adjacent to the respective soldering pads. Then, an etching resist film is formed to cover the patterned conductive layer except for the soldering pads, and surface areas of the respective soldering pads are selectively etched using the etching resist film as a mask to produce solder resist dams made of the solder resist film left on the base material. Solder films are formed on the respective soldering pads thus selectively etched.
    Type: Grant
    Filed: September 2, 1994
    Date of Patent: November 7, 1995
    Assignee: NEC Corporation
    Inventors: Tomoo Murakami, Takanori Tsunoda