Patents by Inventor Takao Hirayama

Takao Hirayama has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8953406
    Abstract: Disclosed herein is a device that includes a plurality of semiconductor chips mounted on a module substrate. Each of the semiconductor chips includes a reset terminal to which a reset signal is supplied, and an internal circuit that is initialized based on the reset signal. The module substrate includes a reset signal line connected commonly to the reset terminals of the semiconductor chips, and an anti-resonance element connected to the reset signal line.
    Type: Grant
    Filed: April 25, 2012
    Date of Patent: February 10, 2015
    Assignee: PS4 Luxco S.a.r.l.
    Inventors: Yoji Nishio, Takao Hirayama, Susumu Hatano, Haruki Nagahashi, Masashi Kawamura, Tadaaki Yoshimura
  • Publication number: 20120268173
    Abstract: Disclosed herein is a device that includes a plurality of semiconductor chips mounted on a module substrate. Each of the semiconductor chips includes a reset terminal to which a reset signal is supplied, and an internal circuit that is initialized based on the reset signal. The module substrate includes a reset signal line connected commonly to the reset terminals of the semiconductor chips, and an anti-resonance element connected to the reset signal line.
    Type: Application
    Filed: April 25, 2012
    Publication date: October 25, 2012
    Inventors: Yoji NISHIO, Takao HIRAYAMA, Susumu HATANO, Haruki NAGAHASHI, Masashi KAWAMURA, Tadaaki YOSHIMURA
  • Patent number: 7071243
    Abstract: A photo curable resin composition, which comprises (A) an acid-modified, vinyl group-containing epoxy resin, (B) an elastomer, (C) a photopolymerization initiator, (D) a diluent and (E) a curing agent, can give a high performance cured film having distinguished heat resistance, humidity-heat resistance, adhesibility, mechanical characteristics and electrical characteristics, and a photosensitive element, which comprises a support and a layer of the photo curable resin composition laid on the support, has distinguished heat resistance, humidity-heat resistance, adhesibility, mechanical characteristics and electrical characteristics.
    Type: Grant
    Filed: May 20, 2004
    Date of Patent: July 4, 2006
    Assignee: Hitachi Chemical Company, Ltd.
    Inventors: Kuniaki Sato, Hiroaki Hirakura, Toshihiko Ito, Takao Hirayama, Toshizumi Yoshino
  • Patent number: 7049036
    Abstract: Disclosed are a photosensitive resin composition comprising a photosensitive resin (A), a photopolymerization initiator (B), and a flame retardant (C), in which a content of halogen atoms or antimony atoms in the flame retardant is 5% or less by weight; a photosensitive element using this; a method of manufacturing a resist pattern; a resist pattern; and a resist pattern laminated substrate.
    Type: Grant
    Filed: October 23, 2000
    Date of Patent: May 23, 2006
    Assignee: Hitachi Chemical Co., Ltd.
    Inventors: Kuniaki Satou, Takahiko Kutsuna, Toshizumi Yoshino, Takao Hirayama, Mikio Uzawa
  • Publication number: 20040214924
    Abstract: A photo curable resin composition, which comprises (A) an acid-modified, vinyl group-containing epoxy resin, (B) an elastomer, (C) a photopolymerization initiator, (D) a diluent and (E) a curing agent, can give a high performance cured film having distinguished heat resistance, humidity-heat resistance, adhesibility, mechanical characteristics and electrical characteristics, and a photosensitive element, which comprises a support and a layer of the photo curable resin composition laid on the support, has distinguished heat resistance, humidity-heat resistance, adhesibility, mechanical characteristics and electrical characteristics.
    Type: Application
    Filed: May 20, 2004
    Publication date: October 28, 2004
    Inventors: Kuniaki Sato, Hiroaki Hirakura, Toshihiko Ito, Takao Hirayama, Toshizumi Yoshino
  • Patent number: 6692793
    Abstract: A photo curable resin composition, which comprises (A) an acid-modified, vinyl group-containing epoxy resin, (B) an elastomer, (C) a photopolymerization initiator, (D) a diluent and (E) a curing agent, can give a high performance cured film having distinguished heat resistance, humidity-heat resistance, adhesibility, mechanical characteristics and electrical characteristics, and a photosensitive element, which comprises a support and a layer of the photo curable resin composition laid on the support, has distinguished heat resistance, humidity-heat resistance, adhesibility, mechanical characteristics and electrical characteristics.
    Type: Grant
    Filed: July 3, 2001
    Date of Patent: February 17, 2004
    Assignee: HItachi Chemical Company, Ltd.
    Inventors: Kuniaki Sato, Hiroaki Hirakura, Toshihiko Ito, Takao Hirayama, Toshizumi Yoshino
  • Patent number: 6583198
    Abstract: A photo curable resin composition, which comprises (A) an acid-modified, vinyl group-containing epoxy resin, (B) an elastomer, (C) a photopolymerization initiator, (D) a diluent and (E) a curing agent, can gives a high performance cured film having distinguished heat resistance, humidity-heat resistance, adhesibility, mechanical characteristics and electrical characteristics, and a photosensitive element, which comprises a support and a layer of the photo curable resin composition laid on the support, has distinguished heat resistance, humidity-heat resistance, adhesibility, mechanical characteristics and electrical characteristics.
    Type: Grant
    Filed: November 24, 1998
    Date of Patent: June 24, 2003
    Assignee: Hitachi Chemical Company, Ltd.
    Inventors: Kuniaki Sato, Hiroaki Hirakura, Toshihiko Ito, Takao Hirayama, Toshizumi Yoshino
  • Publication number: 20020169226
    Abstract: A photo curable resin composition, which comprises (A) an acid-modified, vinyl group-containing epoxy resin, (B) an elastomer, (C) a photopolymerization initiator, (D) a diluent and (E) a curing agent, can give a high performance cured film having distinguished heat resistance, humidity-heat resistance, adhesibility, mechanical characteristics and electrical characteristics, and a photosensitive element, which comprises a support and a layer of the photo curable resin composition laid on the support, has distinguished heat resistance, humidity-heat resistance, adhesibility, mechanical characteristics and electrical characteristics.
    Type: Application
    Filed: April 29, 2002
    Publication date: November 14, 2002
    Inventors: Kuniaki Sato, Hiroaki Hirakura, Toshihiko Ito, Takao Hirayama, Toshizumi Yoshino
  • Publication number: 20010053437
    Abstract: A photo curable resin composition, which comprises (A) an acid-modified, vinyl group-containing epoxy resin, (B) an elastomer, (C) a photopolymerization initiator, (D) a diluent and (E) a curing agent, can give a high performance cured film having distinguished heat resistance, humidity-heat resistance, adhesibility, mechanical characteristics and electrical characteristics, and a photosensitive element, which comprises a support and a layer of the photo curable resin composition laid on the support, has distinguished heat resistance, humidity-heat resistance, adhesibility, mechanical characteristics and electrical characteristics.
    Type: Application
    Filed: July 3, 2001
    Publication date: December 20, 2001
    Inventors: Kuniaki Sato, Hiroaki Hirakura, Toshihiko Ito, Takao Hirayama, Toshizumi Yoshino
  • Publication number: 20010003759
    Abstract: A photo curable resin composition, which comprises (A) an acid-modified, vinyl group-containing epoxy resin, (B) an elastormer, (C) a photopolymerization initiator, (D) a diluent and (E) a curing agent, can gives a high performance cured film having distinguished heat resistance, humidity-heat resistance, adhesibility, mechanical characteristics and electrical characteristics, and a photosensitive element, which comprises a support and a layer of the photo curable resin composition laid on the support, has distinguished heat resistance, humidity-heat resistance, adhesibility, mechanical characteristics and electrical characteristics.
    Type: Application
    Filed: November 24, 1998
    Publication date: June 14, 2001
    Inventors: KUNIAKI SATO, HIROAKI HIRAKURA, TOSHIHIKO ITO, TAKAO HIRAYAMA, TOSHIZUMI YOSHINO
  • Patent number: 6238840
    Abstract: A photosensitive resin composition comprising (A) a photosensitive resin having one or more carboxyl groups, (B) a special epoxy curing agent, and (C) a photopolymerization initiator is excellent in adhesiveness, heat resistance, resistance to PCT and developability and suitable as a solder resist composition.
    Type: Grant
    Filed: November 10, 1998
    Date of Patent: May 29, 2001
    Assignee: Hitachi Chemical Company, Ltd.
    Inventors: Takao Hirayama, Kuniaki Sato, Toshihiko Ito, Toshizumi Yoshino, Hiroaki Hirakura
  • Patent number: 6100768
    Abstract: A ring oscillator has first inverters and second inverters connected in such a manner as to form a loop; the first inverters are powered through a current controller controlling the first inverters in such a manner as to decelerate the logical operation when the power voltage is increased in magnitude; the second inverters are directly powered with the power voltages so that each second inverter accelerates the logical operation when the power voltage is increased in magnitude; and the second inverters cancel the increment of the pulse period introduced by the first inverters due to increase of the power voltage for keeping the pulse period constant.
    Type: Grant
    Filed: July 23, 1998
    Date of Patent: August 8, 2000
    Assignee: NEC Corporation
    Inventor: Takao Hirayama
  • Patent number: 6060215
    Abstract: A photosensitive resin composition comprising (A) a resin having an amide bond, an oxyalkylene group and a carboxyl group, (B) a photopolymerizable compound having an ethylenically unsaturated group and (C) a photopolymerization initiator has an alkali developability, good sensitivity and photocurability, an efficient pattern formability by photolithography, a good application workability to a film and is capable of producing cured products having good folding endurance, solder reflow heat resistance, solvent resistance, bondability and nonflammability and suitable for producing a photosensitive element, a photosensitive laminate and a flexible printed circuit board.
    Type: Grant
    Filed: March 27, 1998
    Date of Patent: May 9, 2000
    Assignee: Hitachi, Ltd.
    Inventors: Jin Amanokura, Fumihiko Ota, Ritsuko Obata, Toshihiko Akahori, Kenji Suzuki, Hiroshi Nishizawa, Katsunori Tsuchiya, Takao Hirayama, Hiroaki Hirakura
  • Patent number: 5885723
    Abstract: Provided is bonding film for printed circuit boards which is resistant to cracking even when bent with a small radius of curvature, has a sufficient mechanical strength even in its semi-cured state so that the handling may be facilitated, is not undesirably brittle and therefore does not produce undesired debris when cut, and is flexible and flame retardant at the same time. The bonding film may consist of (i) high polymer epoxy resin; (ii) denatured polyamide obtained by reacting epoxy resin and polyamide; (iii) polyfunctional epoxy resin; and (iv) curing agent. Preferably, the denatured polyamide includes a polyalkylene-glycol residue or a polycarbonate-diol residue. Preferably, the high polymer epoxy resin is produced by the polymerization of bifunctional epoxy resin and bifunctional phenol resin, and has a weight averaged molecular weight equal to 50,000 or higher.
    Type: Grant
    Filed: December 19, 1997
    Date of Patent: March 23, 1999
    Assignee: Hitachi Chemical Company, Ltd.
    Inventors: Atsushi Takahashi, Shinji Ogi, Koji Morita, Kazunori Yamamoto, Ken Nanaumi, Kiyoshi Hirosawa, Akinari Kida, Takao Hirayama, Toshihiko Ito, Hiroaki Hirakura
  • Patent number: 5166288
    Abstract: A coating composition for coating a metal plate, and containing (i) 100 parts by weight of a polyester-melamine resin composed of (a) a polyester resin having a glass transition temperature of 5.degree. to 40.degree. C. and a number average molecular weight of 15,000 to 30,000 and (b) a melamine resin at a weight ratio (a)/(b) of 75/25 to 55/45 and (ii) 1 to 2 parts by weight of an amine-blocked derivative of a long-chain alkylbenzenesulfonic acid.
    Type: Grant
    Filed: December 26, 1989
    Date of Patent: November 24, 1992
    Assignee: Nippon Steel Corporation
    Inventors: Hiroshi Kanai, Joji Oka, Takao Hirayama, Tsuneo Tanuma
  • Patent number: 4309330
    Abstract: A copolymer emulsion comprising (I) a copolymer obtained by copolymerizing (A) a dicyclopentadiene derivative, (B), an .alpha.,.beta.-unsaturated monomer having one or more OH groups, (C) an .alpha.,.beta.-unsaturated monomer copolymerizable with the components (A) and (B), followed by the reaction of the resulting copolymer with (D) a partial allyl ether of polyhydric alcohol having one or more terminal isocyanate groups, and (II) water can be cross-linked and cured at normal temperatures to give coating films particularly excellent in hardness, water resistance, corrosion resistance and solvent resistance.
    Type: Grant
    Filed: February 19, 1981
    Date of Patent: January 5, 1982
    Assignee: Hitachi Chemical Company Ltd.
    Inventors: Ryoji Ukita, Takao Hirayama
  • Patent number: 4301048
    Abstract: A water-dispersed resin composition obtained by dispersing in water a neutralized resin prepared by neutralizing a part or whole of the carboxyl groups in an alkyd resin produced by reacting (A) an oil or fatty acid, (B) tris(2-hydroxyethyl)isocyanurate and/or tris(hydroxymethyl)isocyanurate, (C) a polyhydric alcohol, (D) a monobasic acid, (E) a polybasic acid and (F) polyethylene glycol, wherein individual components (A) to (F) are formulated in terms of the ratio of the number of hydroxyl groups/the number of carboxyl groups in the range of 1.0/1 to 1.6/1 and said alkyd resin has an acid value of 30 or less, is excellent in drying properties and in film properties such as gloss, water resistance, etc.
    Type: Grant
    Filed: September 5, 1980
    Date of Patent: November 17, 1981
    Assignee: Hitachi Chemical Company, Ltd.
    Inventors: Takao Hirayama, Minoru Fujishima, Hisasi Kaneko, Shigeyoshi Tanaka
  • Patent number: 4154709
    Abstract: A water-dispersible epoxy modified alkyd resin produced by reacting (A) 0-50 parts by weight of oil or oil fatty acid, (B) 10-50 parts by weight of polyhydric alcohol, (C) 0-25 parts by weight of monobasic acid having 6 to 18 carbon atoms, (D) 15-70 parts by weight of polybasic acid having 4 to 10 carbon atoms or its anhydride, (E) 5-25 parts by weight of polyoxyalkylene glycol having a molecular weight of 600 to 20,000, and (F) an epoxy compound, wherein the ratio of the hydroxyl groups to the carboxyl groups in the components (A) through (E) is 0.625-1.8 and the amount of the component (F) is 3-50 parts by weight per 100 parts by weight of the total weight of the components (A) through (E), can provide water-dispersible coatings having improved drying characteristics and water resistance as well as corrosion resistance.
    Type: Grant
    Filed: March 6, 1978
    Date of Patent: May 15, 1979
    Assignee: Hitachi Chemical Company, Ltd.
    Inventors: Ryoji Ukita, Asao Isobe, Takao Hirayama, Shigeyoshi Tanaka