Patents by Inventor Takao Kawaki

Takao Kawaki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5543474
    Abstract: There is provided a resin composition having well balanced moldability, heat resistance and mechanical strength, which comprises (A) all aromatic polyamideimide resin and (B) a Polyester resin, (C) a polyphenylene sulfide resin or (D) a resin capable of forming an anisotropic molten phase, said aromatic polyamideimide resin containing 5 to 95 mol % of a recurring unit of the formula (1) and 5 to 95 mol % of at least one of a recurring unit of the formula (2) and a recurring unit of the formula (3). Said aromatic polyamideimide resin is prepared by conducting a polymerization reaction of an aromatic tricarboxylic acid anhydride and at least any one of all aromatic dicarboxylic acid and an aliphatic dicarboxylic acid with a diisocyanate compound in plural steps in which in the first step the polymerization reaction is conducted in a temperature range of 50.degree. to 110.degree. C. and in the second and subsequent steps the polymerization reaction is conducted in a temperature range of higher than 110.degree.
    Type: Grant
    Filed: October 17, 1994
    Date of Patent: August 6, 1996
    Assignee: Mitsubishi Gas Company, Inc.
    Inventors: Takao Kawaki, Akikazu Amagai, Toshiaki Yamada, Hidefumi Harada, Hajime Ban, Yuji Takeda, Koji Yamamoto
  • Patent number: 5387652
    Abstract: A resin composition comprising a melt-kneaded product of (A) an aromatic polyamideimide resin (Component A) which is obtained by polymerizing an aromatic tricarboxylic acid anhydride and a diisocyanate in a solvent under conditions where an amide group is substantially formed first and then an imide group is formed, and which has at least one recurring unit of the formula (1), ##STR1## wherein Ar is a trivalent aromatic hydrocarbon group having at least one 6-membered carbon ring, and R is a divalent aromatic hydrocarbon group or an aliphatic hydrocarbon group, and (B) a polyphenylene sulfide resin (Component B); and the molded article obtained by molding said resin composition.
    Type: Grant
    Filed: September 22, 1993
    Date of Patent: February 7, 1995
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Takao Kawaki, Akikazu Amagai, Toshiaki Yamada, Hidefumi Harada, Hajime Ban
  • Patent number: 5380907
    Abstract: A process for producing an aromatic carbonate which comprises:reacting(a) an aromatic hydroxy compound with(b) carbon monoxide in the presence of(c) an oxidation agent,(d) a catalyst comprising a palladium compound or impregnated palladium catalyst,(e) a co-catalyst comprising a manganese compound, a cobalt compound or a copper compound, and(f) at least one nitrile compoundat a temperature of 20.degree. to 300.degree. C.
    Type: Grant
    Filed: June 1, 1993
    Date of Patent: January 10, 1995
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Masamichi Mizukami, Katsushige Hayashi, Katsuhiro Iura, Takao Kawaki
  • Patent number: 5321097
    Abstract: A heat-resistant resin composition comprising a melt-kneaded product of:(A) at least one member selected from the group consisting of a polyamideimide resin precursor composed mainly of a recurring unit of the formula (1)-a, ##STR1## wherein R is a divalent aromatic group or aliphatic group, R.sup.1 is a hydrogen atom, an alkyl group or a phenyl group, and Ar is a trivalent aromatic group composed of at least one six-membered ring, and a polyamideimide resin composed mainly of a recurring unit of the formula (1)-b, ##STR2## wherein R, R.sup.1 and Ar are as defined in the above formula (1)-a, (B) a polyphenylene sulfide resin, and(C) an organic isocyanate compound having at least two isocyanate groups in the molecule, the amount of said organic isocyanate compound being 0.5 to 5 parts by weight based on 100 parts by weight of the total amount of the compounds (A) and (B).
    Type: Grant
    Filed: April 30, 1993
    Date of Patent: June 14, 1994
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Takao Kawaki, Akikazu Amagai, Masahiko Ishikawa, Toshiaki Yamada, Yasuhiro Hirai, Hajime Ban
  • Patent number: 5310944
    Abstract: A process for producing a carboxylated compound, which comprises reacting a carbonyl compound with hydrogen peroxide in the presence of an organo-arsenic acid of the formula (1), ##STR1## wherein: R.sup.1 is a C.sub.1 -C.sub.12 alkyl group which may be substituted or an aryl group which may be substituted,R.sup.2 is a hydroxyl group or the same group as that which defines R.sup.1,or alternatively, R.sup.1 and R.sup.2 may bond to each other to form a five-membered or six-membered ring together with As atoms to which these groups are bonded, andthe substituent(s) substituted on the above groups is/are selected from hydroxyl, carboxyl, carbonyl, sulfonyl, sulfonium, an amino group, an ammonium group, an alkyl group, an alkoxyl group and a halogen atom,while a water concentration in a reaction system is maintained at not more than 2% by weight, thereby to form a corresponding carboxylated compound.
    Type: Grant
    Filed: January 17, 1992
    Date of Patent: May 10, 1994
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Takao Kawaki, Yuh Miyauchi, Toshio Watanabe, Katsushige Hayashi, Satoshi Ueno, Hiroshi Ogawa, Fumiya Zaima
  • Patent number: 5051309
    Abstract: An anti-dazzling polycarbonate polarizing plate is formed with a polarizing thin layer composed of a polymeric film having a dichroic substance adsorbed on and oriented in the polymeric film, and a polycarbonate sheet having a retardation value of at least 2000 nm bonded to one or both surfaces of the polarizing thin layer.
    Type: Grant
    Filed: April 20, 1990
    Date of Patent: September 24, 1991
    Assignee: Mitsubishi Gas Chemical Co., Inc.
    Inventors: Takao Kawaki, Ryozo Kawai, Katsushige Hayashi, Masaki Nagata
  • Patent number: 5034492
    Abstract: A novel sulfur-containing aromatic vinyl compound represented by the following general formula (I) ##STR1## wherein R.sub.1 represents an alkylene group having 1 to 3 carbon atoms and R.sub.2 represents an alkylene group having 2 to 8 carbon atoms, and the two bonds in the benzene ring are meta or para to each other. A curable composition comprising at least one of the said vinyl compounds, an isocyanate compound and a radical polymerization initiator. On heating, the composition gives a crosslinked polymer article useful as lenses.
    Type: Grant
    Filed: June 1, 1990
    Date of Patent: July 23, 1991
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Takao Kawaki, Makoto Kobayashi, Osamu Aoki, Tatsuo Iwai, Yukifumi Goto
  • Patent number: 4939218
    Abstract: A sulfur-containing aliphatic acrylic compound represented by the following general formula [I] ##STR1## wherein R.sup.1 represents a hydrogen atom or a methyl group, R.sup.2 represents an aliphatic hydrocarbon group having 1 to 8 carbon atoms, and R.sup.3 represents an aliphatic hydrocarbon group having 1 to 8 carbon atoms which may contain oxygen or sulfur in the main chain; a crosslinked polymer article obtained by polymerizing and curing a monomeric mixture composed of 100 to 60% by weight of at least one sulfur-containing aliphatic acrylic compound represented by the general formula [I] and 0 to 40% by weight of another copolymerizable monomer containing an ethylenic bond in a mold together with a radical initiator; a lens composed of the cross-linked polymer article thereof; and a process for producing a crosslinked polymer article thereof.
    Type: Grant
    Filed: November 10, 1988
    Date of Patent: July 3, 1990
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Takao Kawaki, Makoto Kobayashi, Osamu Aoki, Yoshie Hiramatsu
  • Patent number: 4910283
    Abstract: An aromatic-aliphatic polycarbonate copolymer having a structural unit represented by the formula (1) ##STR1## and a structural unit represented by the formula (2) ##STR2## the molar function of the structural unit represented by the formula (1) being 70 to 10%, and the reduced viscosity as determined at 20.degree. C. in a 0.2 g/dl solution of the copolymer in methylene chloride as a solvent being 0.3 to 1.0 dl/g.
    Type: Grant
    Filed: September 7, 1988
    Date of Patent: March 20, 1990
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Takao Kawaki, Sumio Iwao, Nobuhiro Shintani
  • Patent number: 4888401
    Abstract: A resin composition for optics is disclosed, which mainly comprises a graft copolymer comprising a styrene resin and an aromatic polycarbonate each having a specific molecular weight at a specific ratio of molecular weight and weight, said composition having a micro disperse phase of not more than 0.5 .mu.m. The resin composition has a reduced optical strain and an excellent micro disperse phase and is, therefore, suitable for use as optics.
    Type: Grant
    Filed: June 6, 1988
    Date of Patent: December 19, 1989
    Assignee: Mitsubishi Gas Chemical Co., Ltd.
    Inventors: Takao Kawaki, Yasuhiko Kijima, Yuh Miyauchi, Eizi Ukita, Toru Nakajima, Mituhiko Masumoto
  • Patent number: 4861854
    Abstract: A photosensitive polyimide precursor composed of the structural units (A) represented by the following general formula (I) and the structural units (B) represented by the following general formula (II), in which the ratio of the molar quantity of the structural units (A) to the sum of the molar quantity of the structural units (A) and that of the structural units (B) is 0.01 or greater, and having a viscosity of 100 cP or above as measured at 25.degree. C. in the state of a 10% by weight solution in N-methylpyrrolidone: ##STR1## wherein R.sub.1 represents a tetravalent aromatic hydrocarbon residue; R.sub.2 represents a divalent aromatic hydrocarbon residue; X, identical or different represents a halogen or an alkyl group; and m represents 0 or an integer from 1 to 4. The photosensitivity of the present photosensitive polyimide precursor is about 20 to 100 times that of conventional products. After heat dehydration cyclization, it shows a heat resistance of 400.degree. C. or above.
    Type: Grant
    Filed: June 1, 1988
    Date of Patent: August 29, 1989
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Akitoshi Sugio, Takao Kawaki, Makoto Kobayashi, Katsushige Hayashi, Masahito Watanabe
  • Patent number: 4670535
    Abstract: The photosensitive polyimide precursor of the invention has a recurring unit represented by the following general formula [I]: ##STR1## (R.sub.1 represents a tetravalent aromatic hydrocarbon residue; R.sub.2 and R.sub.3 each represent a divalent aromatic or aliphatic hydrocarbon residue; and R.sub.4 represents a divalent aromatic hydrocarbon residue represented by ##STR2## wherein R.sub.5, R.sub.6, R.sub.7, R.sub.8, R.sub.9, R.sub.10, R.sub.11 and R.sub.12, identical or different, each represent hydrogen atom, a halogen group or an alkyl group). The photosensitive polyimide precursor of the invention has a viscosity of 50 centipoises or above as measured at 23.degree. C. in the state of a 10% (by weight) solution in N,N-dimethylacetamide. Its photosensitivity is as high as about 20-100 times that of prior products. After heat cyclization, it exhibits a heat resistance of 400.degree. C. or above.
    Type: Grant
    Filed: June 17, 1986
    Date of Patent: June 2, 1987
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Akitoshi Sugio, Takao Kawaki, Katsushige Hayashi
  • Patent number: 4246398
    Abstract: A method for recovering polyphenylene oxide having a high bulk density and a reduced content of fine particles from a solution of a polyphenylene oxide, which comprises adding a non-solvent composed of a lower alkyl alcohol and water to an aromatic solvent solution of a polyphenylene oxide substantially free from impurities to precipitate the polyphenylene oxide, the weight ratio of the aromatic solvent to the lower alkyl alcohol being from 1:1 to 1:2 and the weight ratio of the lower alkyl alcohol to water being from 1:0.005 to 1:0.1 in the precipitation system, and the addition of the non-solvent being controlled such that a liquid composition of the aromatic solvent, the lower alkyl alcohol and water forms a single phase; and recovering the precipitated polyphenylene oxide.
    Type: Grant
    Filed: May 2, 1979
    Date of Patent: January 20, 1981
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Akitoshi Sugio, Atsuo Kuramoto, Takao Kawaki, Hiroyuki Urabe, Tatsuhiko Kurihara, Isamu Masumoto, Akio Hasebe
  • Patent number: 4038343
    Abstract: A resin composition comprising (A) 5 to 95 parts by weight of a copolyphenylene ether derived from a mixture of 50 to 98 mole% of a 2,6-dialkylphenol and 2 to 50 mole% of a 2,3,6-trialkylphenol and (B) 5 to 95 parts by weight of a styrene resin. The composition has superior thermal resistance and oxidation stability under heat and satisfactory mechanical properties, and retains these desirable properties after heat-aging. The composition is suitable for preparation of molded articles.
    Type: Grant
    Filed: October 17, 1975
    Date of Patent: July 26, 1977
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Eiichi Yonemitsu, Akitoshi Sugio, Masanobu Masu, Takao Kawaki, Yukio Sasaki
  • Patent number: 4011200
    Abstract: A polyphenylene ether random copolymer excelling in heat resistance and resistance to solvents, said copolymer being composed of 50-98 mol% of a structural unit of the formula ##STR1## derived from 2,6-dimethyl phenol and 50-2 mol% of a structural unit of the formula ##STR2## derived from 2,3,6-trimethylphenol, each of said structural units being randomly arranged in the polymeric structure, said copolymer having an intrinsic viscosity, as measured in chloroform at 25.degree. C., of at least 0.3 dl/g.
    Type: Grant
    Filed: March 4, 1975
    Date of Patent: March 8, 1977
    Assignee: Mitsubishi Gas Chemical Co., Ltd.
    Inventors: Eiichi Yonemitsu, Akitoshi Sugio, Takao Kawaki
  • Patent number: 3970640
    Abstract: Polyphenylene ethers, self-condensation products of phenols, having desired polymerization degree are prepared by a process which comprises terminating the reaction by adding simultaneously at least one member selected from the class consisting of dioxybenzenes and/or benzoquinones and a reducing agent to the reaction medium at the stage of the desired polymerization degree in the oxidative polycondensation of phenols in the presence of a complex catalyst.
    Type: Grant
    Filed: June 26, 1974
    Date of Patent: July 20, 1976
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Eiichi Yonemitsu, Akitoshi Sugio, Takao Kawaki, Akihiko Konishi, Zempei Mizutani