Patents by Inventor Takao Kokubun

Takao Kokubun has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10175584
    Abstract: An optical element is used for an exposure apparatus which is configured to illuminate a mask with an exposure light beam for transferring a pattern on the mask onto a substrate through a projection optical system and to interpose a given liquid in a space between a surface of the substrate and the projection optical system. The optical element includes a first anti-dissolution member provided on a surface of a transmissive optical element on the substrate's side of the projection optical system.
    Type: Grant
    Filed: October 17, 2013
    Date of Patent: January 8, 2019
    Assignee: NIKON CORPORATION
    Inventors: Takeshi Shirai, Takao Kokubun, Hitoshi Ishizawa, Atsunobu Murakami
  • Patent number: 9046796
    Abstract: An optical element is used for an exposure apparatus which is configured to illuminate a mask with an exposure light beam for transferring a pattern on the mask onto a substrate through a projection optical system and to interpose a given liquid in a space between a surface of the substrate and the projection optical system. The optical element includes a first anti-dissolution member provided on a surface of a transmissive optical element on the substrate's side of the projection optical system.
    Type: Grant
    Filed: February 28, 2012
    Date of Patent: June 2, 2015
    Assignee: NIKON CORPORATION
    Inventors: Takeshi Shirai, Takao Kokubun, Hitoshi Ishizawa, Atsunobu Murakami
  • Patent number: 8724075
    Abstract: An optical element includes a base material, a liquid-repellent member provided on at least a part of a surface of the base material, and a light-reducing member provided between the base material and the liquid-repellent member to protect the liquid-repellent member from radiation of light by reducing the light. The optical element is usable for a liquid immersion exposure apparatus for exposing a substrate through a liquid. It is possible to avoid any inflow of the liquid in a liquid immersion area into an unexpected place via the optical element.
    Type: Grant
    Filed: September 13, 2010
    Date of Patent: May 13, 2014
    Assignee: Nikon Corporation
    Inventors: Takao Kokubun, Ryuichi Hoshika
  • Publication number: 20140043592
    Abstract: An optical element is used for an exposure apparatus which is configured to illuminate a mask with an exposure light beam for transferring a pattern on the mask onto a substrate through a projection optical system and to interpose a given liquid in a space between a surface of the substrate and the projection optical system. The optical element includes a first anti-dissolution member provided on a surface of a transmissive optical element on the substrate's side of the projection optical system.
    Type: Application
    Filed: October 17, 2013
    Publication date: February 13, 2014
    Applicant: NIKON CORPORATION
    Inventors: Takeshi SHIRAI, Takao KOKUBUN, Hitoshi ISHIZAWA, Atsunobu MURAKAMI
  • Publication number: 20120212716
    Abstract: An optical element is used for an exposure apparatus which is configured to illuminate a mask with an exposure light beam for transferring a pattern on the mask onto a substrate through a projection optical system and to interpose a given liquid in a space between a surface of the substrate and the projection optical system. The optical element includes a first anti-dissolution member provided on a surface of a transmissive optical element on the substrate's side of the projection optical system.
    Type: Application
    Filed: February 28, 2012
    Publication date: August 23, 2012
    Applicant: NIKON CORPORATION
    Inventors: Takeshi SHIRAI, Takao KOKUBUN, Hitoshi ISHIZAWA, Atsunobu MURAKAMI
  • Publication number: 20120206705
    Abstract: An optical element is used for an exposure apparatus which is configured to illuminate a mask with an exposure light beam for transferring a pattern on the mask onto a substrate through a projection optical system and to interpose a given liquid in a space between a surface of the substrate and the projection optical system. The optical element includes a first anti-dissolution member provided on a surface of a transmissive optical element on the substrate's side of the projection optical system.
    Type: Application
    Filed: April 18, 2012
    Publication date: August 16, 2012
    Applicant: NIKON CORPORATION
    Inventors: Takeshi SHIRAI, Takao KOKUBUN, Hitoshi ISHIZAWA, Atsunobu MURAKAMI
  • Patent number: 8189170
    Abstract: An optical element is used for an exposure apparatus which is configured to illuminate a mask with an exposure light beam for transferring a pattern on the mask onto a substrate through a projection optical system and to interpose a given liquid in a space between a surface of the substrate and the projection optical system. The optical element includes a first anti-dissolution member provided on a surface of a transmissive optical element on the substrate's side of the projection optical system.
    Type: Grant
    Filed: February 25, 2010
    Date of Patent: May 29, 2012
    Assignee: Nikon Corporation
    Inventors: Takeshi Shirai, Takao Kokubun, Hitoshi Ishizawa, Atsunobu Murakami
  • Patent number: 8149381
    Abstract: An optical element is used for an exposure apparatus which is configured to illuminate a mask with an exposure light beam for transferring a pattern on the mask onto a substrate through a projection optical system and to interpose a given liquid in a space between a surface of the substrate and the projection optical system. The optical element includes a first anti-dissolution member provided on a surface of a transmissive optical element on the substrate's side of the projection optical system.
    Type: Grant
    Filed: May 2, 2006
    Date of Patent: April 3, 2012
    Assignee: Nikon Corporation
    Inventors: Takeshi Shirai, Takao Kokubun, Hitoshi Ishizawa, Atsunobu Murakami
  • Patent number: 7993008
    Abstract: An optical element is used for an exposure apparatus which is configured to illuminate a mask with an exposure light beam for transferring a pattern on the mask onto a substrate through a projection optical system and to interpose a given liquid in a space between a surface of the substrate and the projection optical system. The optical element includes a first anti-dissolution member provided on a surface of a transmissive optical element on the substrate's side of the projection optical system.
    Type: Grant
    Filed: November 14, 2008
    Date of Patent: August 9, 2011
    Assignee: Nikon Corporation
    Inventors: Takeshi Shirai, Takao Kokubun, Hitoshi Ishizawa, Atsunobu Murakami
  • Publication number: 20110013160
    Abstract: An optical element includes a base material, a liquid-repellent member provided on at least a part of a surface of the base material, and a light-reducing member provided between the base material and the liquid-repellent member to protect the liquid-repellent member from radiation of light by reducing the light. The optical element is usable for a liquid immersion exposure apparatus for exposing a substrate through a liquid. It is possible to avoid any inflow of the liquid in a liquid immersion area into an unexpected place via the optical element.
    Type: Application
    Filed: September 13, 2010
    Publication date: January 20, 2011
    Applicant: NIKON CORPORATION
    Inventors: Takao Kokubun, Ryuichi Hoshika
  • Patent number: 7812926
    Abstract: An optical element includes a base material, a liquid-repellent member provided on at least a part of a surface of the base material, and a light-reducing member provided between the base material and the liquid-repellent member to protect the liquid-repellent member from radiation of light by reducing the light. The optical element is usable for a liquid immersion exposure apparatus for exposing a substrate through a liquid. It is possible to avoid any inflow of the liquid in a liquid immersion area into an unexpected place via the optical element.
    Type: Grant
    Filed: August 30, 2006
    Date of Patent: October 12, 2010
    Assignee: Nikon Corporation
    Inventors: Takao Kokubun, Ryuichi Hoshika
  • Publication number: 20100220305
    Abstract: An optical element is used for an exposure apparatus which is configured to illuminate a mask with an exposure light beam for transferring a pattern on the mask onto a substrate through a projection optical system and to interpose a given liquid in a space between a surface of the substrate and the projection optical system. The optical element includes a first anti-dissolution member provided on a surface of a transmissive optical element on the substrate's side of the projection optical system.
    Type: Application
    Filed: February 25, 2010
    Publication date: September 2, 2010
    Applicant: NIKON CORPORATION
    Inventors: Takeshi Shirai, Takao Kokubun, Hitoshi Ishizawa, Atsunobu Murakami
  • Patent number: 7697111
    Abstract: An optical element is used for an exposure apparatus which is configured to illuminate a mask with an exposure light beam for transferring a pattern on the mask onto a substrate through a projection optical system and to interpose a given liquid in a space between a surface of the substrate and the projection optical system. The optical element includes a first anti-dissolution member provided on a surface of a transmissive optical element on the substrate's side of the projection optical system.
    Type: Grant
    Filed: August 26, 2004
    Date of Patent: April 13, 2010
    Assignee: Nikon Corporation
    Inventors: Takeshi Shirai, Takao Kokubun, Hitoshi Ishizawa, Atsunobu Murakami
  • Publication number: 20090103070
    Abstract: An optical element is used for an exposure apparatus which is configured to illuminate a mask with an exposure light beam for transferring a pattern on the mask onto a substrate through a projection optical system and to interpose a given liquid in a space between a surface of the substrate and the projection optical system. The optical element includes a first anti-dissolution member provided on a surface of a transmissive optical element on the substrate's side of the projection optical system.
    Type: Application
    Filed: November 14, 2008
    Publication date: April 23, 2009
    Applicant: Nikon Corporation
    Inventors: Takeshi Shirai, Takao Kokubun, Hitoshi Ishizawa, Atsunobu Murakami
  • Publication number: 20070201011
    Abstract: An optical element includes a base material, a liquid-repellent member provided on at least a part of a surface of the base material, and a light-reducing member provided between the base material and the liquid-repellent member to protect the liquid-repellent member from radiation of light by reducing the light. The optical element is usable for a liquid immersion exposure apparatus for exposing a substrate through a liquid. It is possible to avoid any inflow of the liquid in a liquid immersion area into an unexpected place via the optical element.
    Type: Application
    Filed: August 30, 2006
    Publication date: August 30, 2007
    Applicant: NIKON CORPORATION
    Inventors: Takao Kokubun, Ryuichi Hoshika
  • Publication number: 20060203218
    Abstract: An optical element is used for an exposure apparatus which is configured to illuminate a mask with an exposure light beam for transferring a pattern on the mask onto a substrate through a projection optical system and to interpose a given liquid in a space between a surface of the substrate and the projection optical system. The optical element includes a first anti-dissolution member provided on a surface of a transmissive optical element on the substrate's side of the projection optical system.
    Type: Application
    Filed: May 2, 2006
    Publication date: September 14, 2006
    Applicant: NIKON CORPORATION
    Inventors: Takeshi Shirai, Takao Kokubun, Hitoshi Ishizawa, Atsunobu Murakami