Abstract: A light emitting element includes: a substrate; a first emission part and a second emission part disposed on the substrate, each comprising a first semiconductor layer of a first conductivity type, a second semiconductor layer of a second conductivity type, and an active layer positioned between the first semiconductor layer and the second semiconductor layer; an insulation layer covering the first emission part and the second emission part and including: a plurality of first openings that includes multiple first openings located above the first semiconductor layer of the first emission part and multiple first openings located above the first semiconductor layer of the second emission part, and a plurality of second openings that include at least one second opening located above the second semiconductor layer of the first emission part and at least one second opening located above the second semiconductor layer of the second emission part.

Abstract: A light emitting element includes: a semiconductor stack structure including: a first semiconductor layer of a first conductivity type, which, in a top plan view, has a first portion, and a second portion within the first portion, a second semiconductor layer of a second conductivity type disposed on the second portion, and an active layer. The first portion has a peripheral portion positioned at a periphery of the second portion, and a plurality of extended portions extending from the peripheral portion towards the second portion in a top plan view. An insulation layer covers the semiconductor stack structure and has first through holes in the extended portions and a second through hole above the second semiconductor layer. A first electrode is electrically connected to the first semiconductor layer at the first through holes. A second electrode is electrically connected to the second semiconductor layer at the second through hole.

Abstract: The light emitting element includes: first and second light emitting cells each including an n-side semiconductor layer, an active layer and a p-side semiconductor layer; a first insulating film covering the first and second light emitting cells, and provided with first p-side and first n-side openings; a wiring electrode connected to the first light emitting cell at the first n-side opening, and connected to the second light emitting cell at the first p-side opening; a first electrode connected to the first light emitting cell; a second electrode connected to the second light emitting cell; a second insulating film provided with a second p-side opening formed above the first electrode, a second n-side opening formed above the second electrode, and a third opening formed above the wiring electrode; a first external connection portion connected to the first electrode; and a second external connection portion connected to the second electrode.

Abstract: The light emitting element includes: first and second light emitting cells each including an n-side semiconductor layer, an active layer and a p-side semiconductor layer; a first insulating film covering the first and second light emitting cells, and provided with first p-side and first n-side openings; a wiring electrode connected to the first light emitting cell at the first n-side opening, and connected to the second light emitting cell at the first p-side opening; a first electrode connected to the first light emitting cell; a second electrode connected to the second light emitting cell; a second insulating film provided with a second p-side opening formed above the first electrode, a second n-side opening formed above the second electrode, and a third opening formed above the wiring electrode; a first external connection portion connected to the first electrode; and a second external connection portion connected to the second electrode.

Abstract: It is an object of the present invention to provide a nitride semiconductor element, which uses Si as a substrate, and whose voltage in the forward direction (Vf) is lower than in the prior art. In the nitride semiconductor element which has a nitride semiconductor layer over an Si substrate, at least a portion of the Si substrate and the nitride semiconductor layer are included in an current pass region, and the electrical conductivity type of the current pass region on the Si substrate is p-type. Furthermore, in the nitride semiconductor element which has a nitride semiconductor layer over an Si substrate, at least a portion of the Si substrate and the nitride semiconductor layer are included in an current pass region, and the majority carriers of the current pass region of the Si substrate are holes.

Abstract: It is an object of the present invention to provide a nitride semiconductor element, which uses Si as a substrate, and whose voltage in the forward direction (Vf) is lower than in the prior art. In the nitride semiconductor element which has a nitride semiconductor layer over an Si substrate, at least a portion of the Si substrate and the nitride semiconductor layer are included in an current pass region, and the electrical conductivity type of the current pass region on the Si substrate is p-type. Furthermore, in the nitride semiconductor element which has a nitride semiconductor layer over an Si substrate, at least a portion of the Si substrate and the nitride semiconductor layer are included in an current pass region, and the majority carriers of the current pass region of the Si substrate are holes.