Patents by Inventor Takao Mitsukura

Takao Mitsukura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20120193506
    Abstract: The present invention relates to a substrate processing apparatus which can improve a tact time of substrate processing. A polishing apparatus as the substrate processing apparatus includes plural polishing sections each for polishing a semiconductor wafer (W), and a swing transporter for transferring the wafer (W). The swing transporter includes a wafer clamp mechanism adapted to clamp the wafer (W), a vertically moving mechanism for vertically moving the wafer clamp mechanism along a frame of a casing of the polishing section, and a swing mechanism for swinging the wafer clamp mechanism about a shaft adjacent to the frame.
    Type: Application
    Filed: February 24, 2012
    Publication date: August 2, 2012
    Inventors: Nobuyuki TAKAHASHI, Hiroaki Nishida, Hiroomi Torii, Soichi Isobe, Tadakazu Sone, Ryuichi Kosuge, Hiroyuki Kaneko, Hiroshi Sotozaki, Takao Mitsukura, Takahiro Ogawa, Kenichi Sugita
  • Publication number: 20090067959
    Abstract: The present invention relates to a substrate processing apparatus which can improve a tact time of substrate processing. A polishing apparatus as the substrate processing apparatus includes plural polishing sections (3a, 3b) each for polishing a semiconductor wafer (W), and a swing transporter (7) for transferring the wafer (W). The swing transporter (7) includes a wafer clamp mechanism (112) adapted to clamp the wafer (W), a vertically moving mechanism (104, 106) for vertically moving the wafer clamp mechanism (112) along a frame (102) of a casing of the polishing section (3a), and a swing mechanism (108, 110) for swinging the wafer clamp mechanism (112) about a shaft adjacent to the frame (102).
    Type: Application
    Filed: February 21, 2007
    Publication date: March 12, 2009
    Inventors: Nobuyuki Takahashi, Hiroaki Nishida, Hiroomi Torii, Soichi Isobe, Tadakazu Sone, Ryuichi Kosuge, Hiroyuki Kaneko, Hiroshi Sotozaki, Takao Mitsukura, Takahiro Ogawa, Kenichi Sugita
  • Patent number: 5779426
    Abstract: A polishing apparatus has a turntable and a top ring for gripping a semiconductor wafer to be polished by an abrasive cloth on the turntable. The polishing apparatus incorporates a loading and unloading unit having a supply holder for holding and supplying a semiconductor wafer to be polished to the top ring at a transfer position, and a reception holder for receiving a polished semiconductor wafer from the top ring at the transfer position. The reception holder and the supply holder are mounted on respective opposite ends of a support block which is angularly movable in a vertical plane by a turning mechanism for moving the supply holder and the reception holder alternatively to the transfer position.
    Type: Grant
    Filed: July 8, 1996
    Date of Patent: July 14, 1998
    Assignee: Ebara Corporation
    Inventors: Seiji Ishikawa, Takao Mitsukura