Abstract: An LED light source module includes a circuit board, solid-state light emitting elements arranged on the circuit board, a heatsink disposed in contact with the circuit board and having a channel formed inside, through which refrigerant flows, and a switching unit configured to switch a flow direction of refrigerant through the channel to an opposite direction.

Abstract: An LED light source module includes a circuit board, solid-state light emitting elements arranged on the circuit board, a heatsink disposed in contact with the circuit board and having a channel formed inside, through which refrigerant flows, and a switching unit configured to switch a flow direction of refrigerant through the channel to an opposite direction.

Abstract: The objective of the present invention is to enable accurate detection of a mismatch during electric resistance welding.

Abstract: An electric resistance welding operation management device manages a welding operation during manufacture of electric resistance welded steel pipe, in which heat is input to a steel plate, that is being conveyed along a specific conveyance direction and formed into a circular tube shape while pressing side faces of the metal plate with a pair of squeeze rolls, to weld together two circumferential direction edge portions of the metal plate converging in a V-shape. The electric resistance welding operation management device includes an image input section that inputs plural images and each including a Vee convergence region of the steel plate. The electric resistance welding operation management device includes a welding point position derivation section that derives the position of a welding point.

Abstract: A split valve includes: an upper valve body having a spherical surface abutting on a seat surface of a discharge port to block the discharge port and a hollow on a lower surface; a lower valve body that blocks a receiving port by causing a spherical surface to abut on a seat surface of a receiving port and has a protrusion fitted to the hollow of the upper valve body on its upper surface, a shaft that rotates the lower valve body, an air supply/discharge mechanism that supplies/discharges an air pressure into/from a chamber defined by the protrusion and the hollow.

Abstract: Hydraulic cylinders of a conveying apparatus includes piston rods that extend in parallel, pistons, and cylinder tubes that have an internal pressure chamber partitioned into first and second pressure chambers. A pair of the hydraulic cylinders are arranged in parallel with an interval in a width direction of a conveyance path. The cylinder tube slidingly moves to the first pressure chamber side by supplying a hydraulic pressure to the first pressure chamber and discharging a hydraulic pressure from the second pressure chamber, and the cylinder tubes slidingly move to the second pressure chamber side by supplying a hydraulic pressure to the second pressure chamber and discharging a hydraulic pressure from the first pressure chamber. The workpiece is supported by a pair of the cylinder tubes.

Abstract: An operation management device performs an operation management for electric resistance welding in which a strip-shaped metal plate is formed to have a cylindrical shape in such a manner that both end portions of the metal plate gradually face each other while the metal plate is conveyed, and a Vee convergence section, which is a portion at which both of the end portions butt against each other while facing each other, is welded.

Abstract: An electric resistance welding operation management device 100 manages a welding operation during manufacture of electric resistance welded steel pipe, in which heat is input to a steel plate 1, that is being conveyed along a specific conveyance direction and formed into a circular tube shape while pressing side faces of the metal plate 1 with a pair of squeeze rolls 2a, 2b, to weld together two circumferential direction edge portions 11a, 11b of the metal plate 1 converging in a V-shape. The electric resistance welding operation management device 100 includes an image input means that inputs plural images, successively captured over 3 sec and each including a Vee convergence region of the steel plate 1.

Abstract: A split valve includes: an upper valve body having a spherical surface abutting on a seat surface of a discharge port to block the discharge port and a hollow on a lower surface; a lower valve body that blocks a receiving port by causing a spherical surface to abut on a seat surface of a receiving port and has a protrusion fitted to the hollow of the upper valve body on its upper surface, a shaft that rotates the lower valve body, an air supply/discharge mechanism that supplies/discharges an air pressure into/from a chamber defined by the protrusion and the hollow.

Abstract: Hydraulic cylinders of a conveying apparatus includes piston rods that extend in parallel, pistons, and cylinder tubes that have an internal pressure chamber partitioned into first and second pressure chambers. A pair of the hydraulic cylinders are arranged in parallel with an interval in a width direction of a conveyance path. The cylinder tube slidingly moves to the first pressure chamber side by supplying a hydraulic pressure to the first pressure chamber and discharging a hydraulic pressure from the second pressure chamber, and the cylinder tubes slidingly move to the second pressure chamber side by supplying a hydraulic pressure to the second pressure chamber and discharging a hydraulic pressure from the first pressure chamber. The workpiece is supported by a pair of the cylinder tubes.

Abstract: An operation management device performs an operation management for electric resistance welding in which a strip-shaped metal plate is formed to have a cylindrical shape in such a manner that both end portions of the metal plate gradually face each other while the metal plate is conveyed, and a Vee convergence section, which is a portion at which both of the end portions butt against each other while facing each other, is welded.

Abstract: A radiation-sensitive resin composition comprising an alkali-soluble novolak resin and a 1,2-quinonediazide compound, wherein the alakli-soluble novolak resin comprises a mixture of:95-50 parts by weight of Resin A having a standard polystyrene-reduced weight-average molecular weight of 2,000-20,000 ?Resin A is at least one resin selected from the group consisting of a resin obtained by polycondensation of m-cresol and at least one phenol represented by the structural formula (I) or (I'): ##STR1## wherein m is 2 or 3, with at least one aldehyde and a resin obtained by polycondensation of m-cresol, p-cresol and at least one phenol represented by the above structural formula (I) or (I') with at least one aldehyde! and5-50 parts by weight of Resin B having a standard polystyrene-reduced weight-average molecular weight of 200-2,000 ?Resin B is a resin obtained by polycondensation of at least one phenol represented by the structural formula (II): ##STR2## wherein n is 0, 1, 2 or 3, with at least one aldehyde!.

Abstract: A process for manufacturing a semiconductor device comprising: a substrate having an insulating layer and a semiconductor layer lying on the insulating layer, the semiconductor layer having been divided to form a plurality of isolated semiconductor lands by trenches extending through the semiconductor layer to the insulating layer; integrated circuits formed on the respective lands; and conductors running above and across the trenches to electrically connect the integrated circuits on the isolated semiconductor lands.

Abstract: A radiation sensitive resin composition useful as a negative type resist which can form a resist pattern having a good shape, has so high acid resistance as not to be affected by an etchant and a high adhesion to the substrate, and is endowed with so high a strippability as to be easily dissolved in a stripping solution consisting of an organoalkali. Said composition comprises (1) 100 parts by weight of an alkali-soluble novolak resin having a polystyrene reduced weight average molecular weight of 1,000 to 10,000, (2) 1 to 10 parts by weight of a compound having a methylol group and/or an alkoxymethyl group and being capable of cross-linking the alkali-soluble novolak resin (1) in the presence of an acid, and (3) 0.

Abstract: A transmission convergence sublayer multiplex generating apparatus includes a TC layer calculating section, a TC layer information storing section for storing TC layer information in correspondence with each path, and an ATM layer information storing section for storing ATM layer information in correspondence with each path.

Abstract: A chemically amplified resist comprising an alkali-soluble resin or a resin having at least one acid-dissociable group which is alkali-insoluble or -sprairingly soluble but becomes alkali-soluble upon dissociation of said acid dissociable group due to an acid; a radiation-sensitive, acid-generating agent; and an optional component in which resist, the radiation-sensitive, acid-generating agent generates an acid upon irradiation with a radiation in the irradiated portion and the solubility of the resin component and optional component in a developing solution is varied in the irradiated portion by a chemical reaction caused by the catalytic action of the acid, whereby a pattern is formed, characterized in that a compound having a nitrogen-containing basic group is contained in the resist.

Abstract: A reflection preventing film for forming a resist pattern and a process for forming the resist pattern using the film. The film comprises a copolymer was copolymerized of monomers which comprise at least one unsaturated carboxylic acid monomer, at least one epoxy group-containing unsaturated monomer, and at least one cinnamoylphenyl group-containing unsaturated monomer. The reflection preventing film exhibits a high halation preventing effect, involves no sublimation of radiation absorbing components contained therein, is free from occurrence of intermixing, possesses excellent heat resistance, exhibits a superb dry etching performance and storage stability, and produces resist patterns with excellent resolution and precision. The resist pattern forming process comprises forming the reflection preventing film on a substrate, forming a resist coating film on said reflection preventing film, irradiating the resist film with a radiation, and developing the resist coating film.

Abstract: A radiation sensitive resin composition which can be suitably used as a negative type resist having a high sensitivity, a high resolution, a high yield of residual film thickness and high thermal resistance, and which comprises (A) an alkali-soluble novolak resin, (B) a phenolic compound having a standard polystyrene-reduced weight average molecular weight of 10,000 or less such as polyvinylphenol, (C) a compound capable of cross-linking the component (A) and/or the component (B) in the presence of an acid, and (D) a radiation sensitive acid generator such as a triazine compound having a halomethyl group.

Abstract: A cylinder containing a piston rod to which a nozzle is attached, is fixed to the outside of a tank. A pressurized fluid is sprayed into the tank from the nozzle, and the piston rod elongates and contracts with the pressure of this fluid. Further provided are a first supply passage connecting a first pressure chamber formed around the piston rod in the cylinder to a pump, a return passage connecting a second pressure chamber on the opposite side of the piston rod to the tank, and a second supply passage connecting the second pressure chamber to the pump. A first valve is provided in the return passage, and a second valve is provided in the second supply passage.

Abstract: A radiation-sensitive composition comprising (A) a polymer having a recurring unit represented by formula (1): ##STR1## wherein R.sup.1 represents a substituted methyl group, a substituted ethyl group, a silyl group, a germyl group or an alkoxycarbonyl group, and R.sup.2 represents --OR.sup.3 or --NR.sup.4 R.sup.5 in which R.sup.3 is a hydrogen atom, a straight-chain alkyl group, a cyclic alkyl group, an aryl group, an aralkyl group, a substituted methyl group, a substituted ethyl group, a silyl group, a germyl group or an alkoxycarbonyl group, and R.sup.4 and R.sup.5, which may be the same or different, are hydrogen atoms, straight-chain alkyl groups, cyclic alkyl groups, aralkyl groups or aryl groups, and (B) a radiation-sensitive acid forming agent.