Abstract: A medical apparatus is provided which includes a usage detecting section which operates in connection with an operation of a medical device. A counting section stores a value corresponding to a number of operations of the usage detecting section.

Abstract: A plurality of pieces of medical equipment each of which includes a microcomputer and has a program used to control the microcomputer stored in a reproqrammable storage device such as an EEPROM is linked to a remote computer over a communication line. Using a rewriting/updating program sent from the computer, each piece of medical equipment rewrites or updates the program stored in the storage device. When a plurality of programs is stored, if one of the programs is rewritten or updated abnormally, the other program is used to activate medical equipment.

Abstract: An information offering method including: disclosing summary information about a designated product via a designated communication line; judging whether or not the user reading said summary information disclosed by said summary information disclosing step and desiring to read detailed product information about the product about which said summary information is disclosed is a user who is permitted to read detailed information; and disclosing detailed information about the product about which said summary information is disclosed, to the user who is judged to be permitted to read detailed information by said judgment step.

Abstract: In a plasma-CVD method and apparatus, plasma is formed from a film material gas in a process chamber and, in the plasma, a film is deposited on a substrate disposed in the process chamber. Formation of the plasma from the material gas is performed by application of an rf-power prepared by effecting an amplitude modulation on a basic rf-power having a frequency in a range from 10 MHz to 200 MHz. A modulation frequency of the amplitude modulation is in a range from 1/1000 to 1/10 of the frequency of the basic rf-power. Alternatively, the rf-power is prepared by effecting on the basic rf-power a first amplitude modulation at a frequency in a range from 1/1000 to 1/10 of the frequency of the basic rf-power, and additionally effecting a second amplitude modulation on the modulated rf-power. A modulation frequency of the second amplitude modulation is in a range from 1/100 to 100 times the modulation frequency of the first amplitude modulation.

Abstract: In a plasma processing apparatus, wherein a power application electrode for generating plasma and an electrode opposed thereto are disposed in a process chamber which can be exhausted to attain a predetermined vacuum pressure, an electric power is applied to the power application electrode to generate the plasma from a process gas introduced between the electrodes, and intended plasma processing is effected on a substrate mounted on one of the electrodes in the plasma, the apparatus includes a particle discharge duct which surrounds a periphery and a rear side of the power application electrode and has an opening at a position neighboring to the periphery of the power application electrode, and an exhaust device connected to the duct at a position corresponding to a central portion of the rear side of the power application electrode.