Patents by Inventor Takashi Genma

Takashi Genma has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5986760
    Abstract: A method of measuring a surface shape of a target surface, and a lens manufacturing process for manufacturing a lens having a surface shape figured to high-precision. The method and process includes the steps of first, interferometrically measuring the surface shape of the target surface or the lens surface. Then second, measuring a surface shape of a prototype target surface. Then third, determining a rotationally symmetric error component of the difference between the target surface shape or the lens surface shape and the prototype target surface shape. Then fourth, expressing the rotationally symmetric error as a sum of two components, one being slowly varying and the other being a remainder. The slowly varying component is at least determined by performing the third step, while the remainder component is determined by performing the first step.
    Type: Grant
    Filed: June 12, 1998
    Date of Patent: November 16, 1999
    Assignee: Nikon Corporation
    Inventors: Shigeru Nakayama, Takashi Genma, Tetsuji Onuki, Masami Ebi, Hajime Ichikawa
  • Patent number: 5774240
    Abstract: An exposure apparatus for reproducing a mask pattern onto a photo-sensitive surface of a substrate uses holographic techniques. The apparatus includes support for holding a hologram recording plate at a predetermined position during both a recording operation and a reconstructing operation. A first illuminating optical system introduces a light beam from a coherent light source to a mask and irradiates a subject beam produced from the mask into the recording plate. A second illuminating optical system irradiates the light beam from a coherent light source as a reference beam into the recording plate, a carrier apparatus disposes during the reconstructing operation, a substrate at the position of the mask, in place of the mask. A third illuminating optical system for irradiates a conjugate beam with the reference beam into the recording plate, in which a hologram has been formed by the recording operation, to form an image of the hologram on the photo-sensitive surface of the substrate.
    Type: Grant
    Filed: May 16, 1995
    Date of Patent: June 30, 1998
    Assignee: Nikon Corporation
    Inventors: Akihiro Goto, Takashi Genma, Yutaka Ichihara, Nobutaka Magome, Naomasa Shiraishi, Toshio Matsuura, Hiroshi Shirasu, Masami Ebi
  • Patent number: 5528390
    Abstract: An exposure apparatus for reproducing a mask pattern onto a photo-sensitive surface of a substrate using holographic techniques.
    Type: Grant
    Filed: June 5, 1995
    Date of Patent: June 18, 1996
    Assignee: Nikon Corporation
    Inventors: Akihiro Goto, Takashi Genma, Yutaka Ichihara, Nobutaka Magome, Naomasa Shiraishi, Toshio Matsuura, Hiroshi Shirasu, Masami Ebi