Patents by Inventor Takashi Hasaka

Takashi Hasaka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of producing polycrystalline silicon resistor
    Patent number: 5185285
    Abstract: A metal film and a polysilicon film are formed in one wiring, in that after a first polysilicon film is formed, an insulating film is formed on a region where a high-resistance portion of the polysilicon film is to be formed and, then, a metal film is deposited thereon. Then, the metal film deposited on the insulating film is removed. Thereafter, the wiring is formed by photolithography.
    Type: Grant
    Filed: May 30, 1991
    Date of Patent: February 9, 1993
    Assignee: Seiko Instruments, Inc.
    Inventor: Takashi Hasaka