Patents by Inventor Takashi Higaki

Takashi Higaki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of manufacturing an oxide-system dielectric thin film using CVD method
    Patent number: 5372850
    Abstract: In a process for manufacturing an oxide-system dielectric thin film using a raw material compound in which a metal atom is coupled with an organic group through oxygen atoms by the CVD method. A vapor of organic solvent having a boiling point less than 100.degree. C. contacts to the raw material compound at least in one of processes for vaporizing or transporting said raw material compound. The raw material compound of oxide-system dielectric thin film can be vaporized stably and transported to the reactor at a low temperature than before. Therefore, a composition can be controlled homogeneously and an oxide-system dielectric thin film having a good performance can be manufactured.
    Type: Grant
    Filed: February 17, 1993
    Date of Patent: December 13, 1994
    Assignee: Mitsubishi Denki Kabushiki Kaisha
    Inventors: Fusaoki Uchikawa, Shigeru Matsuno, Shin-ichi Kinouchi, Toshihisa Honda, Takeharu Kuroiwa, Hisao Watarai, Takashi Higaki