Patents by Inventor Takashi Iizumi

Takashi Iizumi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20050033465
    Abstract: The present invention provides a remote maintenance method, a remote maintenance system, and an industrial device for enabling control and thorough services and billing according to the contents of the remote maintenance operation and the request destination of maintenance and enabling access limit according to the attribute of a service person, access limit according to the device state, and output limit according to the output mode. The industrial device 123 installed at the factory 120 and the operation device 113 installed in the maintenance center 110 are connected via the network 100.
    Type: Application
    Filed: September 20, 2004
    Publication date: February 10, 2005
    Inventors: Juntaro Arima, Masaaki Inaba, Takeiki Aizono, Takashi Iizumi
  • Patent number: 6803573
    Abstract: An object of the present invention is to provide a scanning electron microscope for reducing a process concerning inspection positioning or an input operation, thereby functioning with high precision at high speed. To accomplish the above object, the present invention provides a scanning electron microscope having a function for identifying a desired position on the basis of a pattern registered beforehand, which includes a means for setting information concerning the pattern kind, the interval between a plurality of parts constituting the pattern, and the size of parts constituting the pattern and a means for forming a pattern image composed of a plurality of parts on the basis of the information obtained by the concerned means.
    Type: Grant
    Filed: July 10, 2003
    Date of Patent: October 12, 2004
    Assignee: Hitachi, Ltd.
    Inventors: Satoru Yamaguchi, Takashi Iizumi, Osamu Komuro, Hidetoshi Morokuma, Tatsuya Maeda, Juntaro Arima, Yasuhiko Ozawa
  • Patent number: 6792325
    Abstract: The present invention provides a remote maintenance method, a remote maintenance system, and an industrial device for enabling control and thorough services and billing according to the contents of the remote maintenance operation and the request destination of maintenance and enabling access limit according to the attribute of a service person, access limit according to the device state, and output limit according to the output mode. The industrial device 123 installed at the factory 120 and the operation device 113 installed in the maintenance center 110 are connected via the network 100.
    Type: Grant
    Filed: July 17, 2002
    Date of Patent: September 14, 2004
    Assignee: Hitachi, Ltd.
    Inventors: Juntaro Arima, Masaaki Inaba, Takeiki Aizono, Takashi Iizumi
  • Patent number: 6708072
    Abstract: The present invention provides a remote maintenance method, a remote maintenance system, and an industrial device for enabling control and thorough services and billing according to the contents of the remote maintenance operation and the request destination of maintenance and enabling access limit according to the attribute of a service person, access limit according to the device state, and output limit according to the output mode. The industrial device 123 installed at the factory 120 and the operation device 113 installed in the maintenance center 110 are connected via the network 100.
    Type: Grant
    Filed: February 25, 2002
    Date of Patent: March 16, 2004
    Assignee: Hitachi, Ltd.
    Inventors: Juntaro Arima, Masaaki Inaba, Takeiki Aizono, Takashi Iizumi
  • Publication number: 20030226010
    Abstract: An on-line diagnostics system and method enable equipment information stored in each piece of industrial equipment to be safely disclosed to maintenance personnel to the extent permitted by the user of the industrial equipment. The on-line diagnostics system comprises industrial equipment and a maintenance apparatus for the maintenance of the industrial equipment, which are connected via the Internet. Equipment information indicating the state of the industrial equipment is encrypted using a specific common key, and the encrypted equipment information is transmitted to the maintenance apparatus in response to a request therefrom. The fact that the common key has been transmitted from the industrial equipment to the maintenance apparatus is outputted. After receiving the encrypted equipment information and the common key that have been transmitted, the encrypted equipment information is decrypted using the common key, and the decrypted equipment information is outputted.
    Type: Application
    Filed: May 22, 2003
    Publication date: December 4, 2003
    Inventors: Juntaro Arima, Takashi Iizumi, Masaaki Inaba
  • Patent number: 6627888
    Abstract: An object of the present invention is to provide a scanning electron microscope for reducing a process concerning inspection positioning or an input operation, thereby functioning with high precision at high speed. To accomplish the above object, the present invention provides a scanning electron microscope having a function for identifying a desired position on the basis of a pattern registered beforehand, which includes a means for setting information concerning the pattern kind, the interval between a plurality of parts constituting the pattern, and the size of parts constituting the pattern and a means for forming a pattern image composed of a plurality of parts on the basis of the information obtained by the concerned means.
    Type: Grant
    Filed: February 23, 2001
    Date of Patent: September 30, 2003
    Assignee: Hitachi, Ltd.
    Inventors: Satoru Yamaguchi, Takashi Iizumi, Osamu Komuro, Hidetoshi Morokuma, Tatsuya Maeda, Juntaro Arima, Yasuhiko Ozawa
  • Publication number: 20030141451
    Abstract: An object of the present invention is to provide a sample image forming method and a charged particle beam apparatus which are suitable for realizing suppressing of the view area displacement with high accuracy while the influence of charging due to irradiation of the charged particle beam is being suppressed.
    Type: Application
    Filed: February 6, 2003
    Publication date: July 31, 2003
    Inventors: Mitsugu Sato, Atsushi Takane, Takashi Iizumi, Tadashi Otaka, Hideo Todokoro, Satoru Yamaguchi, Kazutaka Nimura
  • Publication number: 20030111602
    Abstract: An object of the present invention is to provide a sample image forming method and a charged particle beam apparatus which are suitable for realizing suppressing of the view area displacement with high accuracy while the influence of charging due to irradiation of the charged particle beam is being suppressed.
    Type: Application
    Filed: October 22, 2002
    Publication date: June 19, 2003
    Inventors: Mitsugu Sato, Atsushi Takane, Takashi Iizumi, Tadashi Otaka, Hideo Todokoro, Satoru Yamaguchi, Kazutaka Nimura
  • Publication number: 20030039386
    Abstract: Image evaluation method capable of objectively evaluating the image resolution of a microscope image. An image resolution method is characterized in that resolution in partial regions of an image is obtained over an entire area of the image or a portion of the image, averaging is performed over the entire area of the image or the portion of the image, and the averaged value is established as the resolution evaluation value of the entire area of the image or the portion of the image. This method eliminates the subjective impressions of the evaluator from evaluation of microscope image resolution, so image resolution evaluation values of high accuracy and good repeatability can be obtained.
    Type: Application
    Filed: August 16, 2002
    Publication date: February 27, 2003
    Inventors: Tohru Ishitani, Mitsugu Sato, Hideo Todokoro, Tadashi Otaka, Takashi Iizumi, Atsushi Takane
  • Publication number: 20030021463
    Abstract: The present invention provides a circuit pattern edge inspection method of finding out a failure in a fabricating process and image distortion in an observing apparatus by analyzing, by a non-destructive inspection, the shape of an edge of a line of a fine pattern in which characteristics of the material, process, and an exposure optical system in a semiconductor fabricating process appear, and performing analysis quantitatively. The method includes a step of detecting a set of edge points indicative of positions of edges of the pattern in a two-dimensional plane by a threshold method; a step of obtaining an approximation line for the set of edge points detected; and a step of obtaining an edge roughness shape and a characteristic by calculating the difference between the set of the edge points and the approximation line. A plurality of values are used as thresholds used for the threshold method.
    Type: Application
    Filed: February 11, 2002
    Publication date: January 30, 2003
    Inventors: Atsuko Yamaguchi, Tsuneo Terasawa, Tadashi Otaka, Takashi Iizumi, Osamu Komuro
  • Publication number: 20030015660
    Abstract: To realize a method for detecting variations in conditions (drift of the exposure and drift of the focus) in an exposure equipment at a product wafer level in the lithography process, the present invention specifies the process in such a way that calculation results of feature quantities such as electron beam images, line profiles, dimensions, etc. under various sets of the exposure and the focus have been stored as a library, and an electron beam image of the product wafer is compared with these pieces of data in the library so that detection of drifts of the exposure and the focus and check of the results on the screen can easily be performed.
    Type: Application
    Filed: April 18, 2002
    Publication date: January 23, 2003
    Inventors: Chie Shishido, Yuji Takagi, Masahiro Watanabe, Yasuhiro Yoshitake, Shunichi Matsumoto, Takashi Iizumi, Osamu Komuro, Maki Tanaka, Hidetoshi Morokuma
  • Publication number: 20020183875
    Abstract: The present invention provides a remote maintenance method, a remote maintenance system, and an industrial device for enabling control and thorough services and billing according to the contents of the remote maintenance operation and the request destination of maintenance and enabling access limit according to the attribute of a service person, access limit according to the device state, and output limit according to the output mode. The industrial device 123 installed at the factory 120 and the operation device 113 installed in the maintenance center 110 are connected via the network 100.
    Type: Application
    Filed: July 17, 2002
    Publication date: December 5, 2002
    Inventors: Juntaro Arima, Masaaki Inaba, Takeiki Aizono, Takashi Iizumi
  • Publication number: 20020183880
    Abstract: The present invention provides a remote maintenance method, a remote maintenance system, and an industrial device for enabling control and thorough services and billing according to the contents of the remote maintenance operation and the request destination of maintenance and enabling access limit according to the attribute of a service person, access limit according to the device state, and output limit according to the output mode. The industrial device 123 installed at the factory 120 and the operation device 113 installed in the maintenance center 110 are connected via the network 100.
    Type: Application
    Filed: February 25, 2002
    Publication date: December 5, 2002
    Inventors: Juntaro Arima, Masaaki Inaba, Takeiki Aizono, Takashi Iizumi
  • Publication number: 20020183876
    Abstract: The present invention provides a remote maintenance method, a remote maintenance system, and an industrial device for enabling control and thorough services and billing according to the contents of the remote maintenance operation and the request destination of maintenance and enabling access limit according to the attribute of a service person, access limit according to the device state, and output limit according to the output mode. The industrial device 123 installed at the factory 120 and the operation device 113 installed in the maintenance center 110 are connected via the network 100.
    Type: Application
    Filed: July 17, 2002
    Publication date: December 5, 2002
    Inventors: Juntaro Arima, Masaaki Inaba, Takeiki Aizono, Takashi Iizumi
  • Publication number: 20010019109
    Abstract: An object of the present invention is to provide a scanning electron microscope for reducing a process concerning inspection positioning or an input operation, thereby functioning with high precision at high speed.
    Type: Application
    Filed: February 23, 2001
    Publication date: September 6, 2001
    Applicant: Hitachi, Ltd.
    Inventors: Satoru Yamaguchi, Takashi Iizumi, Osamu Komuro, Hidetoshi Morokuma, Tatsuya Maeda, Juntaro Arima, Yasuhiko Ozawa
  • Patent number: 4907287
    Abstract: An image correcting apparatus for correcting distortion appearing in an image produced by electron beam scanning in a SEM under the influence of electric, magnetic and mechanical vibrations through arithmetic operations for eliminating the distortion. Installation of electric shield, magnetic shield and vibration-damping structure is thus rendered unnecessary.
    Type: Grant
    Filed: March 31, 1989
    Date of Patent: March 6, 1990
    Assignee: Hitachi, Ltd.
    Inventors: Koichi Homma, Fuminobu Komura, Tetsuo Yokoyama, Koichi Haruna, Toshihiro Furuya, Hiromi Kashiwabara, Akira Maeda, Yutaka Takuma, Takashi Iizumi