Patents by Inventor Takashi Ikehata

Takashi Ikehata has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240083591
    Abstract: Provided are an aircraft lightning probable area detection device, an aircraft lightning probable area transmission system, an aircraft lightning probable area detection method, and an aircraft lightning probable area detection program that suppress the data capacity and create an aircraft lightning probable area that enables intuitive understanding of aircraft lightning probable. An aircraft lightning probable area detection device includes: an information acquisition unit configured to acquire aircraft lightning probable information indicating a level of an expected lightning strike probability on a map; a data creation unit configured to create text data of an aircraft lightning probable area information on which the level of the expected lightning strike probability and a location are associated with each other by using the aircraft lightning probable information; and a transmission unit configured to transmit the text data to an aircraft.
    Type: Application
    Filed: March 29, 2023
    Publication date: March 14, 2024
    Applicant: MITSUBISHI HEAVY INDUSTRIES, LTD.
    Inventors: Takashi Ikematsu, Hiroyuki Katou, Masato Ikehata, Hiroyuki Nishijima, Fumiya Homma
  • Patent number: 7288942
    Abstract: A plasma potential measuring method is conducted by: providing a measurement space surrounded by a radio-frequency electric field in plasma atmosphere; varying a floating potential at an electrode located in the measurement space by the ponderomotive effect acted only on electrons; and determining as a plasma potential a value of the floating potential at the time when an ion current flown into the electrode begins to lower.
    Type: Grant
    Filed: September 30, 2004
    Date of Patent: October 30, 2007
    Assignees: Hitachi Cable, Ltd.
    Inventors: Xin Zhang, Naoyuki Sato, Takashi Ikehata, Kazutoshi Ogino
  • Publication number: 20050083065
    Abstract: A plasma potential measuring method is conducted by: providing a measurement space surrounded by a radio-frequency electric field in plasma atmosphere; varying a floating potential at an electrode located in the measurement space by the ponderomotive effect acted only on electrons; and determining as a plasma potential a value of the floating potential at the time when an ion current flown into the electrode begins to lower.
    Type: Application
    Filed: September 30, 2004
    Publication date: April 21, 2005
    Applicants: Hitachi Cable, Ltd., Naoyuki Sato
    Inventors: Xin Zhang, Naoyuki Sato, Takashi Ikehata, Kazutoshi Ogino
  • Patent number: 6487003
    Abstract: A laser beam is subjected to repeated reflection by a plurality of concave mirrors disposed in a confronting arrangement. Reflecting paths are centralized to form an interactive region of a high photon density. An interaction target such as gas, liquid, a solid body, plasma, a particle beam and an electron beam is introduced into the interactive region. Interaction with the laser beam causes optical interactions such as optical excitement, optical ionization, optical dissociation, optical synthesis, optical generation and optical analysis.
    Type: Grant
    Filed: July 6, 2000
    Date of Patent: November 26, 2002
    Assignees: Tokyo Denshi Kabushiki Kaisha
    Inventors: Yasuo Suzuki, Takashi Ikehata
  • Patent number: 5822342
    Abstract: Undulator is a device which produces a high intensity synchrotron radiation having narrow band width by making a relativistic electron beam undulate in an alternating magnetic field. It is possible to form a plasma micro-undulator which is very compact (size <1 cm) and by which a short-wavelength synchrotron radiation (visible to X-ray) can be produced, by illuminating a variable wavelength laser to a vapor atom generated from a high temperature evaporation source, at that time interfering two laser beams having the same wavelength to form an optical interference fringe and adjusting the wavelength of laser beam to the excitation energy of atom and producing a regular plasma-density-ripple corresponding to the light and shade of optical fringe by the multiple-step ionization scheme (resonance ionization).
    Type: Grant
    Filed: April 18, 1996
    Date of Patent: October 13, 1998
    Assignee: Japan Atomic Energy Research Institute
    Inventors: Yasuo Suzuki, Ryoji Nagai, Naoyuki Sato, Takashi Ikehata, Hiroshi Mase, Yoshihiro Sadamoto