Patents by Inventor Takashi Kabuki

Takashi Kabuki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for producing oxazole compound
    Patent number: 9181205
    Abstract: An object of the present invention is to provide a novel method for producing an oxazole compound. The invention relates to a method for producing a compound represented by formula (1): wherein R1 is lower alkyl group or halogen substituted lower alkyl group, R2 is lower alkyl group, R5 is lower alkyl group, R11 is lower alkyl group, halogen substituted lower alkyl group or a group represented by formula: —CY2COOR12, wherein Y is a halogen atom, R12 is an alkali metal atom or lower alkyl group, Ar1 is phenyl group substituted with lower alkyl group, etc., or pyridyl group substituted with lower alkyl group, etc., X2, X3 and X9 are the same or different and are halogen atoms, X4 is a leaving group, and M is an alkali metal atom.
    Type: Grant
    Filed: August 29, 2013
    Date of Patent: November 10, 2015
    Assignee: OTSUKA PHARMACEUTICAL CO., LTD.
    Inventors: Minoru Okada, Takashi Kabuki, Shigeo Fujieda, Nao Koseki
  • Method for Producing Oxazole Compound
    Publication number: 20150239855
    Abstract: An object of the present invention is to provide a novel method for producing an oxazole compound. The invention relates to a method for producing a compound represented by formula (1): wherein R1 is lower alkyl group or halogen substituted lower alkyl group, R2 is lower alkyl group, R5 is lower alkyl group, R11 is lower alkyl group, halogen substituted lower alkyl group or a group represented by formula: —CY2COOR12, wherein Y is a halogen atom, R12 is an alkali metal atom or lower alkyl group, Ar1 is phenyl group substituted with lower alkyl group, etc., or pyridyl group substituted with lower alkyl group, etc., X2, X3 and X9 are the same or different and are halogen atoms, X4 is a leaving group, and M is an alkali metal atom.
    Type: Application
    Filed: August 29, 2013
    Publication date: August 27, 2015
    Inventors: Minoru Okada, Takashi Kabuki, Shigeo Fujieda, Nao Koseki