Abstract: A mask blank is formed on a transparent substrate with a light-shielding film of a material mainly containing chromium and is used for obtaining a photomask by forming the light-shielding film into a transfer pattern by lithography using an electron beam writing resist. The mask blank includes a mask layer formed on the light-shielding film for serving as an etching mask in etching that forms the light-shielding film into the transfer pattern. The mask layer is made of a material containing silicon. The mask blank further includes a chromium nitride-based film formed on the mask layer and containing at least chromium and nitrogen.

Abstract: [Problem] To provide a compound which may be used in treating diseases in which a calcium sensing receptor (CaSR) is concerned, particularly hyperparathyroidism. [Means for Resolution] It was found that novel pyrrolidine derivatives which are characterized by the possession of aminomethyl group substituted with arylalkyl group or the like, or salts thereof, have excellent CaSR agonistic regulatory activity and also have excellent selectivity with CYP2D6 inhibitory activity having a possibility of causing drug interaction. Based on the above, these novel pyrrolidine derivatives are useful as therapeutic agents for treating diseases in which CaSR is concerned (hyperparathyroidism, renal osteodystrophy, hypercalcemia and the like).

Abstract: A charged particle beam writing method includes inputting design pattern data, virtually dividing a writing area to be written with the design pattern data into a plurality of small areas in a mesh-like manner, calculating a pattern density in each of the plurality of small areas based on the design pattern data, calculating a resizing amount for each pattern density in a case of irradiating a charged particle beam at an isofocal dose, resizing a dimension of the design pattern data in each of the plurality of small areas, based on the resizing amount in each of the plurality of small areas, and writing a resized design pattern on a target workpiece with the isofocal dose corresponding to the pattern density which was calculated before the resizing in each of the plurality of small areas.

Abstract: The present invention provides an electron beam writing method capable of suppressing a variation in position to be irradiated with an electron beam due to its drift and writing a predetermined pattern. A positional displacement amount near the center of each main deflection area of the charged-particle beam is determined. Correction values are determined from a plurality of the positional displacement amounts. A position irradiated with the charged-particle beam is corrected from the correction values. The neighborhood of the center of the main deflection area can be a sub deflection area including the center of the main deflection area. In this case, the positional displacement amount can be one for one arbitrary point in the sub deflection area. Alternatively, the Positional displacement amount can also be the average of positional displacement amounts at a plurality of arbitrary points in the sub deflection area.

Abstract: A charged particle beam writing apparatus includes an unit configured to irradiate a beam, a deflector configured to deflect the beam, a stage, on which a target is placed, configured to perform moving continuously, an lens configured to focus the beam onto the target, an unit configured to calculate a correction amount for correcting positional displacement of the beam on a surface of the target resulting from a first magnetic field caused by the lens and a second magnetic field caused by an eddy current generated by the first magnetic field and the moving of the stage, an unit configured to calculate a correction position where the positional displacement on the surface of the target has been corrected using the correction amount, and an unit configured to control the deflector so that the beam may be deflected onto the correction position.

Abstract: A charged particle beam writing method includes inputting design pattern data, virtually dividing a writing area to be written with the design pattern data into a plurality of small areas in a mesh-like manner, calculating a pattern density in each of the plurality of small areas based on the design pattern data, calculating a resizing amount for each pattern density in a case of irradiating a charged particle beam at an isofocal dose, resizing a dimension of the design pattern data in each of the plurality of small areas, based on the resizing amount in each of the plurality of small areas, and writing a resized design pattern on a target workpiece with the isofocal dose corresponding to the pattern density which was calculated before the resizing in each of the plurality of small areas.

Abstract: The present invention realized the excellent dimensional accuracy of resist patterns by using a chemical amplification type resist whose effective acid diffusion length is shorten without decreasing throughput of a charged particle beam writing system. The resist pattern forming method of the present invention features that the amount of the acid diffusion inhibitor in a chemical amplification type resist in order to shorten the effective acid diffusion length increases and the current density of a charged particle exposure in order to prevent the throughput drop of the writing system increases.

Abstract: A method of calculating a deflection aberration correcting voltage includes writing predetermined patterns at a plurality of focus height positions measuring dimensional variations of width sizes of the predetermined patterns written at the plurality of focus height positions, calculating effective resolutions of the written predetermined patterns by using the dimensional variations, and on the basis of a focus height position at which a minimum effective resolution of the predetermined patterns is obtained, calculating a correcting voltage to correct deflection aberration and output the correcting voltage, wherein the correcting voltage is used when a charged particle beam is deflected.

Abstract: A pigment dispersant represented by the following general formula (1) is provided: wherein R1, R2, R3, R4, R5, R6, R7, R8, R9 and R10 each independently is —H, —Cl, —CH3, —CF3, —NO2, —COOCH(CH3)2 or —COOCH2CH2Cl; R11, R12, R13 and R14 each independently is —H, —Cl, —CH3 or —CN; M is one equivalent of a bivalent or trivalent metal; and n is an integer of 1 to 3.

Abstract: A pigment dispersing agent of the formula (1) capable of providing a printing ink or a coating composition excellent in fluidity and dispersion stability and a dry coating excellent in gloss, a pigment composition containing the same and a pigment dispersion containing the same, wherein X1 is —NH—, —O—, —CONH—, —SO2NH—, —CH2NH—, —CH2NHCOCH2NH— or —X3—Y—X4—, X2 and X4 are —NH— or —O—, X3 is —CONH—, —SO2NH—, —CH2NH—, —NHCO— or —NHSO2—, Y is an alkylene group, an alkenylene group or an arylene group, Z is —SO3M or —COOM, R1 is a heterocyclic ring residue or an aromatic ring residue, Q is —O—R2, —NH—R2, a halogen group, —X1—R1 or —X2—Y-Z, R2 is a hydrogen atom, an alkyl group or an alkenyl group, and M is one equivalent of a monovalent to trivalent cation.

Abstract: A pigment dispersing agent of the formula (1) capable of providing a printing ink or a coating composition excellent in fluidity and dispersion stability and a dry coating excellent in gloss, a pigment composition containing the same and a pigment dispersion containing the same, 1

Abstract: This application relates to a piperazino-substituted novel cyanophenyl derivative in which a substituted carbamoyl or substituted sulfamoyl group having an aryl, heterocyclic or the like group that may have a substituent group is bonded to one nitrogen atom on the piperazine ring. The compound of this application has an anti-androgen action and is useful in preventing or treating prostatic cancer, benign prostatic hyperplasia and the like diseases.

Abstract: This application relates to a piperazino-substituted novel cyanophenyl derivative in which a substituted carbamoyl or substituted sulfamoyl group having an aryl, heterocyclic or the like group that may have a substituent group is bonded to one nitrogen atom on the piperazine ring. The compound of this application has an anti-androgen action and is useful in preventing or treating prostatic cancer, benign prostatic hyperplasia and the like diseases.

Abstract: This invention relates to novel thiazolo[3,2-a]benzoimidazole derivatives represented by the following general formula (I). The compounds provided by the invention act specifically on metabotropic glutamate receptors and are used as medicaments. The invention also provides novel compounds useful as intermediates for the synthesis of the compounds of the invention. (Symbols in the formula represent the following meanings. R1: carbamoyl, carbonyl, oxy, amino, carbonylamino or the like which may be substituted; R2: hydrogen, lower alkyl or the like; and R3, R4 and R5: hydrogen, lower alkyl and the like which may be the same or different from one another.

Abstract: A pattern writing method acquires the area of a pattern segment located in each of a plurality of small regions obtained by dividing a region on which a pattern is to be written, small region by small region, and writes a pattern based on an optimum dose calculated based on this area. This method employs a scheme of shifting pattern segments and averaging the accumulated area, so that even when the pitch of repetitive patterns slightly differs from the side length of each small region in the pitch direction, a peculiar error does not occur, thereby ensuring highly-precise proximity effect correction and contributing to improving the precision of writing an LSI pattern.

Abstract: A charged beam lithography system includes a charged particle gun for generating charged beams, a main deflecting system and a sub-deflecting system for deflecting the charged beams generated by the charged particle gun, and a control computer. The charged beam lithography system is designed to cause the surface of a substrate to be irradiated with the charged beams from the charged particle gun while continuously moving a stage, to write a desired pattern for each of stripes defined by the maximum deflection widths of the main deflecting system and the sub-deflecting system. The charged beam lithography system further comprises: a real time proximity effect correcting circuit for calculating an optimum dosage for each of the stripes by correcting the dosage of the electron beams in view of the influence of the proximity effect; and a cash memory for storing the optimum dosage data for at least two of the stripes.

Abstract: A colorless or only slightly colored pigment dispersing agent which is feasible as a pigment dispersing agent for pigments having various hues and has the general formula (1), ##STR1## wherein R.sub.1, R.sub.2, X.sub.1, Y.sub.1, Y.sub.2, k and h are as defined in claim 1.

Abstract: A charged particle beam writing method for determining an optimal exposure dose for each position in a pattern to be drawn on a target before actually drawing the pattern by irradiating the target with charged particles and drawing the pattern with the obtained optimal exposure doses, comprising the first step of determining the first approximate optimal exposure dose for each position on said target, the second step of determining the second optimal exposure dose for each position on said target by determining a corrective value di for correcting said first approximate optimal exposure dose obtained by multiplying the error in the exposure dose of the position produced when exposed to said first approximate optimal exposure dose by a regulation coefficient of a value substantially equal to the exposure dose U(x, y) to back scattering charged particles and adding said corrective value to said first approximate optimal exposure dose, said exposure dose being variable as a function of the location (x, y) of the

Abstract: The present invention provide an aqueous type pigment dispersing agent having one portion which has a high affinity with a pigment and which has at least one type of selected from the group consisting of an organic dye, anthraquinone and acridone and only at a terminal end or at both terminal ends of at least one aqueous polymer selected from an aqueous linear urethanic polymer and an aqueous linear acrylic polymer, a pigment composition using the same and a pigment dispersion. The portion having a high affinity with the pigment can be adsorbed efficiently on the surface of a pigment. At the same time, for example, a pigment, used for ink or paint can be dispersed stably due to the affinity between the polymer portion and a disperse medium to improve the adaptability in use and the quality of coating articles.

Abstract: A coating composition is formed from an acid-set coating varnish and a pigment composition. The pigment composition includes a specific organic dyestuff derivative and a specific basic-group-containing resin-type pigment dispersant. The coating composition excels in pigment dispersibility, nonflocculation properties, noncrystallizability and fluidity. When used as a coating, the coating composition has excellent color tone, gloss, hardness, weather resistance, and solvent resistance.