Abstract: A radiation therapy apparatus includes a manipulator; a radiation head; a correction unit; and first and second controllers. The manipulator includes an arm movable about n axes (where n is 6 or more). The radiation head, supported by the arm, is configured to emit radiation. The correction unit continuously corrects positional coordinates of the radiation head on the manipulator so that radiation emitted from the radiation head is directed onto a reference point while the radiation head is moved along a predetermined route on a virtual sphere having the reference point as its center. The first controller controls the manipulator so that the radiation head is moved along the route using the corrected positional coordinates. The second controller causes the radiation head to emit radiation toward the reference point as the radiation head passes through radiation emission points on the route.

Abstract: There is provided a curable resin composition comprising a cycloolefin polymer and a cyclic peroxide which has a cyclic structure and a peroxy structure in the cyclic structure. There is also provided a laminate obtained by using a molded article which is obtained by forming the curable resin composition into a sheet shape or a prepreg which is obtained by impregnating the curable resin composition into a reinforcing fiber.

Abstract: A flushing apparatus includes a suction mechanism and an ink mist collecting mechanism. The suction mechanism is to suck ink mist. The ink mist collecting mechanism is to collect the ink mist by a suction force of the suction mechanism. The ink mist collecting mechanism includes an upper face part and a droplet forming member. The ink ejected from the nozzle is dropped on the upper face part. The upper face part includes a plurality of suction holes through which the ink mist is sucked into an inside of the ink mist collecting mechanism by the suction force of the suction mechanism. The droplet forming member is provided at a position corresponding to the plurality of the suction holes to provide droplets from the ink mist sucked through the plurality of the suction holes.

Abstract: A multi-column electron beam exposure apparatus includes: a plurality of column cells; a wafer stage including an electron-beam-property detecting unit for measuring an electron beam property; and a controller for measuring beam properties of electron beams used in all the column cells by using the electron-beam-property detecting unit, and for adjusting the electron beams of the respective column cells so that the properties of the electron beams used in the column cells may be approximately identical. The electron beam property may be any of a beam position, a beam intensity, and a beam shape of the electron beam to be emitted. The electron-beam-property detecting unit may be a chip for calibration with a reference mark formed thereon or a Faraday cup.

Abstract: A flushing apparatus includes a suction mechanism and an ink mist collecting mechanism. The suction mechanism is to suck ink mist. The ink mist collecting mechanism is to collect the ink mist by a suction force of the suction mechanism. The ink mist collecting mechanism includes an upper face part and a droplet forming member. The ink ejected from the nozzle is dropped on the upper face part. The upper face part includes a plurality of suction holes through which the ink mist is sucked into an inside of the ink mist collecting mechanism by the suction force of the suction mechanism. The droplet forming member is provided at a position corresponding to the plurality of the suction holes to provide droplets from the ink mist sucked through the plurality of the suction holes.

Abstract: A printer including a feeding unit configured to perform repeated feeding of a medium for a predetermined feeding distance in a predetermined feeding direction, a print head configured to print on a printing surface of the medium in a printing zone set each time the feeding unit performs a feeding of the medium for the feeding distance, and a printing pass setting unit configured to set the printing zone containing a plurality of printing passes. The printing pass setting unit sets the printing passes such that boundaries between the printing passes extend diagonally relative to a width direction of the medium that is perpendicular to the feeding direction. The printing pass setting unit can set the printing passes such that the boundaries between the printing passes extend in waveform in the width direction with oscillation of the waveform being in the feeding direction.

Abstract: There is provided a curable resin composition comprising a cycloolefin polymer and a cyclic peroxide which has a cyclic structure and a peroxy structure in the cyclic structure. There is also provided a laminate obtained by using a molded article which is obtained by forming the curable resin composition into a sheet shape or a prepreg which is obtained by impregnating the curable resin composition into a reinforcing fiber.

Abstract: A multi-column electron beam exposure apparatus includes: a plurality of column cells; a wafer stage including an electron-beam-property detecting unit for measuring an electron beam property; and a controller for measuring beam properties of electron beams used in all the column cells by using the electron-beam-property detecting unit, and for adjusting the electron beams of the respective column cells so that the properties of the electron beams used in the column cells may be approximately identical. The electron beam property may be any of a beam position, a beam intensity, and a beam shape of the electron beam to be emitted. The electron-beam-property detecting unit may be a chip for calibration with a reference mark formed thereon or a Faraday cup.

Abstract: A printer includes a first drive sub-assembly and a second drive sub-assembly detachably provided on the first drive sub-assembly. The first drive sub-assembly includes a bed configured to support a material to be printed, a first engaging member, and a front-rear direction moving mechanism provided on one side of the bed and configured to move the first engaging member along a front-rear direction. The second drive sub-assembly includes a guide bar having a longitudinal direction substantially perpendicular to the front-rear direction, a right-left direction moving mechanism configured to move a printer head along the longitudinal direction of the guide bar, and a second engaging member engaging with the first engaging member to move the guide bar along the front-rear direction.

Abstract: A printer includes a first drive sub-assembly and a second drive sub-assembly detachably provided on the first drive sub-assembly. The first drive sub-assembly includes a bed configured to support a material to be printed, a first engaging member, and a front-rear direction moving mechanism provided on one side of the bed and configured to move the first engaging member along a front-rear direction. The second drive sub-assembly includes a guide bar having a longitudinal direction substantially perpendicular to the front-rear direction, a right-left direction moving mechanism configured to move a printer head along the longitudinal direction of the guide bar, and a second engaging member engaging with the first engaging member to move the guide bar along the front-rear direction.

Abstract: A printer including a feeding unit configured to perform repeated feeding of a medium for a predetermined feeding distance in a predetermined feeding direction, a print head configured to print on a printing surface of the medium in a printing zone set each time the feeding unit performs a feeding of the medium for the feeding distance, and a printing pass setting unit configured to set the printing zone containing a plurality of printing passes. The printing pass setting unit sets the printing passes such that boundaries between the printing passes extend diagonally relative to a width direction of the medium that is perpendicular to the feeding direction. The printing pass setting unit can set the printing passes such that the boundaries between the printing passes extend in waveform in the width direction with oscillation of the waveform being in the feeding direction.

Abstract: A printer includes a first drive sub-assembly and a second drive sub-assembly detachably provided on the first drive sub-assembly. The first drive sub-assembly includes a bed configured to support a material to be printed, a first engaging member, and a front-rear direction moving mechanism provided on one side of the bed and configured to move the first engaging member along a front-rear direction. The second drive sub-assembly includes a guide bar having a longitudinal direction substantially perpendicular to the front-rear direction, a right-left direction moving mechanism configured to move a printer head along the longitudinal direction of the guide bar, and a second engaging member engaging with the first engaging member to move the guide bar along the front-rear direction.

Abstract: A method for providing charged particle beam exposure onto an object having a plurality of chip areas with a plurality of aligning marks formed in correspondence to each of said chip areas. A charged particle beam is irradiated upon an object mounted on a mobile step based upon positions of the aligning marks. Actual positions of the alignment marks are detected and compared to the design positions of the alignment marks to determine approximate relationships which are used to calculate an actual position to perform exposure.

Abstract: To improve in the throughput of an exposure system, the setting time during a step change in the output of an amplifier is reduced by switching resistance between the amplifier and deflector, a glitch waveform generated during a step change in the output of a D/A converter at the preceding stage of the amplifier, is anticipated and is canceled out with a correction waveform, after the output of the D/A converter has settled, this output is sample held and the step change is interpolated at a smoothing circuit, the deflection area is increased by positioning a electrostatic deflector offset around the optical axis relative to another electrostatic deflector, the response speed of the main deflection is improved by adding auxiliary deflection coils of one or two turn, and the alignment time is reduced by combining the coordinate conversion in the wafer area and in the chip area.

Abstract: To improve the throughput of an exposure system, the setting time during a step change in the output of an amplifier is reduced by switching resistance between the amplifier and a deflector. A glitch waveform generated during a step change in the output of a D/A converter at the preceding stage of the amplifier is anticipated and is cancelled out with a correction waveform. After the output of the D/A converter has settled, this output is sample-held and the step change is interpolated with a smoothing circuit. The deflection area is increased by positioning an electrostatic deflector offset around the optical axis relative to another electrostatic deflector, and the response speed of the main deflection is improved by adding auxiliary deflection coils of one or two turns. The alignment time is reduced by combining the coordinate conversion in the wafer area and in the chip area.

Abstract: To improve in the throughput of an exposure system, the setting time during a step change in the output of an amplifier is reduced by switching resistance between the amplifier and a deflector, a glitch waveform generated during a step change in the output or a D/A converter at the preceding stage of the amplifier, is anticipated and is canceled out with a correction waveform, after the output of the D/A converter has settled, this output is sample held and the step change is interpolated at a smoothing circuit, the deflection area is increased by positioning a electrostatic deflector offset around the optical axis relative to another electrostatic deflector, the response speed of the main deflection is improved by adding auxiliary deflection coils of one or two turn, and the alignment time is reduced by combining the coordinate conversion in the wafer area and in the chip area.

Abstract: A system for aligning a mask and a semiconductor wafer comprises radiation source for producing a radiation beam, a dual focus linear Fresnel zone plate provided on the mask for focusing the radiation beam incident thereto on a surface of the semiconductor wafer which comprises a first part having a first focal length and a second part having a second focal length substantially smaller than the first focal length, a diffraction grating provided on the surface of the semiconductor wafer in correspondence to the dual focus linear Fresnel zone plate for diffracting the radiation beam focused thereon, a detector held with a predetermined relationship with respect to the radiation source and the mask for detecting the diffracted beam, a movable stage for supporting the semiconductor wafer, and a controller for moving the stage means responsive to an output signal of the detection means.

Abstract: A system for aligning a mask and a semiconductor wafer comprises radiation source for producing a radiation beam, a dual focus linear Fresnel zone plate provided on the mask for focusing the radiation beam incident thereto on a surface of the semiconductor wafer which comprises a first part having a first focal length and a second part having a second focal length substantially smaller than the first focal length, a diffraction grating provided on the surface of the semiconductor wafer in correspondence to the dual focus linear Fresnel zone plate for diffracting the radiation beam focused thereon, a detector held with a predetermined relationship with respect to the radiation source and the mask for detecting the diffracted beam, a movable stage for supporting the semiconductor wafer, and a controller for moving the stage means responsive to an output signal of the detection means.

Abstract: Disclosed herein are novel chloroacetanilide derivatives which act as remarkably effective herbicides when sprayed in a paddy field, the chloroacetanilide derivatives being 2',6'-diethyl-N-[(cis-alkenyloxy)methyl]-2-chloroacetanilides [A] represented by the general formula ##STR1## wherein R is a cis-form alkenyl group having 4 or 5 carbon atoms. Also disclosed are herbicide compositions for use in a paddy field and containing at least one of said chloroacetanilide derivatives [A] and at least one pyrazole derivative [B] represented by the general formula ##STR2## wherein R is a hydrogen atom or methyl group and X is a 4-toluenesulfonyl group or benzoylmethyl group; or-.alpha.