Patents by Inventor Takashi Kurose

Takashi Kurose has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240127017
    Abstract: The analysis apparatus according to the present invention is capable of setting parameters and user authentication, which do not require key input. When a specific analysis apparatus is set so as to measure a specific type of data, a plurality of required parameters are converted to data having a format suitable for a relay medium and the converted data is recorded in the relay medium. An importing unit imports the plurality of parameters from the relay medium. A restoration unit is used to obtain, from the imported parameters, each parameter in the pre-conversion format thereof. The individual obtained parameters are transferred to a setting unit and set to a required setting destination. This being the case, the replay medium is created according to the support from a management device of a manufacturer and a repeater.
    Type: Application
    Filed: February 22, 2022
    Publication date: April 18, 2024
    Applicant: KYOTO ELECTRONICS MANUFACTURING CO., LTD.
    Inventors: Nobuaki WATANABE, Takashi MATSUKI, Hidenori MATSUOKA, Ikumi KUROSE
  • Patent number: 11960928
    Abstract: An event monitoring system includes a processor and a storage unit. The storage unit holds an event message including a character string related to an event occurring in an information system and guide information including one or more guides. The guide includes a guide message including a predetermined character string, notified in response to the event, and information regarding a coping method for the event. The processor compares the event message and the guide, associates the guide with the event in a case where the guide further includes information for identifying a variable portion of the guide message and a portion other than the variable portion of the guide message coincides with a portion other than a portion corresponding to the variable portion in the event message, and receives an input of information indicating a correct answer of a guide to be associated with the event in a case where the guide does not include the information for identifying the variable portion.
    Type: Grant
    Filed: September 16, 2021
    Date of Patent: April 16, 2024
    Assignee: Hitachi, Ltd.
    Inventors: Taku Okamura, Takashi Tameshige, Mitsuhiro Nagata, Hideto Kurose, Mineyoshi Masuda
  • Publication number: 20190184799
    Abstract: A vehicle tailgate structure including a first panel portion including a composite material and a second panel portion overmolded onto the first panel portion, the first and second panel portions forming together a body portion, a transverse beam and side beams connecting the transverse beam to the body portion, wherein the transverse beam includes a hinge attachment portion configured to receive a hinge attachment part, wherein the first panel portion has a bent strip in the transverse beam, and wherein the bent strip is raised with respect to a remaining portion of the first panel portion.
    Type: Application
    Filed: December 13, 2016
    Publication date: June 20, 2019
    Applicant: TOYOTA MOTOR EUROPE
    Inventors: Martin KERSCHBAUM, Julien TACHON, Takashi KUROSE, Frank ANNA, Thomas MÜLLER
  • Patent number: 7504153
    Abstract: A porous material comprising vapor grown carbon fiber in an amount of 10 to 90 mass %, fiber filaments of the carbon fiber forming a three-dimensional network and having a diameter of 1 to 1,000 nm, an aspect ratio of 5 to 15,000, a specific surface area (by BET method) of 2 to 2,000 m2/g, and the ratio of the intensity of the peak at 1,360 cm?1 in a Raman scattering spectrum of the carbon fiber to that of the peak at 1,580 cm?1 in the spectrum(I1360/I1580) is 0.1 to 2.0, wherein the porosity of the porous material (V/V0) is 0.50 to 0.99 and a specific surface area is 5 to 1,000 m2/g; and a production method and use thereof. The vapor grow carbon fiber impregnated in the porous material of the present invention does not contain aggregates and a three-dimensional network is formed between the fiber filaments, wherein length of each of the fiber filaments is maintained.
    Type: Grant
    Filed: May 12, 2004
    Date of Patent: March 17, 2009
    Assignee: Showa Denko K.K.
    Inventors: Takashi Kurose, Tatsuhiro Takahashi, Chiaki Sotowa, Toshio Morita
  • Publication number: 20070042901
    Abstract: A porous material comprising vapor grown carbon fiber in an amount of 10 to 90 mass %, fiber filaments of the carbon fiber forming a three-dimensional network and having a diameter of 1 to 1,000 nm, an aspect ratio of 5 to 15,000, a specific surface area (by BET method) of 2 to 2,000 m2/g, and the ratio of the intensity of the peak at 1,360 cm?1 in a Raman scattering spectrum of the carbon fiber to that of the peak at 1,580 cm?1 in the spectrum(I1360/I1580) is 0.1 to 2.0, wherein the porosity of the porous material (V/V0) is 0.50 to 0.99 and a specific surface area is 5 to 1,000 m2/g; and a production method and use thereof. The vapor grow carbon fiber impregnated in the porous material of the present invention does not contain aggregates and a three-dimensional network is formed between the fiber filaments, wherein length of each of the fiber filaments is maintained.
    Type: Application
    Filed: May 12, 2004
    Publication date: February 22, 2007
    Inventors: Takashi Kurose, Tatsuhiro Takahashi, Chiaki Sotowa, Toshio Morita
  • Patent number: 5557141
    Abstract: A group III-V compound semiconductor doped with an impurity, having an undoped film of SiOx and a film for preventing the diffusion of Group V atoms (e.g., an SiN film) are formed on a crystal of Group III-V compound semiconductor in which the silicon in the SiOx film is diffused into the Group III-V compound semiconductor, thereby forming a doped layer.
    Type: Grant
    Filed: March 30, 1994
    Date of Patent: September 17, 1996
    Assignee: Sanyo Electric Co., Ltd.
    Inventors: Yasoo Harada, Shigeharu Matsushita, Satoshi Terada, Emi Fujii, Takashi Kurose, Takayoshi Higashino, Takashi Yamada, Akihito Nagamatsu, Daijirou Inoue, Kouji Matsumura
  • Patent number: 5350709
    Abstract: A method of doping a Group III-V compound semiconductor with an impurity, wherein after an undoped film of SiOx and a film for preventing the diffusion of Group V atoms (e.g., an SiN film) are formed in this order on a crystal of Group III-V compound semiconductor, the sample is subjected to at least one heat treatment to cause silicon in the SiOx film to diffuse into the Group III-V compound semiconductor, thereby forming a doped layer. Using this doped layer forming method, field-effect transistors, diodes, resistive layers, two-dimensional electron gas or one-dimensional quantum wires, zero-dimensional quantum boxes, electron wave interference devices, etc. are fabricated.
    Type: Grant
    Filed: June 10, 1993
    Date of Patent: September 27, 1994
    Assignee: Sanyo Electric Co., Ltd.
    Inventors: Yasoo Harada, Shigeharu Matsushita, Satoshi Terada, Emi Fujii, Takashi Kurose, Takayoshi Higashino, Takashi Yamada, Akihito Nagamatsu, Daijirou Inoue, Kouji Matsumura