Patents by Inventor Takashi Kushida
Takashi Kushida has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Publication number: 20230086254Abstract: To provide a pharmaceutical composition having a novel use comprising a dental pulp-derived multipotent stem cell preparation that can be administered to humans. A pharmaceutical composition comprising dental pulp-derived stem cells as an active ingredient for suppressing infiltration into a tissue of at lease neutrophils, monocytes, or lymphocytes.Type: ApplicationFiled: January 29, 2021Publication date: March 23, 2023Inventors: Kiwamu IMAGAWA, Kohtaro MINAMI, Kenichi MAEDA, Yuki HOSODA, Shunsuke WATANABE, Kazutoshi SATO, Yasuna HIGASHIGUCHI, Takashi KUSHIDA, Ayumi ISHIWARI, Yu TSUSHIMA, Yoshiteru MIYAUCHI
-
Publication number: 20210387119Abstract: A filtration filter is configured from a first weld frame, a second weld frame, and a filter sandwiched and welded between the first weld frame and the second weld frame. The first weld frame and the second weld frame are configured by a flexible film having a film thickness of at least 120 ?m. The filter is configured by a substance having a higher melting point than the first weld frame and the second weld frame and having an opening area ratio of from 10% to 80%. The first weld frame is configured by a polymer that includes either a high density polyethylene having a melting point of from 120° C. to 140° C., a linear low density polyethylene having a melting point of from 105° C. to 125° C., or a mixture including at least one of the high density polyethylene or the linear low density polyethylene.Type: ApplicationFiled: October 21, 2019Publication date: December 16, 2021Applicants: TEIJIN LIMITED, JCR PHARMACEUTICALS CO., LTD.Inventors: Azusa KOHNO, Takashi KUSHIDA, Ayumi ISHIWARI, Kiwamu IMAGAWA, Yuki HOSODA
-
Publication number: 20210301258Abstract: The present disclosure relates to a method for producing dental pulp-derived cells enriched with pluripotent stem cells including: (a) digesting dental pulp with a protease to prepare a dental pulp suspension; (b) culturing the suspension to proliferate pluripotent stem cells contained in the suspension; (c) freezing the proliferated pluripotent stem cells in a state in which the pluripotent stem cells are suspended in a first cryopreservation liquid; (d) thawing the frozen pluripotent stem cells; (e) culturing the thawed pluripotent stem cells in a state in which the pluripotent stem cells are adhered to surfaces of particles to proliferate the pluripotent stem cells on the surfaces of the particles; and (f) bringing the particles into contact with a protease to separate the pluripotent stem cells adhered to the surfaces of the particles from the particles.Type: ApplicationFiled: July 30, 2019Publication date: September 30, 2021Applicants: JCR Pharmaceuticals Co., Ltd., Teijin LimitedInventors: Kiwamu Imagawa, Kotaro Minami, Kenichi Maeda, Yuki Hosoda, Shunsuke Watanabe, Kazutoshi Sato, Yasuna Higashiguchi, Takashi Kushida, Ayumi Ishiwari
-
Patent number: 10401285Abstract: The present invention relates to an apparatus for measuring surface properties of a polishing pad which measures surface properties such as surface topography or surface condition of a polishing pad used for polishing a substrate such as a semiconductor wafer. The apparatus for measuring surface properties of a polishing pad includes a laser beam source configured to emit a laser beam, and a photodetector configured to detect scattered light that is reflected and scattered by the polishing pad, an optical Fourier transform being performed on the detected scattered light to produce an intensity distribution corresponding to a spatial wavelength spectrum based on surface topography of the polishing pad. The laser beam is applied to the polishing pad at such an incident angle that the laser beam does not reach a bottom portion of a pore formed in the surface of the polishing pad.Type: GrantFiled: September 11, 2013Date of Patent: September 3, 2019Assignees: EBARA CORPORATION, Kyushu Institute of TechnologyInventors: Hisanori Matsuo, Keiichi Kimura, Keisuke Suzuki, Panart Khajornrungruang, Takashi Kushida
-
Publication number: 20150093543Abstract: The disclosure features blood compatible articles and methods of making the articles. The methods include providing a substrate and forming a rough surface on the substrate. The rough surface includes a plurality of three-dimensionally curved features each having a radius of curvature of less than about 50 nm. The surface includes a sufficient concentration of features per unit area to limit blood coagulation activity on the substrate and to limit the number of platelets that adhere to the surface when the substrate is exposed to blood.Type: ApplicationFiled: September 30, 2014Publication date: April 2, 2015Inventors: Takashi Kushida, Vincent M. Rotello
-
Patent number: 8932883Abstract: The present invention relates to a method of measuring surface properties of a polishing pad which measures surface properties such as surface topography or surface condition of a polishing pad used for polishing a substrate such as a semiconductor wafer. The method of measuring surface properties of a polishing pad includes applying a laser beam to the polishing pad, detecting scattered light that is reflected and scattered by the polishing pad with a photodetector and performing an optical Fourier transform on the detected scattered light to produce an intensity distribution corresponding to a spatial wavelength spectrum based on surface topography of the polishing pad, and calculating a numerical value representing surface properties of the polishing pad based on the intensity distribution corresponding to two different prescribed spatial wavelength ranges.Type: GrantFiled: September 11, 2013Date of Patent: January 13, 2015Assignees: Ebara Corporation, Kyushu Institute of TechnologyInventors: Hisanori Matsuo, Keiichi Kimura, Keisuke Suzuki, Panart Khajornrungruang, Takashi Kushida
-
Publication number: 20140273308Abstract: The present invention relates to a method of measuring surface properties of a polishing pad which measures surface properties such as surface topography or surface condition of a polishing pad used for polishing a substrate such as a semiconductor wafer. The method of measuring surface properties of a polishing pad includes applying a laser beam to the polishing pad, detecting scattered light that is reflected and scattered by the polishing pad with a photodetector and performing an optical Fourier transform on the detected scattered light to produce an intensity distribution corresponding to a spatial wavelength spectrum based on surface topography of the polishing pad, and calculating a numerical value representing surface properties of the polishing pad based on the intensity distribution corresponding to two different prescribed spatial wavelength ranges.Type: ApplicationFiled: September 11, 2013Publication date: September 18, 2014Applicants: EBARA CORPORATION, Kyushu Institute of TechnologyInventors: Hisanori MATSUO, Keiichi KIMURA, Keisuke SUZUKI, Panart Khajornrungruang, Takashi KUSHIDA
-
Publication number: 20140262027Abstract: The present invention relates to an apparatus for measuring surface properties of a polishing pad which measures surface properties such as surface topography or surface condition of a polishing pad used for polishing a substrate such as a semiconductor wafer. The apparatus for measuring surface properties of a polishing pad includes a laser beam source configured to emit a laser beam, and a photodetector configured to detect scattered light that is reflected and scattered by the polishing pad, an optical Fourier transform being performed on the detected scattered light to produce an intensity distribution corresponding to a spatial wavelength spectrum based on surface topography of the polishing pad. The laser beam is applied to the polishing pad at such an incident angle that the laser beam does not reach a bottom portion of a pore formed in the surface of the polishing pad.Type: ApplicationFiled: September 11, 2013Publication date: September 18, 2014Applicant: Kyushu Institute of TechnologyInventors: Hisanori MATSUO, Keiichi KIMURA, Keisuke SUZUKI, Panart Khajornrungruang, Takashi KUSHIDA
-
Patent number: 8614445Abstract: Provided is an alkylsilane laminate with which it is possible to obtain an organic semiconductor film having excellent semiconductor properties. Such a laminate can be useful for an organic thin-film transistor. The alkylsilane laminate comprises an underlayer (Sub) having hydroxyl groups at the surface and an alkylsilane thin film (AS) formed on this underlayer. The alkylsilane laminate is a laminate wherein the critical surface energy Ec of the alkylsilane thin film and the number of carbons (X) of the alkylsilane satisfies the following formula (1): Ec?29.00?0.63x (mN/m) (1) Also provided is a thin-film transistor (10) having such an alkylsilane laminate (Sub, AS).Type: GrantFiled: May 27, 2010Date of Patent: December 24, 2013Assignee: Teijin LimitedInventors: Takashi Kushida, Hiroyoshi Naito
-
Patent number: 8569756Abstract: Provided is an alkylsilane laminate with which it is possible to obtain an organic semiconductor film having excellent semiconductor properties. Such a laminate can be useful for an organic thin-film transistor. The alkylsilane laminate comprises an underlayer (Sub) having hydroxyl groups at the surface and an alkylsilane thin film (AS) formed on this underlayer. The alkylsilane laminate is a laminate wherein the critical surface energy Ec of the alkylsilane thin film and the number of carbons (X) of the alkylsilane satisfies the following formula (1): Ec?29.00?0.63x (mN/m) (1) Also provided is a thin-film transistor (10) having such an alkylsilane laminate (Sub, AS).Type: GrantFiled: May 27, 2010Date of Patent: October 29, 2013Assignee: Teijin LimitedInventors: Takashi Kushida, Hiroyoshi Naito
-
Publication number: 20130099215Abstract: Disclosed is an organic semiconductor film (10) which has a value of 1 or more but less than 10 for the ratio of the charge mobility [(charge mobility of the surface side having larger charge mobility)/(charge mobility of the surface side having smaller charge mobility)] of two opposing surface sides (11, 12). In addition, the organic semiconductor film (10) has a relative X-ray reflectance peak height of 2.0 or more with respect to the peak height of an organic semiconductor film which has the same thickness and materials and is manufactured by performing spin coating on a silicon wafer. Alternatively, the organic semiconductor film (10) has a value of 2 or more for the ratio of the charge mobility [(charge mobility of the surface side having larger charge mobility)/(charge mobility of the surface side having smaller charge mobility)] of the two opposing surface sides (11, 12).Type: ApplicationFiled: April 27, 2011Publication date: April 25, 2013Applicant: TEIJIN LIMITEDInventors: Takashi Kushida, Hiroyoshi Naito
-
Publication number: 20120080679Abstract: Provided is an alkylsilane laminate with which it is possible to obtain an organic semiconductor film having excellent semiconductor properties. Such a laminate can be useful for an organic thin-film transistor. The alkylsilane laminate comprises an underlayer (Sub) having hydroxyl groups at the surface and an alkylsilane thin film (AS) formed on this underlayer. The alkylsilane laminate is a laminate wherein the critical surface energy Ec of the alkylsilane thin film and the number of carbons (X) of the alkylsilane satisfies the following formula (1): Ec?29.00?0.63x (mN/m) (1) Also provided is a thin-film transistor (10) having such an alkylsilane laminate (Sub, AS).Type: ApplicationFiled: May 27, 2010Publication date: April 5, 2012Applicant: TEIJIN LIMITEDInventors: Takashi Kushida, Hiroyoshi Naito
-
Patent number: 7715097Abstract: The screen of the invention comprises an oriented film having a direction of maximum scattering (scattering axis) and a direction of minimum scattering (transmitting axis) for linear polarized light, and containing macromolecular fine particles in a macromolecular matrix, wherein the refractive index of the macromolecular fine particles is within a specified range and the matrix and macromolecular fine particles satisfy a specified relationship. The screen reproduces bright and high-quality projected images with virtually no moire effect or glare, and is therefore highly useful as a transmissive or reflective projector screen.Type: GrantFiled: July 20, 2005Date of Patent: May 11, 2010Assignee: Teijin LimitedInventor: Takashi Kushida
-
Publication number: 20090219444Abstract: An image processing apparatus according to the present invention includes a vector processor which performs vector processing on image data, and a scalar processor which performs scalar processing on the image data having undergone the vector processing.Type: ApplicationFiled: February 2, 2009Publication date: September 3, 2009Applicants: GLORY FSM Ltd., STERADIAN, INC.Inventors: Risei NOTSU, Takashi Kushida, Shin Yuzaki
-
Publication number: 20090061192Abstract: There is provided a reflective sheet made of self-sustaining porous sheet which comprises inert particles and a polyolefin and which has a porosity of 30 to 95% and a reflectivity at a wavelength of 550 nm of 60 to 120%. This reflective sheet can be reduced in thickness and weight while retaining sufficient reflectivity.Type: ApplicationFiled: April 11, 2006Publication date: March 5, 2009Applicant: TEIJIN LIMITEDInventors: Kei Mizutani, Takashi Kushida, Satoshi Kitazawa, Takao Ohno, Koji Furuya
-
Publication number: 20080088961Abstract: The screen of the invention comprises an oriented film having a direction of maximum scattering (scattering axis) and a direction of minimum scattering (transmitting axis) for linear polarized light, and containing macromolecular fine particles in a macromolecular matrix, wherein the refractive index of the macromolecular fine particles is within a specified range and the matrix and macromolecular fine particles satisfy a specified relationship. The screen reproduces bright and high-quality projected images with virtually no moire effect or glare, and is therefore highly useful as a transmissive or reflective projector screen.Type: ApplicationFiled: July 20, 2005Publication date: April 17, 2008Applicant: TEIJIN LIMITEDInventor: Takashi Kushida
-
Publication number: 20060106621Abstract: A material for preventing forgery and false alteration. The material comprises a particulate information presenting substance. The information presenting substance is one or more elements, a compound of two or more elements, or a substance containing the elements or compounds. The fluorescence emitted from the substance is different depending on the production history and cipher information different depending on the production history is related to the substance. Even if the fluorescence from such an information presenting substance is detected by a false third party, the production history of the information presenting substance cannot be grasped from the fluorescence. Therefore the fluorescence of the information presenting substance cannot be reproduced, and a high confidentiality of the cipher information given to the material can be ensured.Type: ApplicationFiled: August 19, 2003Publication date: May 18, 2006Inventor: Takashi Kushida
-
Publication number: 20050135676Abstract: A document processor comprises an image reader for reading a document sheet to output digital RGB signals, a color model converter that converts the RGB signals to HSV signals and YUV signals through arithmetic operations, and then attaches the YUV signals to the HSV signals of individual pixels, a color detector for detecting pixels of those colors to be subjected to image processing; and an image processing section consisting of a color converter, a color extractor and an area recognizer. The image processing section is previously registered with a number of colors to be subjected to image processing, wherein different contents of image processing are designated to respective colors, so the color converter, the color extractor and the area recognizer can carry out designated contents of image processing simultaneously on pixels of registered colors.Type: ApplicationFiled: November 10, 2004Publication date: June 23, 2005Inventors: Kazuo Watanabe, Hajime Tachibana, Shinichi Shidara, Tsutomu Fujino, Kazunari Yatabe, Takashi Kushida
-
Patent number: 6881453Abstract: A film which is a single polymer film and has a smaller phase difference as the wavelength becomes shorter. This film is made from an olefin-based polymer which has an alicyclic group in the side chain, such as hydrogenated polystyrene, the amount of the alicyclic group in the side chain being 60 to 90 wt % based on the whole polymer, and satisfies the following expression: R(450)/R(550)<1 wherein R(450) and R(550) are phase differences on the film plane at a wavelength of 450 nm and a wavelength of 550 nm, respectively.Type: GrantFiled: April 23, 2001Date of Patent: April 19, 2005Assignees: Teijin Limited, Bayer AGInventors: Nobuaki Kido, Shunichi Matsumura, Kaoru Iwata, Takashi Kushida, Akihiko Uchiyama, Michio Yamaura, Takeshi Sasaki, Kiyonari Hashidzume
-
Patent number: RE39753Abstract: A retardation film comprised of a single oriented polymer film, characterized in that the retardation at wavelengths of 450 nm and 550 nm satisfies the following formulae (1) and/or (2), and the water absorption is no greater than 1%. R(450)/R(550)<1 ??(1) K(450)/K(550)<1 ??(2) where R(450) and R(550) represent the in-plane retardation of the oriented polymer film at wavelengths of 450 nm and 550 nm, respectively, and K(450) and K(550) are the values calculated by K=[nz?(nx+ny)/2]×d (where nx, ny and nz represent the three-dimensional refractive indexes of the oriented polymer film as the refractive indexes in the direction of the x-axis, y-axis and z-axis, respectively, and d represents the thickness of the film) for the oriented polymer film at a wavelength of 450 nm and 550 nm, respectively. There are provided laminated retardation films and liquid crystal display devices employing the retardation film.Type: GrantFiled: October 29, 1999Date of Patent: July 31, 2007Assignee: Teijin LimitedInventors: Akihiko Uchiyama, Takashi Kushida