Patents by Inventor Takashi Magara
Takashi Magara has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230123450Abstract: A medical apparatus configured for insertion directly or indirectly into a living body is provided with a coloring part having a marking formed on an outer surface. The marking has a coloring layer of an acrylic resin containing a pigment and a protective layer of a polymethacrylic ester covering the coloring layer directly or indirectly, and an upper surface of the coloring part is recessed from a part of the medical apparatus, such as a covering tube of a sheath of an endoscope treatment instrument, adjacent to the coloring part on the outer surface.Type: ApplicationFiled: August 12, 2022Publication date: April 20, 2023Applicant: OLYMPUS MEDICAL SYSTEMS CORP.Inventors: Hiroaki KASAI, Issei MAEDA, Hirotaka KITAGAWA, Takashi MAGARA
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Publication number: 20210402067Abstract: A medical device includes a resin base including one or more than one material selected from a group consisted by an ethylene propylene resin containing fluorine, a styrene resin containing fluorine, an olefin resin containing fluorine, a vinyl chloride resin containing fluorine, a polyester resin containing fluorine, a polyurethane resin containing fluorine, and a nylon resin containing fluorine; an underlayer formed on the resin base, the underlayer including an oxazolidone ring; and an epoxy resin layer formed on the underlayer.Type: ApplicationFiled: September 7, 2021Publication date: December 30, 2021Applicant: OLYMPUS CORPORATIONInventor: Takashi MAGARA
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Publication number: 20200347249Abstract: A resin molding for a medical device has a base material made of resin, and an indicator including a cured product of UV-curable ink. An uneven structure is formed on at least a part of the surface of the base material. The uneven structure includes a plurality of recesses. The plurality of recesses each have a width of 10 ?m or more and 60 ?m or less. The indicator is formed on the uneven structure.Type: ApplicationFiled: July 20, 2020Publication date: November 5, 2020Applicant: OLYMPUS CORPORATIONInventor: Takashi MAGARA
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Publication number: 20200246497Abstract: A lubricant for a medical device to be subjected to gas low temperature sterilization includes an anti-friction material and an ion exchanger.Type: ApplicationFiled: April 22, 2020Publication date: August 6, 2020Applicant: OLYMPUS CORPORATIONInventors: Minoru HARA, Masaya IWAMOTO, Naoyasu HANAMURA, Takashi MAGARA, Koji KOBAYASHI
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Publication number: 20190269831Abstract: A coating for medical equipment includes: an isocyanate-curable coating composition; and a radical scavenger.Type: ApplicationFiled: May 20, 2019Publication date: September 5, 2019Applicant: OLYMPUS CORPORATIONInventors: Minoru HARA, Takashi MAGARA
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Patent number: 9835550Abstract: A breath analyzer includes a light source, a gas cell, a detection unit and a data processing unit. The light source emits infrared light of a wavelength band including an absorption line for acetone. A breath containing sample gas is introduced to the gas cell. The infrared light is incident on the gas cell. The detection unit receives transmitted light emerging from the gas cell, and outputs a sample signal value corresponding to an acetone discharge amount. The data processing unit determines an approximation formula of dependence of fat oxidation rate on acetone discharge amount in advance, and calculates a fat oxidation rate for individual sample signal values using the approximation formula. When the acetone discharge amount (microliter/min) is x, the fat oxidation rate (milligram/min) y is approximated by a following formula: y=Ax+B (where A and B are constants).Type: GrantFiled: September 24, 2015Date of Patent: December 5, 2017Assignee: Kabushiki Kaisha ToshibaInventors: Tsutomu Kakuno, Shigeyuki Takagi, Yasutomo Shiomi, Akira Maekawa, Miyuki Kusaba, Hiroshi Hasegawa, Takashi Magara, Isao Muraoka
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Patent number: 9836045Abstract: According to one embodiment, a manufacturing apparatus control system includes a defect rate detector, a significant difference tester and a defect determining unit. The defect rate detector extracts a first apparatus passage history having a first defect rate. The defect rate detector detects a third defect rate by excluding a second apparatus passage history having a second defect rate from the first apparatus passage history. The significant difference tester calculates a significant difference test value. The defect determining unit extracts a third apparatus passage history based on the third defect rate and the significant difference test value.Type: GrantFiled: September 5, 2014Date of Patent: December 5, 2017Assignee: Kabushiki Kaisha ToshibaInventor: Takashi Magara
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Publication number: 20170227455Abstract: A breath analyzer includes a light source, a gas cell, a detection unit and a data processing unit. The light source emits infrared light of a wavelength band including an absorption line for acetone. A breath containing sample gas is introduced to the gas cell. The infrared light is incident on the gas cell. The detection unit receives transmitted light emerging from the gas cell, and outputs a sample signal value corresponding to an acetone discharge amount. The data processing unit determines an approximation formula of dependence of fat oxidation rate on acetone discharge amount in advance, and calculates a fat oxidation rate for individual sample signal values using the approximation formula. When the acetone discharge amount (microliter/min) is x, the fat oxidation rate (milligram/min) y is approximated by a following formula: y=Ax+B (where A and B are constants).Type: ApplicationFiled: September 24, 2015Publication date: August 10, 2017Applicant: KABUSHIKI KAISHA TOSHIBAInventors: Tsutomu KAKUNO, Shigeyuki TAKAGI, Yasutomo SHIOMI, Akira MAEKAWA, Miyuki KUSABA, Hiroshi HASEGAWA, Takashi MAGARA, Isao MURAOKA
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Publication number: 20170016816Abstract: A gas analysis method includes irradiating a sample gas introduced into a gas cell with infrared light tuned to a wavelength corresponding to one absorption line of a target gas contained in the sample gas, measuring a sample signal value corresponding to intensity of transmitted light of the infrared light transmitted through the gas cell, evacuating the sample gas in the gas cell and then replacing by a reference gas, measuring a reference signal value corresponding to intensity of transmitted light of the infrared light transmitted through the reference gas, and calculating gas concentration at the one absorption line from ratio of the sample signal value to the reference signal value.Type: ApplicationFiled: September 24, 2015Publication date: January 19, 2017Applicant: KABUSHIKI KAISHA TOSHIBAInventors: Shigeyuki TAKAGI, Tsutomu KAKUNO, Yasutomo SHIOMI, Akira MAEKAWA, Miyuki KUSABA, Hiroshi HASEGAWA, Takashi MAGARA
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Publication number: 20160377533Abstract: A gas measuring apparatus of an embodiment includes a light source, a gas cell and a detection portion. The light source emits infrared light. Into the gas cell, gas containing 13CO2 and 12CO2 is introduced, and the gas cell includes an incident surface on which the infrared light is incident and an emission surface through which the infrared light is transmitted. The gas cell has a cell length of 2.5 cm or more and 20 cm or less. The detection portion measures a first transmittance of transmitted light from the emission surface at a first wavelength in wavelength range in an absorption line of the 13CO2 and a second transmittance of transmitted light from the emission surface at a second wavelength in the wavelength range in an absorption line of the 12CO2, and is capable of calculating a concentration of each of the 13CO2 and the 12CO2.Type: ApplicationFiled: September 8, 2016Publication date: December 29, 2016Applicant: KABUSHIKI KAISHA TOSHIBAInventors: Miyuki KUSABA, Akira Maekawa, Shigeyuki Takagi, Hiroshi Hasegawa, Takashi Magara, Tsutomu Kakuno, Yasutomo Shiomi
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Publication number: 20150268664Abstract: According to one embodiment, a manufacturing apparatus control system includes a defect rate detector, a significant difference tester and a defect determining unit. The defect rate detector extracts a first apparatus passage history having a first defect rate. The defect rate detector detects a third defect rate by excluding a second apparatus passage history having a second defect rate from the first apparatus passage history. The significant difference tester calculates a significant difference test value. The defect determining unit extracts a third apparatus passage history based on the third defect rate and the significant difference test value.Type: ApplicationFiled: September 5, 2014Publication date: September 24, 2015Applicant: Kabushiki Kaisha ToshibaInventor: Takashi MAGARA
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Publication number: 20120328877Abstract: The present invention is cellulose nanofibers having an average polymerization degree of 600 to 30000, an aspect ratio of 20 to 10000, an average diameter of 1 nm to 800 nm, and an I?-type crystal peak in an X-ray diffraction pattern.Type: ApplicationFiled: September 5, 2012Publication date: December 27, 2012Applicant: Olympus CorporationInventors: KOHEI SHIRAMIZU, Naohito Shiga, Takashi Magara, Kohei Oguni, Lianzhen Lin
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Patent number: 8224020Abstract: An appearance inspection apparatus, wherein an image inspection result based on a result of image-taking and image-analyzing a product to be inspected can be displayed with superposed on a visual field of an inspector inspecting the product to be inspected with an eye and in a position corresponding to an image in which the inspector is observing the product to be inspected is provided. An appearance inspection method includes: performing image inspection of a product to be inspected by image-taking the product to be inspected and image-analyzing the product to be inspected in an image-treating section. An inspector is capable of inspecting the product to be inspected with an eye in the state that a result of the image inspection is displayed with superposed on a visual field of an inspector inspecting the product to be inspected with an eye and in a position corresponding to an image in which the inspector is observing the product to be inspected.Type: GrantFiled: November 25, 2008Date of Patent: July 17, 2012Assignee: Kabushiki Kaisha ToshibaInventor: Takashi Magara
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Publication number: 20090141964Abstract: An appearance inspection apparatus, wherein an image inspection result based on a result of image-taking and image-analyzing a product to be inspected can be displayed with superposed on a visual field of an inspector inspecting the product to be inspected with an eye and in a position corresponding to an image in which the inspector is observing the product to be inspected is provided. An appearance inspection method includes: performing image inspection of a product to be inspected by image-taking the product to be inspected and image-analyzing the product to be inspected in an image-treating section. An inspector is capable of inspecting the product to be inspected with an eye in the state that a result of the image inspection is displayed with superposed on a visual field of an inspector inspecting the product to be inspected with an eye and in a position corresponding to an image in which the inspector is observing the product to be inspected.Type: ApplicationFiled: November 25, 2008Publication date: June 4, 2009Inventor: Takashi MAGARA
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Patent number: 7383841Abstract: In a cleaning step of a substrate-processing device, vacuum drawing is made for the space between an inner chamber and an outer chamber that receives the inner chamber. Temperature of the inner chamber is set higher than the temperature of the inner chamber during substrate processing and set lower than the temperature of a substrate support member. After that, a cleaning gas containing hexafluoroacetylaceton (Hhfac) is supplied in the inner chamber, and substances to be cleaned off adhering inside the inner chamber are removed.Type: GrantFiled: July 1, 2003Date of Patent: June 10, 2008Assignee: Tokyo Electron LimitedInventors: Hiroshi Shinriki, Kazuya Dobashi, Mikio Suzuki, Takashi Magara
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Publication number: 20060175011Abstract: In a cleaning step of a substrate-processing device, vacuum drawing is made for the space between an inner chamber and an outer chamber that receives the inner chamber. Temperature of the inner chamber is set higher than the temperature of the inner chamber during substrate processing and set lower than the temperature of a substrate support member. After that, a cleaning gas containing hexafluoroacetylaceton (Hhfac) is supplied in the inner chamber, and substances to be cleaned off adhering inside the inner chamber are removed.Type: ApplicationFiled: July 1, 2003Publication date: August 10, 2006Inventors: Hiroshi Shinriki, Kazuya Dobashi, Mikio Suzuki, Takashi Magara
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Patent number: 6756235Abstract: In a metal oxide film formation method, a source gas mixture of organic compound gases containing at least three metals, and an oxidation gas are individually prepared. While the substrate is heated, the oxidation gas is supplied to a substrate set in a closed vessel at a predetermined pressure, and then the gas mixture is supplied. A metal oxide film is formed on the substrate. A metal oxide film formation apparatus is also disclosed.Type: GrantFiled: August 18, 2000Date of Patent: June 29, 2004Assignee: Tokyo Electron LimitedInventors: Yijun Liu, Hiroshi Shinriki, Takashi Magara
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Patent number: 6485564Abstract: In a thin film forming method of the invention, an atmosphere for a base as a thin film forming target is set to a high vacuum of, e.g., 0.01 Torr or less, and a gas of an organometallic compound and an oxidizing gas are introduced onto a base surface heated to about 450° C., to form a plurality of crystal nuclei, made of an oxide of a metal constituting the organometallic compound, on the base surface. The atmosphere for the base is then set to a lower vacuum than the first vacuum degree, and the gas of the organometallic compound and the oxidizing gas are subsequently introduced onto the base surface heated to about 45° C., to form a film made of the oxide of the metal there.Type: GrantFiled: November 13, 2000Date of Patent: November 26, 2002Assignee: Tokyo Electron LimitedInventors: Yijun Liu, Hiroshi Shinriki, Takashi Magara