Abstract: A preview road surface detector capable of discontinuing predictive control is provided, which suppresses the energy consumption required to determine whether predictive control should be discontinued. The preview road surface detector includes: a distance sensor provided on a vehicle body member, the distance sensor detecting a value related to a distance between the vehicle body member and a measurement point on a road surface ahead of a vehicle, the measurement point corresponding to at least part of a road surface contact portion of a wheel; and a distance calculator that calculates a road surface distance as the distance from the vehicle body member to the measurement point, based on a detection value detected by the distance sensor, in which the distance sensor is deactivated under a predetermined condition.

Abstract: An application liquid for an optical member comprises a component (A) consisting of metal fine particles (A-1) and/or a metal compound (A-2) including a constituent unit represented by the following general formula (1-A), a stabilizer (B) consisting of a polysiloxane compound including a constituent unit represented by the following general formula (1); and a solvent (C), [(R1)bMOc/2]??(1-A) [(R2)d(R3)e(OR4)fSiOg/2]??(1)

Abstract: An object is to provide a resin composition, which is a homogeneous solution containing a polymer, obtained by hydrolysis and polycondensation without precipitation during the sol-gel reaction even when a metal species with high EUV absorbance is introduced. The resin component includes a polymer including a constituent unit represented by (A) a following general formula (1) and (B) a following general formula (1-A), [(R2)d(R3)e(OR4)fSiOg/2]??(1) [(R1)bMOc/2]??(1-A) In the general formula (1), R2 is a group represented by a following general formula (1a).

Abstract: There is provided a silicon compound represented by General Formula (x). There is also provided a reactive material containing a silicon compound represented by General Formula (x).

Abstract: A polysiloxane that has a fast polymerization reaction rate and good storage stability is provided. Alternatively, a silicon-containing monomer mixture as a raw material of the polysiloxane, a resin composition, a photosensitive resin composition, a cured film, or a patterned cured film containing the polysiloxane are provided. Alternatively, the present invention provides a production method for a resin composition, a photosensitive resin composition, a cured film, or a patterned cured film containing the polysiloxane. A mixture is provided including a first monomer containing silicon represented by the following general formula (X); and a second monomer containing silicon represented by the following general formula (Y). In the case where A is set to a contained amount of the first monomer containing silicon and B is set to a contained amount of the second monomer containing silicon, the following relationship is satisfied. B / A + B ? > ? 0 .

Abstract: A new photosensitive resin composition based on a polysiloxane, that is, a negative photosensitive resin composition is provided. A negative photosensitive resin composition includes (A) a polysiloxane compound containing a first structural unit represented by the following general formula (1), (B) a photoinduced curing accelerator, and (C) a solvent.

Abstract: A composition including a polysiloxane compound (A) containing a structural unit represented by formula (1) and a structural unit represented by formula (2), wherein a siloxane structural unit ratio represented by Q unit/(Q unit+T unit) in all Si structural units is 0.60 or more and less than 1.00, and the solvent (B). [(R1)b(R2)m(OR3)lSiOn/2]??(1) [In the formula, R1 is a group represented by following formula.

Abstract: Provided is a polysiloxane composition containing a polysiloxane compound including a constitutional unit represented by Formula (1) and at least one of a constitutional unit of Formula (2) and a constitutional unit of Formula (3), and a solvent. [(Rx)bR1mSiOn/2]??(1) [(Ry)cR2pSiOq/2]??(2) [SiO4/2]??(3) Here, Rx is a monovalent group represented by Formula (1a) (X is a hydrogen atom or an acid-labile group, a is an integer of 1 to 5, and a broken line represents a bond), Ry is a monovalent organic group having 1 to 30 carbon atoms, which contains any one of an epoxy group, an oxetane group, an acryloyl group, and a methacryloyl group.

Abstract: An ammonium hydroxyfluoroalkanesulfinate is obtained by using an organic base while sulfinating a bromofluoroalcohol with a sulfinating agent. An ammonium hydroxyfluoroalkanesulfonate is obtained by oxidizing the ammonium hydroxyfluoroalkanesulfinate. An onium fluoroalkanesulfonate is obtained by converting the ammonium hydroxyfluoroalkanesulfonate into an onium salt through esterification. This onium fluoroalkanesulfonate is useful as a photoacid generator in chemically amplified resists and the like.

Abstract: When sulfinating a carboxylic acid bromofluoroalkyl ester by using a sulfinating agent, an organic base is used, thereby obtaining a fluoroalkanesulfinic acid ammonium salt. This is oxidized to obtain a fluoroalkanesulfonic acid ammonium salt. This is used as the raw material and is converted to an onium salt or is converted to an onium salt by going through saponification and esterification, thereby obtaining a fluoroalkanesulfonic acid onium salt. This fluoroalkanesulfonic acid onium salt is useful as a photoacid generator used for chemically amplified resist materials, etc.

Abstract: According to the present invention, there is provided a polymerizable fluorine-containing sulfonic acid onium salt of the following general formula (2) and a resin obtained by polymerization thereof. It is possible by the use of this sulfonate resin of the present invention to provide a resist composition with high resolution, board depth of focus tolerance (DOF), small line edge roughness (LER) and high sensitivity. In the formula, Z represents a substituted or unsubstituted C1-C6 straight or branched alkylene group, or a divalent moiety in which substituted or unsubstituted C1-C6 straight or branched alkylene groups are bonded in series to a divalent group obtained by elimination of two hydrogen atoms from an alicyclic or aromatic hydrocarbon; R represents a hydrogen atom, a halogen atom, or a C1-C3 alkyl or fluorine-containing alkyl group; and Q+ represents a sulfonium cation or an iodonium cation.

Abstract: An ammonium hydroxyfluoroalkanesulfinate is obtained by using an organic base while sulfinating a bromofluoroalcohol with a sulfinating agent. An ammonium hydroxyfluoroalkanesulfonate is obtained by oxidizing the ammonium hydroxyfluoroalkanesulfinate. An onium fluoroalkanesulfonate is obtained by converting the ammonium hydroxyfluoroalkanesulfonate into an onium salt through esterification. This onium fluoroalkanesulfonate is useful as a photoacid generator in chemically amplified resists and the like.

Abstract: When sulfinating a carboxylic acid bromofluoroalkyl ester by using a sulfinating agent, an organic base is used, thereby obtaining a fluoroalkanesulfinic acid ammonium salt. This is oxidized to obtain a fluoroalkanesulfonic acid ammonium salt. This is used as the raw material and is converted to an onium salt or is converted to an onium salt by going through saponification and esterification, thereby obtaining a fluoroalkanesulfonic acid onium salt. This fluoroalkanesulfonic acid onium salt is useful as a photoacid generator used for chemically amplified resist materials, etc.

Abstract: According to the present invention, there is provided a polymerizable fluorine-containing sulfonic acid onium salt of the following general formula (2) and a resin obtained by polymerization thereof. It is possible by the use of this sulfonate resin of the present invention to provide a resist composition with high resolution, board depth of focus tolerance (DOF), small line edge roughness (LER) and high sensitivity. In the formula, Z represents a substituted or unsubstituted C1-C6 straight or branched alkylene group, or a divalent moiety in which substituted or unsubstituted C1-C6 straight or branched alkylene groups are bonded in series to a divalent group obtained by elimination of two hydrogen atoms from an alicyclic or aromatic hydrocarbon; R represents a hydrogen atom, a halogen atom, or a C1-C3 alkyl or fluorine-containing alkyl group; and Q+ represents a sulfonium cation or an iodonium cation.