Abstract: A substrate processing apparatus comprises a substrate support disposed in the chamber, a shutter including a valve body configured to open and close an opening of the chamber, and a baffle plate disposed between an inner peripheral side of the chamber and the substrate support and having a vertically inclined portion at an end portion on a substrate support side, and a contact member disposed on a side surface of the substrate support and formed of a conductive elastic member. In a state where the shutter is closed, contact between the end portion on the substrate support side and the contact member is maintained.

Abstract: An electron beam lithography apparatus and a semiconductor device pattern forming method for precisely writing patterns near the periphery of a cell mask so that large scale integrated circuits and fine structure devices are fabricated at high yield rates. Cell figures with lower aperture rates are located peripherally and cell figures with higher aperture rates are located closer to a central portion within each of aperture groups furnished on a second mask of the inventive apparatus adopting cell projection. Illustratively, on a mask for use in semiconductor device fabrication, cell figures for forming line patterns and gate patterns are located centrally and cell figures for forming hole patterns are positioned peripherally in each aperture group. This allows the peripherally located figures to be written precisely in each aperture group.

Abstract: A pattern can be written in accordance with a distortion which changes depending upon exposure conditions of the optical exposure system and exposed pattern features, and a pattern can be written with a high alignment accuracy by the optical exposure system and an electron beam lithography system or two optical exposure systems. A pattern which is exposed by optical exposure system divided into very small areas shown by broken lines, and pattern feature amounts (fx), (fy) at each area are calculated. A correction amount is obtained by using the pattern feature amount and the position within an exposure field as parameters based on exposure distortion examined by a standard pattern predeterminedly.

Abstract: An electron beam lithography system which generates phase shift pattern data relating to main patterns, and exposes the phase shift pattern on a mask plate by using an electron beam in accordance with instruction from a computer. An electron beam lithography system is provided which can remarkably decrease a time needed for preparing phase shift pattern data. The apparatus is furnished with a parameter table for storing equations to generate phase shift pattern data, and generates the phase shift pattern data by assigning original pattern data into equations in accordance with a corresponding instruction for applying a phase shift method, and automatically exposes the phase shift pattern.

Abstract: An air-conditioning apparatus includes an air-conditioner and an oxygen ratio increasing device. The air-conditioner has an indoor unit having an indoor heat exchanger and arranged in a room to be air-conditioned, and an outdoor unit having an outdoor heat exchanger and arranged outdoors. These units are connected to each other through a coolant pipe. The increasing device has an oxygen ratio increasing mechanism for producing oxygen-ratio increased air having a high oxygen concentration, and an air supply pipe for supplying the produced oxygen-ratio increased air into the room. The mechanism is arranged in the outdoor unit, and includes an adsorbing material for adsorbing nitrogen in air to produce the oxygen-ratio increased air and an air compressor for supplying air to the air supply pipe through the adsorbing material.

Abstract: A gas sensor using an n-type metal oxide semiconductor and a method for manufacturing such a gas sensor is provided. More particularly, a gas sensor for detecting an inflammable gas and a method for manufacturing the same.

Abstract: A mark position detection system used in a charged particle beam apparatus and including detection circuit for detecting a reflected electron generated at a mark when the mark is scanned with a charged particle beam, to obtain a mark signal, and signal processing circuit for comparing the mark signal from the detection circuit with a predetermined threshold level to find the position of the charged particle beam at a time the mark signal traverses the threshold level, thereby detecting the position of a mark edge, is disclosed in which, when the mark signal traverses the threshold level and has a peak value exceeding a predetermined value, it is determined by the signal processing circuit that the position of the charged particle beam at a time point at which the mark signal traverses the threshold level is the position of the mark.

Abstract: Disclosed is an electron beam exposure apparatus which includes an objective lens focusing an electron beam, and a dynamic focus correction lens dynamically correcting the focusing by the objective lens. The apparatus comprises a control circuit which, in order to prevent a current variation induced in the objective lens by the dynamic focus correction lens, controls current supplied to the objective lens so as to cancel the current variation induced in the objective lens due to the coil current of the dynamic focus correction lens.

Abstract: A pulse combustor has a casing in which a combustion chamber is defined. Air is supplied to the combustion chamber through an air supply pipe. A valve mechanism for controlling the air supply to the chamber is provided in the air supply pipe. The valve mechanism has a base plate with a plurality of air supply holes for the passage of air, and a flapper valve for opening and closing the air supply holes in accordance with the change of pressure inside the chamber. The flapper valve is composed of a plurality of ring-shaped segments with different diameters. These segments are arranged concentrically with one another.

Abstract: A pulse combustor has a main body in which a cylindrical mixing chamber and a combustion chamber are formed. An air inlet port and a fuel inlet port are formed in the body to open into the mixing chamber. These inlet ports are located on the same circumference of the inner periphery of the mixing chamber and spaced from each other. An air supply pipe for introducing air into the mixing chamber is connected at one end to the air inlet port, and a fuel supply pipe for introducing fuel gas into the mixing chamber is connected at one end to the fuel inlet port. The air supply pipe extends in a predetermined direction so as to cause the air introduced into the mixing chamber to flow while rotating in one direction along the inner periphery of the mixing chamber. The fuel supply pipe extends in a predetermined direction to cause the fuel to be introduced into the mixing chamber along a direction opposite the direction in which the air rotates.

Abstract: An apparatus for electron beam lithography comprises at least one mask equipped with a polygonal aperture to be subjected to an electron beam from an electron beam generator, an electron lens system for demagnifying and imaging the polygonal aperture of the mask, and a solenoid coil for electron beam rotation adjustment placed between the mask and the final-stage electron lens.

Abstract: A silencer unit has charging- and exhaust-side silencers which are integrally formed into a double-cylinder housing. The housing has an outer cylinder and an inner cylinder disposed in the outer cylinder. The charging-side silencer is connected to an air charging pipe of a pulse combustor to attenuate noise generated from the charging side of the combustor. The exhaust-side silencer is connected to an exhaust pipe of the combustor to attenuate noise generated from the exhausing side of the combustor. The charging-side silencer has a first low-frequency sound arresting chamber defined in the inner cylinder and a first high-frequency sound arresting chamber defined between the inner and outer cylinders. The exhaust-side silencer has a second low-frequency sound arresting chamber defined in the inner cylinder and a second high-frequency sound arresting chamber defined between the inner and outer cylinders.

Abstract: A turbine for use in refrigeration cycle comprising a closed casing, a turbine runner housed in said casing, an injection nozzle through which refrigerating medium having at least one of pressure-based and knetic energies is blown to rotate the turbine runner, a liquid refrigerating medium receiving section arranged at the lower end of said casing to collect liquid refrigerating medium, and a refrigerating medium discharging outlet through which refrigerating medium is fed to an evaporator arranged in a refrigeration cycle.

Abstract: Disclosed are a catalyst carrier for purification of waste gas which comprises a carrier comprising a calcined clay material composed of 1 to 5% by weight of lithium oxide (Li.sub.2 O), not less than 20% by weight of aluminum oxide (Al.sub.2 O.sub.3) and not less than 60% by weight of silicon dioxide (SiO.sub.2), the total thereof being substantially 100; an aluminum oxide supported on the surface of the said clay material; and a platinum group element having further supported on said aluminum oxide; and a process for preparing the same.

Abstract: A method of and apparatus for displaying an image of phase contrast in a scanning transmission electron microscope, in which an electron beam flux transmitted through a specimen is deflected with a high frequency and repeatedly moved on an aperture provided in a region where a transmitted electron beam and a scattered electron beam interfere, and among signal components detected by a detector through the aperture, only a signal synchronous with the high frequency is sampled and detection-rectified, whereby the difference of the intensities of the region where both the electron beams interfere is detected so as to display the image of phase contrast of the specimen.