Abstract: A substrate processing apparatus includes: a mixer configured to mix sulfuric acid as a first component and a second component different from the first component to prepare an etchant; a nozzle configured to eject the etchant to a substrate; a first component supplier including a first flow path that supplies the first component to the mixer, a first instantaneous flowmeter and a first flow rate controller provided in the first flow path; a second component supplier including a second flow path different from the first flow path and configured to supply the second component to the mixer, a second instantaneous flowmeter and a second flow rate controller provided in the second flow path; and a controller configured to control the first and second flow rate controllers using average flow rates of the first component and the second component during the ejection of the etchant to the substrate.

Abstract: There is described an image-processing apparatus that is provided with a receiving section to receive jobs, each of which includes image data; an arithmetic calculating section to convert the image data to print data for every job; a storage section to store the jobs received by the receiving section and the print data converted by the arithmetic calculating section for every job; an outputting section to output the print data to a printing section for every job; and a controlling section to control a receiving processing applied for the jobs in the receiving section, a conversion processing applied for each of the jobs in the arithmetic calculating section and an output processing applied for each of the jobs in the outputting section. Accordingly, the image-processing apparatus can separately control a receiving state of each of the jobs, a converting state of each of the jobs and an outputting state of each of the jobs.