Patents by Inventor Takashi Nichikawa

Takashi Nichikawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME
    Publication number: 20040142579
    Abstract: A silicon oxide film 102, a Pt film 103x, a Ti film 104x and a PZT film 105x are deposited in this order over a Si substrate 101. The Si substrate 101 is placed in a chamber 106 so that the PZT film 105x is irradiated with an EHF wave 108. The irradiation with the EHF wave locally heats a dielectric film such as the PZT film. As a result, it is possible to improve, for example, the leakage property of the dielectric film without adversely affecting a device formed on the Si substrate 101.
    Type: Application
    Filed: December 17, 2002
    Publication date: July 22, 2004
    Inventors: Kiyoyuki Morita, Shoji Miyake, Michihito Ueda, Takashi Ohtsuka, Takashi Nichikawa, Akira Inoue, Takeshi Takagi, Yoshihiro Hara, Minoru Kubo