Patents by Inventor Takashi Nishijima
Takashi Nishijima has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Publication number: 20240083591Abstract: Provided are an aircraft lightning probable area detection device, an aircraft lightning probable area transmission system, an aircraft lightning probable area detection method, and an aircraft lightning probable area detection program that suppress the data capacity and create an aircraft lightning probable area that enables intuitive understanding of aircraft lightning probable. An aircraft lightning probable area detection device includes: an information acquisition unit configured to acquire aircraft lightning probable information indicating a level of an expected lightning strike probability on a map; a data creation unit configured to create text data of an aircraft lightning probable area information on which the level of the expected lightning strike probability and a location are associated with each other by using the aircraft lightning probable information; and a transmission unit configured to transmit the text data to an aircraft.Type: ApplicationFiled: March 29, 2023Publication date: March 14, 2024Applicant: MITSUBISHI HEAVY INDUSTRIES, LTD.Inventors: Takashi Ikematsu, Hiroyuki Katou, Masato Ikehata, Hiroyuki Nishijima, Fumiya Homma
-
Patent number: 11830751Abstract: A plasma processing apparatus includes a base, an electrostatic chuck provided on the base, and a dielectric layer. A bias power, whose magnitude is changed during plasma processing on a target substrate, is applied to the base. The electrostatic chuck has a central portion on which the target substrate is mounted and an outer peripheral portion on which a focus ring is mounted to surround the target substrate. The dielectric layer is provided between the outer peripheral portion of the electrostatic and the base or the focus ring and has an electrostatic capacitance that reduces a difference between an electrostatic capacitance of the central portion of the electrostatic chuck and an electrostatic capacitance of the outer peripheral portion of the electrostatic chuck.Type: GrantFiled: April 16, 2021Date of Patent: November 28, 2023Assignee: TOKYO ELECTRON LIMITEDInventors: Shoichiro Matsuyama, Daiki Satoh, Yasuharu Sasaki, Takashi Nishijima, Jinyoung Park
-
Publication number: 20210233794Abstract: A plasma processing apparatus includes a base, an electrostatic chuck provided on the base, and a dielectric layer. A bias power, whose magnitude is changed during plasma processing on a target substrate, is applied to the base. The electrostatic chuck has a central portion on which the target substrate is mounted and an outer peripheral portion on which a focus ring is mounted to surround the target substrate. The dielectric layer is provided between the outer peripheral portion of the electrostatic and the base or the focus ring and has an electrostatic capacitance that reduces a difference between an electrostatic capacitance of the central portion of the electrostatic chuck and an electrostatic capacitance of the outer peripheral portion of the electrostatic chuck.Type: ApplicationFiled: April 16, 2021Publication date: July 29, 2021Applicant: TOKYO ELECTRON LIMITEDInventors: Shoichiro MATSUYAMA, Daiki SATOH, Yasuharu SASAKI, Takashi NISHIJIMA, Jinyoung PARK
-
Patent number: 11004717Abstract: A plasma processing apparatus includes a base, an electrostatic chuck provided on the base, and a dielectric layer. A bias power, whose magnitude is changed during plasma processing on a target substrate, is applied to the base. The electrostatic chuck has a central portion on which the target substrate is mounted and an outer peripheral portion on which a focus ring is mounted to surround the target substrate. The dielectric layer is provided between the outer peripheral portion of the electrostatic and the base or the focus ring and has an electrostatic capacitance that reduces a difference between an electrostatic capacitance of the central portion of the electrostatic chuck and an electrostatic capacitance of the outer peripheral portion of the electrostatic chuck.Type: GrantFiled: September 13, 2018Date of Patent: May 11, 2021Assignee: TOKYO ELECTRON LIMITEDInventors: Shoichiro Matsuyama, Daiki Satoh, Yasuharu Sasaki, Takashi Nishijima, Jinyoung Park
-
Patent number: 10313553Abstract: According to one embodiment, an image forming apparatus includes a banner page control unit, an image formation control unit, and a printer unit. The banner page control unit acquires banner page setting information indicating setting conditions of a banner page which is inserted between one sheet and another sheet, on which an image is formed by a plurality of jobs. The image formation control unit determines whether or not to form an image of the banner page by a printer unit, based on the banner page setting information. The printer unit forms the image of the banner page, if it is determined by the image formation control unit that the image of the banner page is formed.Type: GrantFiled: March 15, 2017Date of Patent: June 4, 2019Assignees: KABUSHIKI KAISHA TOSHIBA, TOSHIBA TEC KABUSHIKI KAISHAInventor: Takashi Nishijima
-
Publication number: 20190088523Abstract: A plasma processing apparatus includes a base, an electrostatic chuck provided on the base, and a dielectric layer. A bias power, whose magnitude is changed during plasma processing on a target substrate, is applied to the base. The electrostatic chuck has a central portion on which the target substrate is mounted and an outer peripheral portion on which a focus ring is mounted to surround the target substrate. The dielectric layer is provided between the outer peripheral portion of the electrostatic and the base or the focus ring and has an electrostatic capacitance that reduces a difference between an electrostatic capacitance of the central portion of the electrostatic chuck and an electrostatic capacitance of the outer peripheral portion of the electrostatic chuck.Type: ApplicationFiled: September 13, 2018Publication date: March 21, 2019Applicant: TOKYO ELECTRON LIMITEDInventors: Shoichiro MATSUYAMA, Daiki SATOH, Yasuharu SASAKI, Takashi NISHIJIMA, Jinyoung PARK
-
Publication number: 20180227459Abstract: According to one embodiment, an image forming apparatus includes a banner page control unit, an image formation control unit, and a printer unit. The banner page control unit acquires banner page setting information indicating setting conditions of a banner page which is inserted between one sheet and another sheet, on which an image is formed by a plurality of jobs. The image formation control unit determines whether or not to form an image of the banner page by a printer unit, based on the banner page setting information. The printer unit forms the image of the banner page, if it is determined by the image formation control unit that the image of the banner page is formed.Type: ApplicationFiled: March 15, 2017Publication date: August 9, 2018Inventor: Takashi Nishijima
-
Publication number: 20170338084Abstract: A plasma processing method is implemented by a plasma processing apparatus including a processing chamber, a lower electrode, a focus ring arranged around the lower electrode, an inner upper electrode arranged to face the lower electrode, an outer upper electrode electrically insulated from the inner upper electrode, a quartz member arranged between the inner and outer upper electrodes and above the focus ring, a gas supply unit for supplying gas to the processing chamber, a first high frequency power supply unit for applying a first high frequency power for plasma generation to the lower electrode or the inner and outer upper electrodes, a first direct current power supply unit for applying a variable first direct current voltage to the outer upper electrode, and a control unit. The method includes the control unit controlling the variable first direct current voltage to reduce an amount of change in a tilt angle.Type: ApplicationFiled: May 18, 2017Publication date: November 23, 2017Inventor: Takashi NISHIJIMA
-
Patent number: 9496150Abstract: An etching processing method for etching a substrate formed with a target film and a mask film is performed in a substrate processing apparatus including a first and a second power supply for respectively supplying a higher and a lower high frequency power to a processing space and a mounting table, and a DC power supply for supplying a DC power to an electrode. The method includes a modification step for modifying a shape of a pattern formed on the mask film; and an etching step for etching the target film by using the mask film. The mask film is etched by the plasma in the modification step. Further, in the etching step, the DC power is applied to the electrode and the lower high frequency power is applied to the mounting table in a pulse wave form in which a higher and a lower power level are repeated.Type: GrantFiled: December 19, 2014Date of Patent: November 15, 2016Assignee: TOKYO ELECTRON LIMITEDInventors: Hiromasa Mochiki, Shin Okamoto, Takashi Nishijima, Fumio Yamazaki
-
Patent number: 9373521Abstract: An etching processing method for etching a substrate formed with a target film and a mask film is performed in a substrate processing apparatus including a first and a second power supply for respectively supplying a higher and a lower high frequency power to a processing space and a mounting table, and a DC power supply for supplying a DC power to an electrode. The method includes a modification step for modifying a shape of a pattern formed on the mask film; and an etching step for etching the target film by using the mask film. The mask film is etched by the plasma in the modification step. Further, in the etching step, the DC power is applied to the electrode and the lower high frequency power is applied to the mounting table in a pulse wave form in which a higher and a lower power level are repeated.Type: GrantFiled: November 10, 2010Date of Patent: June 21, 2016Assignee: TOKYO ELECTRON LIMITEDInventors: Hiromasa Mochiki, Shin Okamoto, Takashi Nishijima, Fumio Yamazaki
-
Publication number: 20150170933Abstract: An etching processing method for etching a substrate formed with a target film and a mask film is performed in a substrate processing apparatus including a first and a second power supply for respectively supplying a higher and a lower high frequency power to a processing space and a mounting table, and a DC power supply for supplying a DC power to an electrode. The method includes a modification step for modifying a shape of a pattern formed on the mask film; and an etching step for etching the target film by using the mask film. The mask film is etched by the plasma in the modification step. Further, in the etching step, the DC power is applied to the electrode and the lower high frequency power is applied to the mounting table in a pulse wave form in which a higher and a lower power level are repeated.Type: ApplicationFiled: December 19, 2014Publication date: June 18, 2015Applicant: TOKYO ELECTRON LIMITEDInventors: Hiromasa MOCHIKI, Shin OKAMOTO, Takashi NISHIJIMA, Fumio YAMAZAKI
-
Publication number: 20110244691Abstract: An etching processing method for etching a substrate formed with a target film and a mask film is performed in a substrate processing apparatus including a first and a second power supply for respectively supplying a higher and a lower high frequency power to a processing space and a mounting table, and a DC power supply for supplying a DC power to an electrode. The method includes a modification step for modifying a shape of a pattern formed on the mask film; and an etching step for etching the target film by using the mask film. The mask film is etched by the plasma in the modification step. Further, in the etching step, the DC power is applied to the electrode and the lower high frequency power is applied to the mounting table in a pulse wave form in which a higher and a lower power level are repeated.Type: ApplicationFiled: November 10, 2010Publication date: October 6, 2011Applicant: TOKYO ELECTRON LIMITEDInventors: Hiromasa MOCHIKI, Shin OKAMOTO, Takashi NISHIJIMA, Fumio YAMAZAKI
-
Patent number: 8005514Abstract: The present invention provides a field device whereby the device's additional information can be transmitted wirelessly without the need for battery replacement or external wiring. The present invention also provides a field device whereby the firmware of a wireless module in the field device can be developed at minimum cost and whereby it can be made easy to link the firmware to applications, such as an asset management system, on the host system side.Type: GrantFiled: October 25, 2005Date of Patent: August 23, 2011Assignee: Yokogawa Electric CorporationInventors: Yoji Saito, Takashi Nishijima
-
Publication number: 20060092039Abstract: The present invention provides a field device whereby the device's additional information can be transmitted wirelessly without the need for battery replacement or external wiring. The present invention also provides a field device whereby the firmware of a wireless module in the field device can be developed at minimum cost and whereby it can be made easy to link the firmware to applications, such as an asset management system, on the host system side.Type: ApplicationFiled: October 25, 2005Publication date: May 4, 2006Applicant: YOKOGAWA ELECTRIC CORPORATIONInventors: Yoji Saito, Takashi Nishijima
-
Patent number: 5474100Abstract: An electricity/air pressure converter comprising a pair of housings, made of a soft magnetic material, in the middle of which pole pieces are disposed facing each other with an air gap therebetween and which have a cylindrically formed outer circumferential portion; a permanent magnet secured to one of the housings at one end thereof and surrounding one of the pole pieces; a movable member, made of a magnetic material and having spring properties, which is secured to the other end of the permanent magnet and which faces the pole pieces in the air gap; a coil which is wound around the other housing so that it surrounds the pole pieces and through which a current signal flows; and a nozzle which is disposed to face the movable member around the center of either of the pole pieces and which is in communication with one end of a restrictor which is supplied with a supply air pressure at the other end thereof, wherein back pressure is generated at the nozzle according to current signals being outputted as an air pType: GrantFiled: September 7, 1994Date of Patent: December 12, 1995Assignee: Yokogawa Electric CorporationInventors: Takashi Nishijima, Atsushi Kimura, Yasuo Kasahara, Masahito Tsuchiya
-
Patent number: 5444613Abstract: A digital position signal generator suitable for gain control and other purposes. A typical embodiment includes a rotary disk notionally divided into a plurality of sectors of the same angle about the disk axis. Some of the disk sectors have radial extensions which are detectable by photocouplers. The photocouplers are fixedly disposed about the disk axis with angular spacings each greater than the angle of each disk sector. Thus, with the rotation of the disk, the photocouplers produce binary zero and one outputs in various predetermined combinations nonsequentially representing successive predetermined angular positions of the disk. A position data generator circuit such as a microcomputer is provided which has stored thereon meaningful position data sequentially representing the successive predetermined angular positions of the disk. Inputting each output combination of the detectors, the position data generator circuit puts out a corresponding one of the meaningful position data.Type: GrantFiled: April 7, 1994Date of Patent: August 22, 1995Assignee: TEAC CorporationInventors: Makoto Tani, Takashi Nishijima
-
Patent number: 5331223Abstract: A signal supplying unit includes a plurality of terminals, a plurality of signal sources, each of the plurality of signal sources outputting a signal, a detecting circuit for detecting whether or not at least the one of the plurality of terminals is coupled to a terminal of an external unit, and a selecting circuit for selecting signals to be supplied to the plurality of terminals from signals output from the plurality of signal sources in accordance with a detecting result obtained by the detecting circuit.Type: GrantFiled: June 8, 1992Date of Patent: July 19, 1994Assignee: Teac CorporationInventor: Takashi Nishijima
-
Patent number: 4996604Abstract: An image scanner includes a convey path for a document sheet, convey rollers for moving the document sheet along the convey path, an image sensor for reading an image from the document sheet while said document sheet passes in front of said image sensor, and a driving section for driving said convey rollers to move the document sheet forward. The driving section of the image scanner drives the convey rollers to move the document sheet backward it is detected that the document sheet has passed the image sensor.Type: GrantFiled: July 27, 1988Date of Patent: February 26, 1991Assignee: Tokyo Electric Co., Ltd.Inventors: Izumi Ogawa, Kazuyoshi Kurihara, Seigo Uchida, Takashi Nishijima