Abstract: There is provided a charged particle beam apparatus that can reduce the processing time. A charged particle beam apparatus includes: an excitation control unit that controls a focal position by changing a control value of excitation of an electronic lens; an electrostatic field control unit that controls the focal position by changing a control value of an electrostatic field; a focal position height estimation unit that estimates a height of the focal position from the control value of the excitation of the electronic lens; and a control unit that controls the excitation control unit and the electrostatic field control unit. The control unit compares the height of the focal position estimated by the focal position height estimation unit with a height of a sample surface of a sample to be observed, and according to a result of comparison, determines whether it is necessary to change the control value of the excitation of the electronic lens before observing the sample.

Abstract: There is provided a charged particle beam apparatus that can reduce the processing time. A charged particle beam apparatus includes: an excitation control unit that controls a focal position by changing a control value of excitation of an electronic lens; an electrostatic field control unit that controls the focal position by changing a control value of an electrostatic field; a focal position height estimation unit that estimates a height of the focal position from the control value of the excitation of the electronic lens; and a control unit that controls the excitation control unit and the electrostatic field control unit. The control unit compares the height of the focal position estimated by the focal position height estimation unit with a height of a sample surface of a sample to be observed, and according to a result of comparison, determines whether it is necessary to change the control value of the excitation of the electronic lens before observing the sample.

Abstract: The present disclosure provides a technique for reducing man-hour of a user required for setting an automatic focused focal point search function of an electron beam and facilitating observation of a sample when reviewing a defect using an electron microscope. The present disclosure provides a technique in a charged particle beam system, in which an appropriate focal point position search width can be automatically set in consideration of convergence accuracy and an operation time based on a focal point measure distribution width for a focal point position acquired in advance under the same conditions and a difference between focal point positions before and after automatic focused focal point position search.

Abstract: The present disclosure provides a technique for reducing man-hour of a user required for setting an automatic focused focal point search function of an electron beam and facilitating observation of a sample when reviewing a defect using an electron microscope. The present disclosure provides a technique in a charged particle beam system, in which an appropriate focal point position search width can be automatically set in consideration of convergence accuracy and an operation time based on a focal point measure distribution width for a focal point position acquired in advance under the same conditions and a difference between focal point positions before and after automatic focused focal point position search.

Abstract: A defect observation device detects a defect with high accuracy regardless of a defect size. One imaging configuration for observing an observation target on a sample is selected from an optical microscope, an optical microscope, and an electron microscope, and an imaging condition of the selected imaging configuration is controlled.

Abstract: A defect observation device detects a defect with high accuracy regardless of a defect size. One imaging configuration for observing an observation target on a sample is selected from an optical microscope, an optical microscope, and an electron microscope, and an imaging condition of the selected imaging configuration is controlled.

Abstract: An object of the present invention is to obtain a charged particle beam apparatus that includes a simplified sample positioning mechanism used with an electrostatic chuck, allow the sample to be released easily when residual attraction occurs, and enable observation throughout an entire area on an outer peripheral portion of the sample. To attain the object, the present invention provides a charged particle beam apparatus including, in a sample holding system for holding a sample, an outer peripheral part for holding the sample at the outer peripheral portion on a backside of the sample and raising and lowering the sample; a drive portion for raising and lowering the outer peripheral part; an electrostatic chuck for attracting the backside of the sample; and a part for correcting an electric field that is of substantially the same height as the peripheral portion of the sample when the sample is attracted onto the electrostatic chuck.