Patents by Inventor Takashi Ohkawara

Takashi Ohkawara has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5981641
    Abstract: Provided are a thermally conductive silicone composition, a thermally conductive material and a thermally conductive silicone grease, wherein a liquid silicone, an aluminum nitride powder and a zinc oxide powder are comprised, and wherein the total amount of those powders are from 500 to 1,000 parts by weight per 100 parts by weight of the liquid silicone and the ratio of the zinc oxide powder to the sum total of the aluminum nitride powder and the zinc oxide powder is from 0.05 to 0.5 by weight.
    Type: Grant
    Filed: August 8, 1997
    Date of Patent: November 9, 1999
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Takayuki Takahashi, Masahiko Minemura, Takashi Ohkawara
  • Patent number: 5045574
    Abstract: The film-forming agent of the invention is a blend of a silica organosol, of which the silica particles have a specified specific surface area and specified densities of surface groups including silanol groups, alkoxy groups and trimethyl silyl groups, and a diorganopolysiloxane of a specified viscosity terminated at each molecular chain end with a silanolic hydroxy group. The film-forming agent is useful as a skin-care preparation for preventing chapping of hands of people having frequent occasions of contacting with water to exhibit durable water repellency.
    Type: Grant
    Filed: January 19, 1990
    Date of Patent: September 3, 1991
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Satoshi Kuwata, Takashi Ohkawara, Takaaki Shimizu
  • Patent number: 5021089
    Abstract: A water repellency treatment agent which is non-corrosive to metals, comprising a solution as a volatile solvent of 1-20 wt % of silyl phosphate containing 1-10 wt % of phosphorus, and less than 20 wt % of an organopolysiloxane of general formula R.sub.a SiO.sub.(4-a)/2 having a viscosity of 5-10,000 centistokes at 25.degree. C., wherein the letter a has a value in the range 1.95<a<2.20, and R is a monovalent organic group selected from saturated or unsaturated monovalent hydrocarbon groups with 1-30 carbon atoms, halogenated hydrocarbon groups, alkoxy groups, hydroxyl groups and hydrogen atoms.
    Type: Grant
    Filed: February 28, 1990
    Date of Patent: June 4, 1991
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Satoshi Kuwata, Takashi Ohkawara
  • Patent number: 4379311
    Abstract: This invention pertains to a recording bias setting device for a magnetic recording and reproducing apparatus.
    Type: Grant
    Filed: July 2, 1980
    Date of Patent: April 5, 1983
    Assignee: Nakamichi Corporation
    Inventor: Takashi Ohkawara