Patents by Inventor Takashi Ohto

Takashi Ohto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Component for producing semiconductor devices and process of producing it
    Patent number: 4987016
    Abstract: A component for producing semiconductor devices such as a tube, a boat or the like, comprising a component body made of a silicon carbide material, a silica layer formed on a surface of the body and a CVD coating layer of silicon carbide formed on the silica layer. The silica layer has a thickness ranging between 0.1 and 5 microns. The CVD coating layer has a thickness ranging between 50 to 1000 microns.
    Type: Grant
    Filed: September 1, 1988
    Date of Patent: January 22, 1991
    Assignee: Toshiba Ceramics Co., Ltd.
    Inventors: Takashi Ohto, Takashi Tanaka, Makoto Sato