Patents by Inventor Takashi Sesei

Takashi Sesei has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20160116385
    Abstract: A biological-matter-adhesive substrate includes a base having a surface having a hydrophilicity configured to allow a biological matter to be bonded to the surface of the base. The surface of the base is covered with an acidic solution. This biological-matter-adhesive substrate maintains adhesiveness to a biological matter even if being stored for a long period of time.
    Type: Application
    Filed: May 28, 2014
    Publication date: April 28, 2016
    Applicant: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
    Inventor: TAKASHI SESEI
  • Publication number: 20150231536
    Abstract: A filter device is configured to filter a sample containing a liquid component and plural solid components mixed with the liquid component. The filter device includes a filter part, and a capturing-retaining mechanism. The filter part is configured to capture the solid components and to allow the liquid component to pass through the filter part. The capturing-retaining mechanism is configured to prevent the captured solid components from being removed from the filter part when the sample passes through the filter part. The filter device has high filter performance.
    Type: Application
    Filed: October 22, 2013
    Publication date: August 20, 2015
    Inventors: Takahiro Nogami, Takeki Yamamoto, Takashi Sesei
  • Publication number: 20110200945
    Abstract: An alignment mark having high precision and good visibility is formed in a simple manner without modification of a manufacturing line or a significant increase of man hours and a flat panel display is manufactured at low cost and with good productivity. To achieve this, the method includes a step of forming a photosensitive film on a substrate, a step of forming an alignment mark by exposing the photosensitive film by using an exposing mask, and a step of performing position alignment by recognizing the alignment mark in an undeveloped state of the photosensitive film.
    Type: Application
    Filed: November 12, 2009
    Publication date: August 18, 2011
    Inventors: Eiichi Uriu, Motohiro Taniguchi, Tomohiro Murakoso, Toshiya Otani, Souji Yamamoto, Toshiaki Fujiwara, Takashi Sesei, Noriyuki Matsubara