Patents by Inventor Takashi Suemasu

Takashi Suemasu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8728854
    Abstract: A method for producing a semiconductor material, comprises a step of allowing impurity atoms, Ba atoms and Si atoms to react with each other, the impurity atoms being at least one atom selected from the group consisting of As atom, Sb atom, Bi atom and N atom; and a solar cell comprises the semiconductor material.
    Type: Grant
    Filed: August 27, 2008
    Date of Patent: May 20, 2014
    Assignee: Japan Science and Technology Agency
    Inventor: Takashi Suemasu
  • Patent number: 8502191
    Abstract: A semiconductor device includes: a silicon layer (12); an intermediate silicide layer (28) that is provided on the silicon layer (12), has openings, and includes barium silicide; and an upper silicide layer (14) that covers the intermediate silicide layer (28), is positioned to be in contact with the silicon layer (12) through the openings, has a higher dopant concentration than the dopant concentration of the intermediate silicide layer (28), and includes barium silicide.
    Type: Grant
    Filed: May 11, 2010
    Date of Patent: August 6, 2013
    Assignees: University of Tsukuba, Tohoku University
    Inventors: Takashi Suemasu, Noritaka Usami
  • Publication number: 20120049150
    Abstract: A semiconductor device includes: a silicon layer (12); an intermediate silicide layer (28) that is provided on the silicon layer (12), has openings, and includes barium silicide; and an upper silicide layer (14) that covers the intermediate silicide layer (28), is positioned to be in contact with the silicon layer (12) through the openings, has a higher dopant concentration than the dopant concentration of the intermediate silicide layer (28), and includes barium silicide.
    Type: Application
    Filed: May 11, 2010
    Publication date: March 1, 2012
    Applicants: TOHOKU UNIVERSITY, UNIVERSITY OF TSUKUBA
    Inventors: Takashi Suemasu, Noritaka Usami
  • Patent number: 7999178
    Abstract: A solar cell comprises a substrate; an n-type barium silicide layer being arranged on the substrate and containing Ba atoms and Si atoms; an n+-type barium silicide layer being arranged on the n-type barium silicide layer and containing impurity atoms which are at least one of atoms belonging to Groups 13 to 15 of the periodic table, Ba atoms, and Si atoms; an upper electrode arranged on the n+-type barium silicide layer; and a lower electrode arranged on the substrate.
    Type: Grant
    Filed: July 25, 2008
    Date of Patent: August 16, 2011
    Assignee: Japan Science and Technology Agency
    Inventor: Takashi Suemasu
  • Publication number: 20100252097
    Abstract: A method for producing a semiconductor material, comprises a step of allowing impurity atoms, Ba atoms and Si atoms to react with each other, the impurity atoms being at least one atom selected from the group consisting of As atom, Sb atom, Bi atom and N atom; and a solar cell comprises the semiconductor material.
    Type: Application
    Filed: August 27, 2008
    Publication date: October 7, 2010
    Inventor: Takashi Suemasu
  • Publication number: 20090044862
    Abstract: A solar cell comprises a substrate; an n-type barium silicide layer being arranged on the substrate and containing Ba atoms and Si atoms; an n+-type barium silicide layer being arranged on the n-type barium silicide layer and containing impurity atoms which are at least one of atoms belonging to Groups 13 to 15 of the periodic table, Ba atoms, and Si atoms; an upper electrode arranged on the n+-type barium silicide layer; and a lower electrode arranged on the substrate.
    Type: Application
    Filed: July 25, 2008
    Publication date: February 19, 2009
    Applicant: JAPAN SCIENCE AND TECHNOLOGY AGENCY
    Inventor: Takashi Suemasu
  • Patent number: 6368889
    Abstract: An object is to provide a variable-wavelength light-emitting element which employs a direct gap semiconductor having a magnetic moment for a semiconductor layer serving as an active layer, so that the semiconductor has reduced crystal distortion and stable characteristics as the active layer of the light-emitting element, as well as a method of fabricating the variable-wavelength light-emitting element. A semiconductor silicide or a semiconductor silicide doped with transition metal is used to form an active layer (&bgr;-FeSi2 transformed into spheres) (2″) of a semiconductor light-emitting element, and the active layer is sandwiched between p-type and n-type semiconductor layers forming a pn junction, the p-type and n-type semiconductor layers having a forbidden bandwidth greater than that of the semiconductor silicide.
    Type: Grant
    Filed: June 9, 2000
    Date of Patent: April 9, 2002
    Assignee: Japan Science and Technology Corporation
    Inventor: Takashi Suemasu