Patents by Inventor Takashi Sueyoshi

Takashi Sueyoshi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9297950
    Abstract: Provided is an optical fiber which is provided with heat resistance and productivity and in which a transmission loss is suppressed even in a high-temperature environment. It has, on an outer periphery of a glass fiber composed of a core part and a cladding part, a coating layer made by crosslinking an energy-curable resin composition containing a silicon compound, in which the silicon compound contained in the energy-curable resin composition of the coating layer as an outermost layer has a specified structure having a cyclic silicone site having an epoxy group and a linear silicone site, with the content of the cyclic silicone site in the compound being from 10 to 30% by mass.
    Type: Grant
    Filed: May 10, 2012
    Date of Patent: March 29, 2016
    Assignees: SUMITOMO ELECTRIC INDUSTRIES, LTD., ADEKA CORPORATION
    Inventors: Kazuyuki Sohma, Tomoyuki Hattori, Takashi Sueyoshi, Seiichi Saito, Koichi Sakamaki
  • Publication number: 20140199040
    Abstract: Provided is an optical fiber which is provided with heat resistance and productivity and in which a transmission loss is suppressed even in a high-temperature environment. It has, on an outer periphery of a glass fiber composed of a core part and a cladding part, a coating layer made by crosslinking an energy-curable resin composition containing a silicon compound, in which the silicon compound contained in the energy-curable resin composition of the coating layer as an outermost layer has a specified structure having a cyclic silicone site having an epoxy group and a linear silicone site, with the content of the cyclic silicone site in the compound being from 10 to 30% by mass.
    Type: Application
    Filed: May 10, 2012
    Publication date: July 17, 2014
    Applicants: ADEKA CORPORATION, SUMITOMO ELECTRIC INDUSTRIES, LTD.
    Inventors: Kazuyuki Sohma, Tomoyuki Hattori, Takashi Sueyoshi, Seiichi Saito, Koichi Sakamaki
  • Patent number: 8003736
    Abstract: A silicon-containing compound of formula (1), and a curing composition containing a silicon-containing compound of formula (1) wherein Z is hydrogen, a silicon-containing compound of formula (1) wherein Z is C2-C4 alkenyl or alkynyl and a hydrosilylation catalyst. The composition has excellent handling and curing properties and provides a cured product with excellent heat resistance and flexibility. In formula (1), Ra-Rg=C1-C12 saturated aliphatic hydrocarbon group or C6-C12 aromatic hydrocarbon group. Re and Rf do not simultaneously represent C1-C12 saturated aliphatic hydrocarbon group; Y=C2-C4 alkylene; Z=hydrogen or C2-C4 alkenyl or alkynyl; K is 2-7; T is 1-7; P is 0-3; and M and N are numbers selected such that N:M=1:1 to 1:100, that all M's and N's total at least 15, and that the mass average molecular weight of the compound of formula (1) is 3,000 to 1,000,000.
    Type: Grant
    Filed: April 21, 2008
    Date of Patent: August 23, 2011
    Assignee: Adeka Corporation
    Inventors: Takashi Sueyoshi, Ken-ichiro Hiwatari, Tadashi Janado, Yoshikazu Shoji, Seiichi Saito, Yoshitaka Sugawara
  • Patent number: 7939614
    Abstract: A curable composition which comprises at least one of the following (A), (B), and (C) and further contains (D) (provided that when (C) is not contained, both (A) and (B) are in the composition. (A): A silicon-containing polymer in which the content of components having a weight-average molecular weight of 1,000 or lower is 20 wt. % or lower and which has a reactive group A? and one or more Si—O—Si bonds. (B): A silicon-containing polymer in which the content of components having a weight-average molecular weight of 1,000 or lower is 20 wt. % or lower and which has an Si—H group and one or more Si—O—Si bonds. (C): A silicon-containing polymer in which the content of components having a weight-average molecular weight of 1,000 or lower is 20 wt. % or lower and which has a reactive group A?, an Si—H group, and one or more Si—O—Si bonds. (D): A catalyst for curing reaction which is a platinum catalyst.
    Type: Grant
    Filed: May 10, 2005
    Date of Patent: May 10, 2011
    Assignees: Adeka Corporation, Kansai Electric Power Company, Inc.
    Inventors: Takashi Sueyoshi, Ken-Ichiro Hiwatari, Tadashi Janado, Yoshikazu Shoji, Yoshitaka Sugawara
  • Publication number: 20100179283
    Abstract: A silicon-containing compound of formula (1), and a curing composition containing a silicon-containing compound of formula (1) wherein Z is hydrogen, a silicon-containing compound of formula (1) wherein Z is C2-C4 alkenyl or alkynyl and a hydrosilylation catalyst. The composition has excellent handling and curing properties and provides a cured product with excellent heat resistance and flexibility. In formula (1), Ra—Rg=C1-C12 saturated aliphatic hydrocarbon group or C6-C12 aromatic hydrocarbon group. Re and Rf do not simultaneously represent C1-C12 saturated aliphatic hydrocarbon group; Y?C2-C4 alkylene; Z=hydrogen or C2-C4 alkenyl or alkynyl; K is 2-7; T is 1-7; P is 0-3; and M and N are numbers selected such that N:M=1:1 to 1:100, that all M's and N's total at least 15, and that the mass average molecular weight of the compound of formula (1) is 3,000 to 1,000,000.
    Type: Application
    Filed: April 21, 2008
    Publication date: July 15, 2010
    Applicant: ADEKA CORPORATION
    Inventors: Takashi Sueyoshi, Ken-ichiro Hiwatari, Tadashi Janado, Yoshikazu Shoji, Seiichi Saito, Yoshitaka Sugawara
  • Publication number: 20070262472
    Abstract: A high withstand voltage semiconductor chip mounted on a package or a board is covered with a sealing resin, and the resin is cured while a high voltage is applied between at least one of electrode terminals connected from a chip electrode or the chip via wiring of wires or the like and another electrode that necessitates a dielectric withstand voltage between the electrode and the electrode terminal during the curing. The sealing resin is provided by a synthetic high molecular compound structured in a manner that an organic silicon polymer C is constituted by alternately linearly linking an organic silicon polymer A having a crosslinking structure of siloxane with an organic silicon polymer B having a linear link structure of siloxane (Si—O—Si bond) by siloxane bond and the polymers are three-dimensionally linked together by covalent bond.
    Type: Application
    Filed: October 5, 2005
    Publication date: November 15, 2007
    Inventors: Shinichi Okada, Yoshitaka Sugawara, Katsunori Asano, Daisuke Takayama, Yoshikazu Shoji, Tadashi Janado, Takashi Sueyoshi, Ken-Ichiro Hiwatari
  • Publication number: 20070197755
    Abstract: A curable composition which comprises at least one of the following (A), (B), and (C) and further contains the following (D) (provided that when (C) is not contained, both (A) and (B) are contained). (A): A silicon-containing polymer in which the content of components having a weight-average molecular weight of 1,000 or lower is 20 wt. % or lower and which has a reactive group A? and one or more Si—O—Si bonds. (B): A silicon-containing polymer in which the content of components having a weight-average molecular weight of 1,000 or lower is 20 wt. % or lower and which has an Si—H group and one or more Si—O—Si bonds. (C): A silicon-containing polymer in which the content of components having a weight-average molecular weight of 1,000 or lower is 20 wt. % or lower and which has a reactive group A?, an Si—H group, and one or more Si—O—Si bonds. (D): A catalyst for curing reaction which is a platinum catalyst.
    Type: Application
    Filed: May 10, 2005
    Publication date: August 23, 2007
    Applicants: ADEKA CORPORATION, THE KANSAI ELECTRIC POWER COMPANY, INC.
    Inventors: Takashi Sueyoshi, Ken-ichiro Hiwatari, Tadashi Janado, Yoshikazu Shoji, Yoshitaka Sugawara
  • Patent number: 6005246
    Abstract: There is disclosed a scanning probe microscope capable of producing a topographic image at a high resolution with a cantilever of a large spring constant and, at the same time, a surface potential image at a high resolution. This microscope can take the form of an atomic force microscope that detects the surface potential of a sample, using a force gradient acting between the probe tip and the sample. The gradient is represented by the output from a frequency-to-voltage converter.
    Type: Grant
    Filed: July 8, 1998
    Date of Patent: December 21, 1999
    Assignee: JEOL Ltd.
    Inventors: Shinichi Kitamura, Takashi Sueyoshi
  • Patent number: 5939715
    Abstract: There is disclosed a scanning probe microscope capable of producing a topographic image and a magnetic image of a surface of a sample in one measurement. The microscope has a probe tip made of a magnetic material. A physical force, such as an atomic force, is exerted between the probe tip and the sample. When this physical force does not act on the probe tip, it vibrates at a first vibrational frequency. Displacements of the probe tip are detected by a photodetector. A topographic information-extracting portion including a voltage-to-current converter, a phase shifter, an FM demodulator, a low-pass filter, and an error amplifier extracts a signal representative of topographic information from the output from the photodetector. A magnetic distribution-extracting portion, including an oscillator and a lock-in amplifier, extracts information about the magnetism of the sample from the output from the photodetector.
    Type: Grant
    Filed: February 27, 1997
    Date of Patent: August 17, 1999
    Assignee: Jeol Ltd.
    Inventors: Shinichi Kitamura, Takashi Sueyoshi