Patents by Inventor Takashi Sugioka
Takashi Sugioka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10618860Abstract: There is provided a composition containing one or more basic compounds selected from the group consisting of tertiary amines, nitrogen-containing heterocyclic aromatic compounds, alkali metal carbonate salts, alkaline earth metal carbonate salts and alkali metal hydrogencarbonate salts, and a homoallyl halide.Type: GrantFiled: September 13, 2016Date of Patent: April 14, 2020Assignee: KURARAY CO., LTDInventors: Junko Sato, Katsuji Ujita, Takuo Tsuruta, Takashi Sugioka
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Publication number: 20180244593Abstract: There is provided a composition containing one or more basic compounds selected from the group consisting of tertiary amines, nitrogen-containing heterocyclic aromatic compounds, alkali metal carbonate salts, alkaline earth metal carbonate salts and alkali metal hydrogencarbonate salts, and a homoallyl halide.Type: ApplicationFiled: September 13, 2016Publication date: August 30, 2018Applicant: KURARAY CO., LTD.Inventors: Junko SATO, Katsuji UJITA, Takuo TSURUTA, Takashi SUGIOKA
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Patent number: 8987447Abstract: A thienopyrazine compound which is useful for an organic semiconductor material. An organic field effect transistor, which includes an organic semiconductor layer that is easily produced from an organic semiconductor material containing the thienopyrazine compound by a coating method or a printing method, and which exhibits high carrier mobility and high on/off current ratio; and an organic field effect transistor which has ambipolar characteristics. The thienopyrazine compound is represented by chemical formula (I): wherein Ar1 and Ar2 each represents an aryl group, and R1 and R2 each independently represents a hydrogen atom, an alkyl group or an aryl group; or alternatively R1 and R2 represent a group having a ring formed by combining R1 and R2 together.Type: GrantFiled: December 6, 2010Date of Patent: March 24, 2015Assignees: Kuraray Co., Ltd., Tokyo Institute of TechnologyInventors: Yoshiro Yamashita, Hikaru Nakayama, Takashi Sugioka
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Publication number: 20140166942Abstract: Provide are: a conjugated block copolymer capable of increasing the amount of optical absorption by a photoelectric conversion active layer and controlling the morphology thereof and capable of achieving excellent photoelectric conversion efficiency; and a photoelectric conversion element comprising a composition including an electron accepting material and this kind of conjugated block polymer. A ?-electron conjugated block copolymer comprising: a polymer block (A) which involving a monomer unit having at least one heteroaryl skeleton selected from the group consisting of a fused ?-conjugated skeleton, a fluorene, a carbazole, a dibenzosilole and a dibenzogermole containing at least one thiophene ring in a part of a chemical structure thereof; and a polymer block (B) involving a monomer unit of a thiophene-2,5-diyl group having a substituent at least at a 3-position thereof.Type: ApplicationFiled: March 30, 2012Publication date: June 19, 2014Inventors: Takafumi Izawa, Hiromasa Shibuya, Takashi Sugioka, Takuya Inagaki, Yasushi Morihara, Atsuhiro Nakahara, Akio Fujita, Hiroyuki Ogi
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Publication number: 20140124710Abstract: Provided are: a conjugated block copolymer capable of increasing the amount of optical absorption by a photoelectric conversion active layer and controlling the morphology thereof and capable of achieving excellent photoelectric conversion efficiency; and a photoelectric conversion element comprising a composition including an electron accepting material using this kind of conjugated block polymer. A ?-electron conjugated block copolymer comprises: a polymer block (A) and a polymer block (B), each of which involves a monomer unit having at least one fused ?-conjugated skeleton including at least one thiophene ring in one part of the chemical structure thereof, the polymer block (A) and the polymer block (B) have different monomer units from each other.Type: ApplicationFiled: March 30, 2012Publication date: May 8, 2014Applicant: KURARAY CO., LTD.Inventors: Takafumi Izawa, Hiromasa Shibuya, Takashi Sugioka, Takuya Inagaki, Yasushi Morihara, Atsuhiro Nakahara, Akio Fujita, Hiroyuki Ogi
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Publication number: 20140084220Abstract: Provided is a conjugated block copolymer that is capable of morphology control and that can achieve superior conversion efficiency.Type: ApplicationFiled: March 9, 2012Publication date: March 27, 2014Applicant: KURARAY CO., LTD.Inventors: Takuya Inagaki, Hiromasa Shibuya, Takashi Sugioka, Takafumi Izawa, Yasushi Morihara, Atsuhiro Nakahara, Akio Fujita, Hiroyuki Ogi
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Publication number: 20130005979Abstract: This invention relates to a novel thienopyridine derivative represented by formula (1), which is useful as an organic semiconductor device, such as an organic thin film transistor element, and the invention also relates to method for producing the thienopyridine derivative represented by formula (1):Type: ApplicationFiled: March 14, 2011Publication date: January 3, 2013Applicants: Kuraray Co. Ltd., Hiroshima UniversityInventors: Joji Ohshita, Yutaka Harima, Takashi Sugioka, Koichi Kanehira
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Publication number: 20120248428Abstract: A thienopyrazine compound which is useful for an organic semiconductor material. An organic field effect transistor, which includes an organic semiconductor layer that is easily produced from an organic semiconductor material containing the thienopyrazine compound by a coating method or a printing method, and which exhibits high carrier mobility and high on/off current ratio; and an organic field effect transistor which has ambipolar characteristics. The thienopyrazine compound is represented by chemical formula (I): wherein Ar1 and Ar2 each represents an aryl group, and R1 and R2 each independently represents a hydrogen atom, an alkyl group or an aryl group; or alternatively R1 and R2 represent a group having a ring formed by combining R1 and R2 together.Type: ApplicationFiled: December 6, 2010Publication date: October 4, 2012Applicants: TOKYO INSTITUTE OF TECHNOLOGY, KURARAY CO., LTD.Inventors: Yoshiro Yamashita, Hikaru Nakayama, Takashi Sugioka
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Patent number: 7745666Abstract: A bisphosphite represented by the general formula (I): General Formula (I) (in the formula, A represents an alkylene group which may have a substituent, a cycloalkylene group which may have a substituent, a phenylene group which may have a substituent, or a naphthylene group which may have a substituent; and R1 represents a hydrogen atom or an alkyl group) and a method for producing an aldehyde including reacting a non-conjugated diene having a carbon-carbon double bond in a molecular end and having from 6 to 20 carbon atoms with a carbon monoxide and hydrogen in the presence of such a bisphosphite and a group 8 to 10 metal compound, are provided.Type: GrantFiled: April 3, 2007Date of Patent: June 29, 2010Assignee: Kuraray Co., Ltd.Inventors: Takashi Sugioka, Jin Tokuyasu, Takuo Tsuruta, Hideharu Iwasaki
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Publication number: 20090259073Abstract: A bisphosphite represented by the general formula (I): General Formula (I) (in the formula, A represents an alkylene group which may have a substituent, a cycloalkylene group which may have a substituent, a phenylene group which may have a substituent, or a naphthylene group which may have a substituent; and R1 represents a hydrogen atom or an alkyl group) and a method for producing an aldehyde including reacting a non-conjugated diene having a carbon-carbon double bond in a molecular end and having from 6 to 20 carbon atoms with a carbon monoxide and hydrogen in the presence of such a bisphosphite and a group 8 to 10 metal compound, are provided.Type: ApplicationFiled: April 3, 2007Publication date: October 15, 2009Applicant: Kuraray Co., LtdInventors: Takashi Sugioka, Jin Tokuyasu, Takuo Tsuruta, Hideharu Iwasaki
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Publication number: 20090036636Abstract: A method for producing a polyvinyl acetal resin is provided which is characterized in that a polyvinyl alcohol and a carbonyl compound are reacted at 40 to 200° C. in a liquid containing water and/or an alcohol as solvents in the presence of an acid catalyst including carbon dioxide. By this method, a polyvinyl acetal resin having a halogen element content of ppm or less and an alkali metal element content of 1000 ppm or less can be obtained without particularly performing washing operations. Therefore, a method for producing a polyvinyl acetal resin containing only little impurities such as metal salts and acids is provided.Type: ApplicationFiled: August 7, 2006Publication date: February 5, 2009Applicant: KURARAY CO., LTD.Inventors: Yoshihisa Tsuji, Masayoshi Yamanaka, Takeshi Kusudou, Hideharu Iwasaki, Takashi Sugioka
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Patent number: 7442827Abstract: The present invention provide a process that allows the industrially advantageous production of a cyclopentanone-2,3,5-tricarboxylic acid triester. Namely, the present invention provides a process for producing a cyclopentanone-2,3,5-tricarboxylic acid triester represented by the general formula (IV), characterized by comprising: (1) allowing an itaconic acid diester represented by the general formula (I) to react with a metal salt of malonic acid diester represented by the general formula (II) to obtain a reaction mixture containing an adduct represented by the general formula (III); and then (2) allowing said reaction mixture to react with an alcohol or a metal alkoxide, or a mixture thereof: wherein R1, R2, R3, R4, R5, R6, and R7 each independently represents an alkyl group which may have a substituent, and M represents an alkali metal.Type: GrantFiled: May 10, 2005Date of Patent: October 28, 2008Assignee: Kuraray Co., Ltd.Inventors: Takashi Sugioka, Yoshimi Fukunaga
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Publication number: 20080027241Abstract: The present invention provide a process that allows the industrially advantageous production of a cyclopentanone-2,3,5-tricarboxylic acid triester. Namely, the present invention provides a process for producing a cyclopentanone-2,3,5-tricarboxylic acid triester represented by the general formula (IV), characterized by comprising: (1) allowing an itaconic acid diester represented by the general formula (I) to react with a metal salt of malonic acid diester represented by the general formula (II) to obtain a reaction mixture containing an adduct represented by the general formula (III); and then (2) allowing said reaction mixture to react with an alcohol or a metal alkoxide, or a mixture thereof: wherein R1, R2, R3, R4, R5, R6, and R7 each independently represents an alkyl group which may have a substituent, and M represents an alkali metal.Type: ApplicationFiled: May 10, 2005Publication date: January 31, 2008Applicant: KURARAY CO., LTDInventors: Takashi Sugioka, Yoshimi Fukunaga
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Publication number: 20070197490Abstract: The present invention relates to a method of producing a mixture of 5?-pregnane derivatives represented by the formula (II) and the formula (III), which is characterized by reacting a pregnane derivative represented by the formula (I) with a metal selected from alkali metals and alkaline earth metals in the presence of a proton donor and an amine and/or ammonia. According to the present invention, a method capable of producing 5?-pregnane derivatives useful as synthetic intermediates for squalamine, in a high yield from easily available raw materials, can be provided: wherein R1 is a hydroxyl-protecting group, and R2, R11 and R12 are each independently a hydrogen atom or a hydroxyl-protecting group.Type: ApplicationFiled: March 31, 2005Publication date: August 23, 2007Applicant: Kuraray Co., Ltd.Inventors: Kenichi Koyakumaru, Takashi Sugioka, Shigeo Ohzono, Naoshi Nakagawa
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Publication number: 20070149494Abstract: The present invention relates to a method of producing 5?-pregnane derivatives represented by the formula (II), which is characterized by reacting a pregnane derivative represented by the formula (I) with a metal selected from alkali metals and alkaline earth metals in the presence of a proton donor and an amine and/or ammonia. According to the present invention, a method capable of producing 5?-pregnane derivatives useful as synthetic intermediates for squalamine, in a high yield from easily available raw materials, can be provided: wherein R1 is a hydroxyl-protecting group, and R2, R11 and R12 are each independently a hydrogen atom or a hydroxyl-protecting group and R3 and R4 are each hydrogen atoms in combination form a bond.Type: ApplicationFiled: March 31, 2005Publication date: June 28, 2007Applicant: KURARAY CO., LTD.Inventors: Takashi Sugioka, Shigeo Ohzono, Kenichi Koyakumaru, Naoshi Nakagawa
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Patent number: 6797832Abstract: The present invention provides a method of producing 5-oxy-7-oxabicyclo[4.1.0]hept-3-ene-3-carboxylic acid ester economically, industrially advantageously and efficiently in a large amount. The present invention is a method of producing 5-oxy-7-oxabicyclo[4.1.0]hept-3-ene-3-carboxylic acid ester (X), which is shown in the following scheme. wherein each symbol is as defined in the specification.Type: GrantFiled: June 21, 2002Date of Patent: September 28, 2004Assignees: Sagami Chemical Research Center, Kuraray Co., Ltd.Inventors: Shiro Terashima, Katsuji Ujita, Tomoya Kuwayama, Takashi Sugioka, Kazuya Shimizu, Koichi Kanehira
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Patent number: 6350876Abstract: 2-Sulfonylpyridine derivatives can be industrially produced efficiently by reacting a sulfonyl cyanide derivative with an &agr;,&bgr;-unsaturated carbonyl compound and a 2-{[(2-pyridyl)methyl]thio}-1H-benzimidazole skeleton can be formed in one step in a good yield by reacting this type of the 2-sulfonylpyridine derivative with a 2-methylthio-1H-benzimidazole derivative in the presence of an organolithium compound.Type: GrantFiled: December 7, 2000Date of Patent: February 26, 2002Assignee: Kuraray Co., Ltd.Inventors: Ken-ichi Koyakumaru, Takashi Sugioka, Tomoya Kuwayama, Goro Asanuma
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Publication number: 20010051726Abstract: 2-Sulfonylpyridine derivatives can be industrially produced efficiently by reacting a sulfonyl cyanide derivative with an &agr;,&bgr;-unsaturated carbonyl compound and a 2-{[(2-pyridyl)methyl]thio}-1H-benzimidazole skeleton can be formed in one step in a good yield by reacting this type of the 2-sulfonylpyridine derivative with a 2-methylthio-1H-benzimidazole derivative in the presence of an organolithium compound.Type: ApplicationFiled: December 7, 2000Publication date: December 13, 2001Applicant: KURARAY CO., LTD.Inventors: Ken-Ichi Koyakumaru, Takashi Sugioka, Tomoya Kuwayama, Goro Asanuma
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Patent number: 6197962Abstract: 2-Sulfonylpyridine derivatives can be industrially produced efficiently by reacting a sulfonyl cyanide derivative with an &agr;, &bgr;-unsaturated carbonyl compound and a 2-{[(2-pyridyl)methyl]thio}-1H-benzimidazole skeleton can be formed in one step in a good yield by reacting this type of the 2-sulfonylpyridine derivative with a 2-methylthio-1H-benzimidazole derivative in the presence of an organolithium compound.Type: GrantFiled: January 25, 1999Date of Patent: March 6, 2001Assignee: Kuraray Co., Ltd.Inventors: Ken-ichi Koyakumaru, Takashi Sugioka, Tomoya Kuwayama, Goro Asanuma