Abstract: A manufacturing method of a Blazed diffraction grating configured to diffract incident light and made of a CdTe or CdZnTe crystal material includes the step of forming a plurality of grating grooves in a processed surface of a work through machining using a processing machine for the Blazed diffraction grating. The forming step forms the grating grooves so that among surfaces of gratings formed by the forming step, a surface that receives the incident light most is set to a (110) plane as a crystal orientation of the crystal material.

Abstract: A method for manufacturing a blazed diffraction grating made of a crystalline material comprising zinc selenide (ZnSe) or zinc sulfide (ZnS) includes forming the blazed diffraction grating by forming a plurality of grating grooves on a machined surface of a workpiece by machining, wherein the grating grooves are formed so that a surface comprising a (110) plane is arranged to receive the most incident light among the surfaces that constitute each grating, where (110) describes a crystal orientation of the crystalline material.

Abstract: A manufacturing method of a Blazed diffraction grating configured to diffract incident light and made of a CdTe or CdZnTe crystal material includes the step of forming a plurality of grating grooves in a processed surface of a work through machining using a processing machine for the Blazed diffraction grating. The forming step forms the grating grooves so that among surfaces of gratings formed by the forming step, a surface that receives the incident light most is set to a (110) plane as a crystal orientation of the crystal material.

Abstract: The present invention provides a spectral apparatus for spectrally separating light including a predetermined wavelength, including a slit that the light enters, a first optical system configured to collimate the light from the slit, a transmissive type diffraction element configured to diffract the light from the first optical system, and a second optical system including a first mirror configured to reflect the light diffracted by the transmissive type diffraction element, and a second mirror configured to reflect the light reflected by the first mirror and diffracted by the transmissive type diffraction element, and configured to make the light reciprocally travel between the first mirror and the second mirror via the transmissive type diffraction element.

Abstract: A method for manufacturing a blazed diffraction grating made of a crystalline material comprising gallium phosphide (GaP) or gallium arsenide (GaAs) includes forming the blazed diffraction grating by forming a plurality of grating grooves on a machined surface of a workpiece by machining, wherein the grating grooves are formed so that a surface comprising a (110) plane is arranged to receive the most incident light among the surfaces that constitute each grating, where (110) describes a crystal orientation of the crystalline material.

Abstract: A method for manufacturing a diffraction grating having a plurality of grating grooves that extends in parallel in a direction includes a first cutting processing step of moving, in the direction, a work and a cutting tool having a first blade and a second blade relatively to each other, and of forming a first surface of the grating groove in the work through cutting processing using the first blade of the cutting tool, and a second cutting step of moving, in the direction, the work and the cutting tool relatively to each other after the first cutting processing step, so that the first blade does not contact the first surface formed by the first cutting processing step, and of forming a second surface of the grating groove in the work through cutting processing using the second blade of the cutting tool.

Abstract: A method of manufacturing a blazed diffractive grating includes a first step of forming a first groove having a first surface and a second surface by moving, in the first direction at a first position in the second direction, a cutting tool having a first cutting blade and a second cutting blade to cut the object; a second step of forming a second groove by moving, in the first direction at a second position separated from the first position in the second direction by a grating pitch, the cutting tool to cut the object; and a third step of forming a blazed surface of the first groove using the first cutting blade by moving, in the first direction at a third position between the first position and the second position, the cutting tool to cut the first surface of the first groove.

Abstract: A method for producing a blazed diffraction grating made of a crystal material of InP or InAs according to the present invention is characterized in that when the blazed diffraction grating is formed by forming a plurality of grating grooves by machining a process target surface of a workpiece W (step S150), the grating grooves are formed in such a manner that the surface that receives the largest quantity of incident light among surfaces constituting each grating is set on a crystal orientation plane of the crystal material.

Abstract: A manufacturing method for an excimer laser that includes a reflective Echelle diffraction grating includes obtaining information of a wavelength of a light source, a blazed order, a repetitive pitch of the grating, a material of the grating, and a predefined orientation ratio B/A that is a ratio between that a diffraction efficiency A of the blazed order and a diffraction efficiency Bb of an order lower by one order than the blazed order, and determining an initial value of a blaze angle based upon these pieces of information.

Abstract: The present invention provides a spectral apparatus for spectrally separating light including a predetermined wavelength, including a slit that the light enters, a first optical system configured to collimate the light from the slit, a transmissive type diffraction element configured to diffract the light from the first optical system, and a second optical system including a first mirror configured to reflect the light diffracted by the transmissive type diffraction element, and a second mirror configured to reflect the light reflected by the first mirror and diffracted by the transmissive type diffraction element, and configured to make the light reciprocally travel between the first mirror and the second mirror via the transmissive type diffraction element.

Abstract: An Echelle diffraction grating has a Littrow configuration. Each grating includes a resin layer made of light curing resin and having a thickness between 2 ?m and 10 ?m, and a reflective coating layer formed on the resin layer, having a thickness between 120 nm and 500 nm, and made of aluminum. An apex angle between a blazed surface and a counter surface is between 85° and 90°. A first blaze angle is an angle that maximizes diffraction efficiency of a set blazed order for incident light of a wavelength of 193.3 nm. A blaze angle has an initial value of a second blaze angle smaller than the first blaze angle. 0.25°?bd?ba?1.2° is satisfied where bd denotes the first blaze angle and ba denotes the second blaze angle.

Abstract: A method for manufacturing a blazed diffraction grating made of a crystalline material comprising gallium phosphide (GaP) or gallium arsenide (GaAs) includes forming the blazed diffraction grating by forming a plurality of grating grooves on a machined surface of a workpiece by machining, wherein the grating grooves are formed so that a surface comprising a (110) plane is arranged to receive the most incident light among the surfaces that constitute each grating, where (110) describes a crystal orientation of the crystalline material.

Abstract: A method for manufacturing a blazed diffraction grating made of a crystalline material comprising zinc selenide (ZnSe) or zinc sulfide (ZnS) includes forming the blazed diffraction grating by forming a plurality of grating grooves on a machined surface of a workpiece by machining, wherein the grating grooves are formed so that a surface comprising a (110) plane is arranged to receive the most incident light among the surfaces that constitute each grating, where (110) describes a crystal orientation of the crystalline material.

Abstract: The present invention provides an exposure apparatus including a map obtaining unit configured to obtain a pupil aberration map representing saturation values of fluctuations in each of optical characteristics generated in a plurality of regions, which are obtained by dividing a pupil plane of a projection optical system, upon irradiating the plurality of regions with a unit amount of light, a distribution obtaining unit configured to obtain a light intensity distribution formed on the pupil plane of the projection optical system upon illuminating a pattern of an arbitrary reticle in an arbitrary illumination mode, and a calculation unit configured to calculate a saturation value of a fluctuation in each of the optical characteristics generated in the projection optical system upon illuminating the pattern of the arbitrary reticle in the arbitrary illumination mode, based on the obtained pupil aberration map and the obtained light intensity distribution.

Abstract: A method for manufacturing a diffraction grating having a plurality of grating grooves that extends in parallel in a direction includes a first cutting processing step of moving, in the direction, a work and a cutting tool having a first blade and a second blade relatively to each other, and of forming a first surface of the grating groove in the work through cutting processing using the first blade of the cutting tool, and a second cutting step of moving, in the direction, the work and the cutting tool relatively to each other after the first cutting processing step, so that the first blade does not contact the first surface formed by the first cutting processing step, and of forming a second surface of the grating groove in the work through cutting processing using the second blade of the cutting tool.

Abstract: A method of manufacturing a blazed diffractive grating includes a first step of forming a first groove having a first surface and a second surface by moving, in the first direction at a first position in the second direction, a cutting tool having a first cutting blade and a second cutting blade to cut the object; a second step of forming a second groove by moving, in the first direction at a second position separated from the first position in the second direction by a grating pitch, the cutting tool to cut the object; and a third step of forming a blazed surface of the first groove using the first cutting blade by moving, in the first direction at a third position between the first position and the second position, the cutting tool to cut the first surface of the first groove.

Abstract: A manufacturing method of a Blazed diffraction grating configured to diffract incident light and made of a CdTe or CdZnTe crystal material includes the step of forming a plurality of grating grooves in a processed surface of a work through machining using a processing machine for the Blazed diffraction grating. The forming step forms the grating grooves so that among surfaces of gratings formed by the forming step, a surface that receives the incident light most is set to a (110) plane as a crystal orientation of the crystal material.

Abstract: A method for predicting imaging characteristics fluctuation of a projection optical system in an exposure apparatus which projects a pattern formed on a mask onto a photosensitive substrate through the projection optical system is provided. In a measurement step, the projection optical system is irradiated with exposure light under a first exposure condition to measure first imaging characteristics fluctuation of the projection optical system. Then, before an imaging characteristics value is restored to an initial value at the start of irradiation after irradiation is stopped, the projection optical system is irradiated with the exposure light under a second exposure condition to measure second imaging characteristics fluctuation of the projection optical system. Approximate expressions of the measured first and second imaging characteristics fluctuations are calculated based on an imaging characteristics model.

Abstract: A scanning exposure apparatus according to this invention has a light source which can change the central wavelength of exposure light to undergo pulsed oscillation, and scan-exposes a substrate with slit-like exposure light while periodically changing the central wavelength in synchronism with the pulsed oscillation of the exposure light. The scanning exposure apparatus includes a controller which controls the light source so that integrated values Sws and Swl obtained by integrating the intensity of the exposure light for each wavelength in the scanning direction in a short-wavelength range and long-wavelength range, respectively, assuming a target central wavelength as a reference satisfy: |(Sws?Swl)/(Sws +Swl)|?0.1.

Abstract: The present invention provides an exposure apparatus including a map obtaining unit configured to obtain a pupil aberration map representing saturation values of fluctuations in each of optical characteristics generated in a plurality of regions, which are obtained by dividing a pupil plane of a projection optical system, upon irradiating the plurality of regions with a unit amount of light, a distribution obtaining unit configured to obtain a light intensity distribution formed on the pupil plane of the projection optical system upon illuminating a pattern of an arbitrary reticle in an arbitrary illumination mode, and a calculation unit configured to calculate a saturation value of a fluctuation in each of the optical characteristics generated in the projection optical system upon illuminating the pattern of the arbitrary reticle in the arbitrary illumination mode, based on the obtained pupil aberration map and the obtained light intensity distribution.