Patents by Inventor Takashi Tagami

Takashi Tagami has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7372124
    Abstract: A light-receiving element may easily detect the barycenter of a light intensity of light having a long-wavelength band in an optical communication. An InGaAs layer (i-type layer) and a p-type InP layer are stacked on an n-type InP substrate. Electrodes are formed on both sides of the top surface of the p-type layer, and an electrode is formed on the bottom surface of the n-type substrate. An incident light impinged upon the light-receiving element is photoelectricly-converged into a photocurrent, and the photocurrent flows in the p-type layer to the electrodes. As a result, a current is derived from each of the electrodes, the magnitude thereof being dependent on the distances from the light impinging position to respective electrodes. The barycenter of a light intensity may be calculated from the currents derived from the electrodes and a light intensity may be obtained from the summation of the currents.
    Type: Grant
    Filed: October 6, 2004
    Date of Patent: May 13, 2008
    Assignee: Nippon Sheet Glass Company, Limited
    Inventors: Takashi Tagami, Kenichi Nakama
  • Patent number: 7062178
    Abstract: A light demultiplexer in which a signal and a noise in each channel may be distinctly separated is provided. The light demultiplexer comprises a light-receiving element array for receiving light beams demultiplexed every wavelength from a wavelength multiplexed light beam and arranged in a straight line. The light-receiving element array includes a plurality of light-receiving elements for monitoring signals, and a plurality of light-receiving elements for monitoring noises. The light-receiving elements for monitoring signals and the light-receiving elements for monitoring noise are alternately arrayed in a straight line the direction thereof is the same as that of the arrangement of the demultiplexed light beams.
    Type: Grant
    Filed: October 5, 2000
    Date of Patent: June 13, 2006
    Assignee: Nippon Sheet Glass Company, Limited
    Inventors: Takashi Tagami, Kenichi Nakama, Nobuyuki Komaba, Yasunori Arima, Yukihisa Kusuda
  • Patent number: 6919583
    Abstract: An edge-emitting thyristor having an improved external luminous efficiency and a self-scanning light-emitting device array comprising the edge-emitting thyristor are disclosed. To improve the external luminous efficiency of an edge-emitting light-emitting thyristor, a structure where the current injected from an electrode concentrates on and near the edge of the light-emitting thyristor is adopted.
    Type: Grant
    Filed: February 11, 2004
    Date of Patent: July 19, 2005
    Assignee: Nippon Sheet Glass Company, Limited
    Inventors: Takashi Tagami, Yukihisa Kusuda, Seiji Ohno, Nobuyuki Komaba
  • Publication number: 20050058454
    Abstract: A light-receiving element may easily detect the barycenter of a light intensity of light having a long-wavelength band in an optical communication. An InGaAs layer (i-type layer) and a p-type InP layer are stacked on an n-type InP substrate. Electrodes are formed on both sides of the top surface of the p-type layer, and an electrode is formed on the bottom surface of the n-type substrate. An incident light impinged upon the light-receiving element is photoelectricly-converged into a photocurrent, and the photocurrent flows in the p-type layer to the electrodes. As a result, a current is derived from each of the electrodes, the magnitude thereof being dependent on the distances from the light impinging position to respective electrodes. The barycenter of a light intensity may be calculated from the currents derived from the electrodes and a light intensity may be obtained from the summation of the currents.
    Type: Application
    Filed: October 6, 2004
    Publication date: March 17, 2005
    Inventors: Takashi Tagami, Kenichi Nakama
  • Patent number: 6828541
    Abstract: A light-receiving element array is provided in which the degradation of characteristic thereof due to the crosstalk may be prevented. An n-InP layer, an i-InGaAs layer, and an n-InP layer are stacked on an n-InP substrate. Zn is diffused into the topmost n-InP layer to form a p-type diffused region, resulting in a pin-photodiode. A passivation layer is deposited on the structure to a thickness such that a nonreflective condition is satisfied. On the passivation film, a light-shielding film is provided so as to cover the area between light-receiving elements.
    Type: Grant
    Filed: September 23, 2002
    Date of Patent: December 7, 2004
    Assignee: Nippon Sheet Glass Co., Ltd.
    Inventors: Nobuyuki Komaba, Takashi Tagami, Yasunori Arima, Yukihisa Kusuda
  • Publication number: 20040159844
    Abstract: An edge-emitting thyristor having an improved external luminous efficiency and a self-scanning light-emitting device array comprising the edge-emitting thyristor are disclosed. To improve the external luminous efficiency of an edge-emitting light-emitting thyristor, a structure where the current injected from an electrode concentrates on and near the edge of the light-emitting thyristor is adopted.
    Type: Application
    Filed: February 11, 2004
    Publication date: August 19, 2004
    Inventors: Takashi Tagami, Yukihisa Kusuda, Seiji Ohno, Nobuyuki Komaba
  • Patent number: 6717182
    Abstract: A self-scanning light-emitting element array using an end face light-emitting thyristor having improved external emission efficiency is provided. To improve the external emission efficiency of the end face light-emitting thyristor, the present invention adopts such structure that the current injected from an anode is concentrated to near the end face of the light-emitting thyristor. A self-scanning light-emitting element array is implemented by using such end face light-emitting thyristor.
    Type: Grant
    Filed: February 8, 2001
    Date of Patent: April 6, 2004
    Assignee: Nippon Sheet Glass Co., Ltd.
    Inventors: Takashi Tagami, Yukihisa Kusuda, Seiji Ohno, Nobuyuki Komaba
  • Patent number: 6710330
    Abstract: In the light-receiving element array device according to the present invention, a light-receiving section can be arranged at a position close to an input optical fiber so that the light-receiving element array device can be used as an optical demultiplexer based on the Littrow arrangement. Further the present invention enables suppression of coma aberration and minimization of an optical demultiplexer by shortening a length of the optical system. To achieve the above-described object, a rectangular chip having a light-receiving section with a number of light-receiving elements arrayed in row thereon is sealed in a rectangular package having external leads and the bonding pads on the chip and the bonding terminals of the packages are connected with a bonding wire or the like.
    Type: Grant
    Filed: January 25, 2001
    Date of Patent: March 23, 2004
    Assignee: Nippon Sheet Glass Co., Ltd.
    Inventors: Takashi Tagami, Kenichi Nakama
  • Patent number: 6690002
    Abstract: When a diffraction grating having a grating period of d and a diffraction order of m for an incident light having a wavelength interval &Dgr;&lgr;i between i'th and (i+1)'th channels is used, an optical path length between the diffraction grating and the photodetector is represented by L and a mean output angle is represented by &thgr;o, a pitch pi between the i'th and (i+1)'th photodetectors in the photodetector array satisfies the equation of pi=m&Dgr;&lgr;iL/d cos &thgr;o.
    Type: Grant
    Filed: July 27, 2001
    Date of Patent: February 10, 2004
    Assignee: Nippon Sheet Glass, Co., Ltd.
    Inventors: Yasunao Kuroda, Takashi Tagami, Kenichi Nakama
  • Publication number: 20030106987
    Abstract: A light-receiving element array is provided in which the degradation of characteristic thereof due to the crosstalk may be prevented. An n-InP layer, an i-InGaAs layer, and an n-InP layer are stacked on an n-InP substrate. Zn is diffused into the topmost n-InP layer to form a p-type diffused region, resulting in a pin-photodiode. A passivation layer is deposited on the structure to a thickness such that a nonreflective condition is satisfied. On the passivation film, a light-shielding film is provided so as to cover the area between light-receiving elements.
    Type: Application
    Filed: September 23, 2002
    Publication date: June 12, 2003
    Inventors: Nobuyuki Komaba, Takashi Tagami, Yasunori Arima, Yukihisa Kusuda
  • Publication number: 20020149014
    Abstract: A light-receiving element is provided, which may easily detect the barycenter of a light intensity of light having a long-wavelength band in an optical communication. An InGaAs layer (i-type layer) and a p-type InP layer are stacked on an n-type InP substrate. Electrodes are formed on both sides of the top surface of the p-type layer, and an electrode is formed on the bottom surface of the n-type substrate. An incident light impinged upon the light-receiving element is photoelectric-converged into a photocurrent, and the photocurrent flows in the p-type layer to the electrodes. As a result, a current is derived from each of the electrodes, the magnitude thereof being dependent on the distances from the light impinging position to respective electrodes. The barycenter of a light intensity may be calculated from the currents derived from the electrodes and a light intensity may be obtained from the summation of the currents.
    Type: Application
    Filed: March 14, 2002
    Publication date: October 17, 2002
    Inventors: Takashi Tagami, Kenichi Nakama
  • Patent number: 6432328
    Abstract: In a method for forming a planar microlens according to the present invention, a wet etching is conducted to a glass substrate for a stamper while it is covered with a mask. After the etching is conducted and the mask is removed a wet etching is conducted again to the glass substrate to form densely arranged concave portions thereon, and thereby a stamper is obtained. An uncured resin is applied on the forming surface of the stamper, a glass substrate for a planar microlens array (MLA) is pressed thereto, and thereby the uncured resin is formed. The uncured resin is cured by applying an ultraviolet irradiation thereto and the stamper is released therefrom. The resin layer is removed by a reactive ion etching and whereupon the substrate is etched in a form corresponding to the form of the resin layer and whereby an all-glass microlens of high precision is obtained.
    Type: Grant
    Filed: January 10, 2001
    Date of Patent: August 13, 2002
    Assignee: Nippon Sheet Glass Co., Ltd.
    Inventors: Kenjiro Hamanaka, Kiyotaka Sasaki, Takashi Tagami
  • Publication number: 20020050557
    Abstract: When a diffraction grating having a grating period of d and a diffraction order of m for an incident light having a wavelength interval &Dgr;&lgr;i between i'th and (i+1)'th channels is used, an optical path length between the diffraction grating and the photodetector is represented by L and a mean output angle is represented by &thgr;o, a pitch pi between the i'th and (i+1)'th photodetectors in the photodetector array satisfies the equation of pi=m&Dgr;iL /d cos &thgr;o.
    Type: Application
    Filed: July 27, 2001
    Publication date: May 2, 2002
    Inventors: Yasunao Kuroda, Takashi Tagami, Kenichi Nakama
  • Publication number: 20010010597
    Abstract: In a method for forming a planar microlens according to the present invention, a wet etching is conducted to a glass substrate for a stamper while it is covered with a mask. After the etching is conducted and the mask is removed a wet etching is conducted again to the glass substrate to form densely arranged concave portions thereon, and thereby a stamper is obtained. An uncured resin is applied on the forming surface of the stamper, a glass substrate for a planar microlens array (MLA) is pressed thereto, and thereby the uncured resin is formed. The uncured resin is cured by applying an ultraviolet irradiation thereto and the stamper is released therefrom. The resin layer is removed by a reactive ion etching and whereupon the substrate is etched in a form corresponding to the form of the resin layer, and whereby an all-glass microlens of high precision is obtained.
    Type: Application
    Filed: January 10, 2001
    Publication date: August 2, 2001
    Inventors: Kenjiro Hamanaka, Kiyotaka Sasaki, Takashi Tagami
  • Patent number: 4986841
    Abstract: The present invention concerns a method of preparing an alkali metal diffusion-preventive layer by applying one of three specific methods in a method of forming an alkali metal diffusion-preventive layer containing phosphorus at the inside of the substrate containing silicon by ion implantation of phosphorus, thereby enabling to prepare an alkali metal diffusion-preventive layer having higher alkali metal diffusion-preventive performance than that of the alkali metal diffusion-preventive layer prepared by the conventional method.
    Type: Grant
    Filed: April 18, 1990
    Date of Patent: January 22, 1991
    Assignee: Nippon Sheet Glass Co., Ltd.
    Inventors: Keiji Oyoshi, Takashi Tagami, Shuhei Tanaka