Patents by Inventor Takashi Takemi

Takashi Takemi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Film deposition apparatus and film deposition method
    Patent number: 9951415
    Abstract: A film deposition apparatus comprises: a vacuum chamber; a cylindrical target, a circumferential surface of the target being opposite to a substrate, and the target being disposed in the vacuum chamber so as to intersect a conveyance direction of the substrate; a driving unit configured to rotatively drive the target; a magnetic field creator disposed inside the target; a reactive gas flow unit configured to flow a reactive gas, the reactive gas flow unit being disposed in the vicinity of the target; an optical emission monitor configured to monitor an optical emission intensity of plasma at a location between the substrate and the target and in the vicinity of the target; and a controlling unit configured to control a rotation speed of the target driven by the driving unit, such that the optical emission intensity monitored by the optical emission monitor approaches a preset target optical emission intensity.
    Type: Grant
    Filed: April 19, 2016
    Date of Patent: April 24, 2018
    Assignees: Canon Tokki Corporation, Canon Kabushiki Kaisha
    Inventors: Yasuo Murakami, Kazuhiro Hoshino, Toru Sato, Takashi Takemi, Satoshi Nakamura, Tomohiro Kumaki
  • FILM DEPOSITION APPARATUS AND FILM DEPOSITION METHOD
    Publication number: 20160312353
    Abstract: A film deposition apparatus comprises: a vacuum chamber; a cylindrical target, a circumferential surface of the target being opposite to a substrate, and the target being disposed in the vacuum chamber so as to intersect a conveyance direction of the substrate; a driving unit configured to rotatively drive the target; a magnetic field creator disposed inside the target; a reactive gas flow unit configured to flow a reactive gas, the reactive gas flow unit being disposed in the vicinity of the target; an optical emission monitor configured to monitor an optical emission intensity of plasma at a location between the substrate and the target and in the vicinity of the target; and a controlling unit configured to control a rotation speed of the target driven by the driving unit, such that the optical emission intensity monitored by the optical emission monitor approaches a preset target optical emission intensity.
    Type: Application
    Filed: April 19, 2016
    Publication date: October 27, 2016
    Inventors: Yasuo Murakami, Kazuhiro Hoshino, Toru Sato, Takashi Takemi, Satoshi Nakamura, Tomohiro Kumaki