Patents by Inventor Takashi Tokuue

Takashi Tokuue has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20090114117
    Abstract: A leveling agent for water-based floor polishes which contains a nonionic surfactant, characterized in that the nonionic surfactant is at least one member selected from the group consisting of compounds represented by the general formula (1): R1—C(R2)H—CH2O—(C2H4O)m(C3H6O)n—H [wherein R1 represents C4-10 alkyl; R2 represents C6-12 alkyl; m is an integer of 1 to 10; n is an integer of 0 to 6; and the ethylene oxide unit(s) and the propylene oxide unit(s) are bonded in any desired sequence, i.e., in either block or random arrangement] and compounds represented by the general formula (II): R3O—(C2H4O)p(C3H6O)q—H [wherein R3 represents at least one residue of one or more aliphatic alcohols selected among 3,5,5-trimethylhexanol, isooctyl alcohol, isodecyl alcohol, isoundecyl alcohol, and isotridecyl alcohol; p is an integer of 0 to 8 and q is an integer of 0 to 8, provided that p+q is an integer of 2 to 8; and the ethylene oxide unit(s) and the propylene oxide unit(s) are bonded in any desired sequence, i.e.
    Type: Application
    Filed: August 25, 2004
    Publication date: May 7, 2009
    Applicant: Toho Chemical Industry Co., Ltd.
    Inventors: Takashi Tokuue, Tetsuya Sayama, Yasunori Terunuma, Mikio Akimoto, Haruyoshi Miyauchi
  • Patent number: 6117220
    Abstract: A polishing composition for a memory hard disc, which comprises the following components (a) to (d):(a) water,(b) at least one compound selected from the group consisting of a polystyrenesulfonic acid, and its salts,(c) a compound selected from the group consisting of an inorganic acid and an organic acid, and their salts, other than component (b), and(d) at least one abrasive selected from the group consisting of aluminum oxide, silicon dioxide, cerium oxide, zirconium oxide, titanium oxide, silicon nitride and manganese dioxide.
    Type: Grant
    Filed: November 16, 1999
    Date of Patent: September 12, 2000
    Assignees: Fujimi Incorporated, Toho Chemical Industry Co., Ltd.
    Inventors: Hitoshi Kodama, Toshiki Owaki, Katsumi Tani, Noritaka Yokomichi, Takashi Tokuue, Norio Fujioka, Tetsuya Sayama
  • Patent number: 3996076
    Abstract: A process for quench hardening metal is provided. The process comprises heating the metal to a quench hardening temperature and thereafter immersing the metal in a quenching medium which is an aqueous solution containing 0.4 to 10% by weight of polyacrylic acid, polymethacrylic acid, a copolymer of acrylic acid and methacrylic acid, or a salt thereof. The process provides a perfect and uniformly hardened quenched structure and allows the production of a quenched structure having a desired degree of hardness.
    Type: Grant
    Filed: June 4, 1975
    Date of Patent: December 7, 1976
    Assignee: Toho Chemical Industry Co., Ltd.
    Inventors: Takashi Tokuue, Takashi Kato
  • Patent number: 3939016
    Abstract: A novel quenching medium for steel is provided. The quenching medium is a 0.5-10 wt. % aqueous solution of polyacrylic acid, polymethacrylic acid, a copolymer of acrylic acid and methacrylic acid, or a salt thereof. Intrinsic viscosity [.eta.] of the polymer is from 0.010 to 0.050 l/g. The quenching medium is superior in various quenching characteristics to conventional quenching media.
    Type: Grant
    Filed: October 2, 1973
    Date of Patent: February 17, 1976
    Assignee: Toho Chemical Industry Co., Ltd.
    Inventors: Takashi Tokuue, Takashi Kato