Patents by Inventor Takashi Usui

Takashi Usui has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230280235
    Abstract: According to one embodiment, a structure evaluation system includes a plurality of sensors, an acquirer, a calculator, and an evaluator. The plurality of sensors detects elastic waves generated from the structure. The acquirer acquires detection information for an evaluation target period in which information on at least an amplitude of each elastic wave detected by each of the plurality of sensors is associated with time information on the time when each elastic wave is detected. The calculator calculates an evaluation value, which is a slope of an amplitude scale-based frequency distribution of elastic waves, every predetermined period based on the acquired detection information for the evaluation target period. The evaluator evaluates a deterioration state of the structure based on the time-series data of each evaluation value calculated every predetermined period.
    Type: Application
    Filed: September 6, 2022
    Publication date: September 7, 2023
    Applicants: Kabushiki Kaisha Toshiba, Kyoto University
    Inventors: Takashi USUI, Kazuo WATABE, Tomoki SHIOTANI
  • Publication number: 20230265329
    Abstract: An object of the present disclosure is to provide a composition having excellent stability of a refrigerant. Provided is a composition comprising a refrigerant and carbon, the refrigerant comprising at least one member selected from the group consisting of HFO-1234yf, HFO-1132(E/Z), HFO-1132a, HFO-1123, and FO-1114.
    Type: Application
    Filed: April 7, 2023
    Publication date: August 24, 2023
    Applicant: DAIKIN INDUSTRIES, LTD.
    Inventors: Tomoyuki GOTOU, Takashi YOSHIMURA, Takashi USUI, Yuuko ITO, Yuka WATANABE
  • Patent number: 11718084
    Abstract: An object adhesion/peeling method according to an embodiment includes adhering a adhesion target object to a second surface side of an adhesive sheet, wherein the adhesive sheet includes adhesive surfaces on a first surface side and the second surface side, and a first electrode and a second electrode provided to be adjacent to the first electrode are provided on the first surface side; adhering the first surface side of the adhesive sheet to a fixation target surface; inputting a predetermined voltage to the first electrode and the second electrode to generate a potential difference based on the predetermined voltage in a direction orthogonal to a layer thickness direction of the adhesive sheet; and causing an electrochemical reaction on the first surface side of the adhesive sheet to peel off the adhesive sheet from the fixation target surface.
    Type: Grant
    Filed: August 30, 2022
    Date of Patent: August 8, 2023
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Takashi Usui, Kazuo Watabe, Tetsuya Kugimiya
  • Publication number: 20230242801
    Abstract: An object of the present disclosure is to provide a composition in which a disproportionation reaction of a refrigerant is suppressed, and in which the refrigerant has excellent stability. Another object of the present disclosure is to provide a composition comprising a refrigerant useful for air-conditioning systems. The composition comprises a refrigerant, wherein the refrigerant comprises a refrigerant that undergoes disproportionation and a refrigerant that does not undergo disproportionation.
    Type: Application
    Filed: April 7, 2023
    Publication date: August 3, 2023
    Applicant: DAIKIN INDUSTRIES, LTD.
    Inventors: Tomoyuki GOTOU, Takashi YOSHIMURA, Takashi USUI, Yuuko ITO, Yuka WATANABE, Youhei TAKAKURA, Takuma IWASAKA
  • Publication number: 20230242800
    Abstract: An object of the present disclosure is to provide a composition in which disproportionation of a refrigerant is suppressed, a heat cycle system using the composition, and a method for suppressing a disproportionation reaction of a refrigerant. A composition comprising a refrigerant and a refrigeration oil, the refrigerant comprising at least one refrigerant selected from the group consisting of HFO-1141, HFO-1132(E/Z), HFO-1132a, HFO-1123, and FO-1114, the refrigeration oil having a contact angle with a substrate of 0.1°???90°, the substrate comprising at least one member selected from the group consisting of engineering plastics, organic films, inorganic films, glass, and metals.
    Type: Application
    Filed: April 6, 2023
    Publication date: August 3, 2023
    Applicant: DAIKIN INDUSTRIES, LTD.
    Inventors: Takashi USUI, Tomoyuki GOTOU, Yuuki YOTSUMOTO, Takashi YOSHIMURA, Yuuko ITO, Yuka WATANABE
  • Patent number: 11696094
    Abstract: Techniques for controlling updating of information stored on a device, the information including information of a first type and information of a second type. The techniques include determining, using at least one processor, when a first item of information of the first type and a second item of information of the second type are to be updated, wherein the second item of information is to be updated more frequently than the first item of information; and causing the device to update the first and second items of information in accordance with the determination at least in part by wirelessly communicating with at least one other device.
    Type: Grant
    Filed: August 9, 2021
    Date of Patent: July 4, 2023
    Assignee: SONY GROUP CORPORATION
    Inventors: Shinichiro Tsuda, Takashi Usui, Naoki Ide
  • Patent number: 11691935
    Abstract: The production method according to the present disclosure comprises obtaining a product containing the fluoroethane from a fluoroethylene by a reaction in the presence of catalysts. Each catalyst is formed by supporting a noble metal on a carrier. A reactor for performing the reaction is filled with a catalyst having a noble metal concentration of C1 mass % based on the entire catalyst and a catalyst having a noble metal concentration of C2 mass % based on the entire catalyst to form an upstream portion and a downstream portion, respectively; and C1<C2. The reaction is performed by bringing the fluoroethylene represented by formula (3) and hydrogen gas into contact with the upstream portion and the downstream portion in this order.
    Type: Grant
    Filed: June 17, 2021
    Date of Patent: July 4, 2023
    Assignee: DAIKIN INDUSTRIES, LTD.
    Inventors: Tomoyuki Iwamoto, Takashi Usui, Takehiro Chaki, Tsubasa Nakaue, Kazuhiro Takahashi
  • Publication number: 20230203357
    Abstract: A pressure increase in a compressor is suppressed. Disclosed is a method that uses a composition as a refrigerant in a refrigerant circuit, in which the composition includes one or more compounds selected from the group consisting of ethylene-based fluoroolefins, 2,3,3,3-tetrafluoropropene, and 1,3,3,3-tetrafluoropropene, and in the refrigerant circuit, the total internal volume of a refrigerant pipe and a component that are connected to a compressor is greater than or equal to 0.7 times the internal volume of the compressor.
    Type: Application
    Filed: March 3, 2023
    Publication date: June 29, 2023
    Applicant: DAIKIN INDUSTRIES, LTD.
    Inventors: Yuka WATANABE, Tomoyuki GOTOU, Yuuko ITOU, Takashi USUI, Takashi YOSHIMURA
  • Publication number: 20230202951
    Abstract: The present disclosure provides a method for purifying HFO-1132 to a high purity while suppressing the isomerization and loss of HFO-1132. Specifically, the present disclosure provides a method for purifying 1,2-difluoroethylene, which is HFO-1132, the method comprising, in this order, step 1 of bringing a composition comprising trans-1,2-difluoroethylene, which is HFO-1132(E), and water into contact with a zeolite having an average pore size of 2 to 4 Å to reduce the water content from the composition; and step 2 of recovering a purified product containing HFO-1132(E) and a reduced content of water, and containing less than 0.1% by volume of HFO-1132 (Z).
    Type: Application
    Filed: February 28, 2023
    Publication date: June 29, 2023
    Applicant: DAIKIN INDUSTRIES, LTD.
    Inventors: Takashi USUI, Kazuhiro TAKAHASHI, Tomoyuki IWAMOTO
  • Publication number: 20230203356
    Abstract: The propagation of a disproportionation reaction of a refrigerant is suppressed. Disclosed is a method that uses a composition as a refrigerant in a refrigerant circuit, in which the composition includes one or more compounds selected from the group consisting of ethylene-based fluoroolefins, 2,3,3,3-tetrafluoropropene, and 1,3,3,3-tetrafluoropropene, and the refrigerant circuit includes a compressor, a four-way switching valve, and a first refrigerant pipe connecting the compressor and the four-way switching valve, the first refrigerant pipe having a pipe diameter less than or equal to ? inch or a length greater than or equal to 5 cm.
    Type: Application
    Filed: March 1, 2023
    Publication date: June 29, 2023
    Applicant: DAIKIN INDUSTRIES, LTD.
    Inventors: Yuka WATANABE, Tomoyuki GOTOU, Yuuko ITOU, Takashi USUI, Takashi YOSHIMURA
  • Patent number: 11687117
    Abstract: A semiconductor apparatus include a first electrode, an insulating layer covering an end of the first electrode, a functional layer arranged on the first electrode and the insulating layer, and a second electrode arranged above the functional layer, wherein, in a cross-section passing through the insulating layer, and the first electrode, the insulating layer includes a first portion having a side surface inclining at an angle of 45° or more and 90° or less, a second portion having a side surface inclining at an angle smaller than 45°, and a third portion below the first portion, and having a side surface inclining at an angle smaller than 45°, and wherein a length of the second portion in a direction vertical to the first electrode is larger than that of the third portion.
    Type: Grant
    Filed: August 17, 2020
    Date of Patent: June 27, 2023
    Assignee: Canon Kabushiki Kaisha
    Inventors: Daisuke Okabayashi, Tetsuo Takahashi, Takashi Usui
  • Publication number: 20230194382
    Abstract: According to one embodiment, a structure evaluation system includes an impact imparting unit, a plurality of sensors, a position locator, and an evaluator. The impact imparting unit applies impacts to a second region different from a first region of a structure to which traveling sections of a vehicle, which travels on the structure, apply impacts. The plurality of sensors detect elastic waves generated in the structure. The position locator locates a position of a source of the elastic waves on the basis of the elastic waves detected by each of the plurality of sensors. The evaluator evaluates a deterioration state of the structure on the basis of a position location result of the position locator.
    Type: Application
    Filed: September 2, 2022
    Publication date: June 22, 2023
    Applicant: KABUSHIKI KAISHA TOSHIBA
    Inventors: Yousuke HISAKUNI, Hidefumi TAKAMINE, Yuki UEDA, Keisuke UENO, Takashi USUI, Kazuo WATABE
  • Patent number: 11668681
    Abstract: According to one embodiment, a detection system is provided that detects a state of a structure consisting of a first member that supports a traveling surface along which a vehicle travels from downward; a second member provided on an opposite side of the traveling surface with respect to the first member; and a welded portion that is provided along an end of the second member facing the first member and fixes the first member and the second member. The detection system includes: a first sensor group including first AE sensors; a second sensor group including second AE sensors; and a position orientator that performs separately a first determination that determines a generation source position of elastic waves based on the detection results of the first AE sensors and a second determination that determines the generation source position of elastic waves based on the detection results of the second AE sensors.
    Type: Grant
    Filed: February 16, 2021
    Date of Patent: June 6, 2023
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Takashi Usui, Kazuo Watabe, Takahiro Omori, Hidefumi Takamine, Akihiro Kasahara
  • Publication number: 20230167345
    Abstract: The propagation of a disproportionation reaction of a refrigerant is suppressed. Disclosed is a method that uses a composition in a device, in which the composition includes one or more compounds selected from the group of ethylene-based fluoroolefins, 2,3,3,3-tetrafluoropropene, and 1,3,3,3-tetrafluoropropene, and the heat capacity of a portion with a melting point greater than or equal to 1,000° C. in the device is greater than or equal to 6.5 J/K.
    Type: Application
    Filed: January 30, 2023
    Publication date: June 1, 2023
    Applicant: DAIKIN INDUSTRIES, LTD.
    Inventors: Yuuki YOTSUMOTO, Takashi USUI
  • Publication number: 20230167346
    Abstract: The propagation of a disproportionation reaction of a refrigerant is suppressed. Disclosed is a method that uses a composition as a refrigerant in a compressor, in which the composition includes one or more compounds selected from the group of ethylene-based fluoroolefins, 2,3,3,3-tetrafluoropropene, and 1,3,3,3-tetrafluoropropene, the compressor forms a refrigerant circuit together with first to ninth refrigerant pipes, a gas-side refrigerant communication pipe, and a liquid-side refrigerant communication pipe, and the compressor includes first to fifth heat absorbing portions in each of which a heat capacity of a portion with a melting point greater than or equal to 1,000° C. is greater than or equal to 6.5 J/K.
    Type: Application
    Filed: January 30, 2023
    Publication date: June 1, 2023
    Applicant: DAIKIN INDUSTRIES, LTD.
    Inventors: Yuuki YOTSUMOTO, Takashi USUI
  • Publication number: 20230159810
    Abstract: The propagation of a disproportionation reaction of a refrigerant is suppressed. Disclosed is a method of using a composition as a refrigerant in a compressor, in which the composition includes one or more compounds selected from the group of ethylene-based fluoroolefins, 2,3,3,3-tetrafluoropropene, and 1,3,3,3-tetrafluoropropene, and the dimension of a gap of a predetermined portion through which the refrigerant flows around an ignition energy generation portion in the compressor is less than or equal to 2 mm.
    Type: Application
    Filed: January 11, 2023
    Publication date: May 25, 2023
    Applicant: DAIKIN INDUSTRIES, LTD.
    Inventors: Takashi USUI, Tomoyuki GOTOU, Takashi YOSHIMURA, Yuuko ITOU, Yuka WATANABE, Takuma IWASAKA, Youhei TAKAKURA, Yuuki YOTSUMOTO
  • Publication number: 20230151927
    Abstract: A high-pressure tank includes a reinforcing layer and a liner having a gas-barrier property and disposed on an inner surface of the reinforcing layer. The reinforcing layer includes a cylindrical reinforcing pipe having a plurality of cylindrical pipe forming portions coupled together, and a pair of semispherical reinforcing domes, one of the pair of semispherical reinforcing domes being disposed at a first end of the reinforcing pipe, and the other one of the pair of semispherical reinforcing domes being disposed at a second end of the reinforcing pipe.
    Type: Application
    Filed: January 6, 2023
    Publication date: May 18, 2023
    Applicant: TOYOTA JIDOSHA KABUSHIKI KAISHA
    Inventors: Koji KATANO, Takashi USUI
  • Publication number: 20230146651
    Abstract: The propagation of a disproportionation reaction of a refrigerant is suppressed. Disclosed is a method that uses a composition as a refrigerant in a compressor, in which the composition includes one or more compounds selected from the group of ethylene-based fluoroolefins, 2,3,3,3-tetrafluoropropene, and 1,3,3,3-tetrafluoropropene, and the flow rate of the refrigerant flowing through a region around an ignition energy generation portion in the compressor under a predetermined high-pressure condition is greater than or equal to 1 m/s.
    Type: Application
    Filed: December 30, 2022
    Publication date: May 11, 2023
    Applicant: DAIKIN INDUSTRIES, LTD.
    Inventors: Tomoyuki GOTOU, Takashi YOSHIMURA, Takashi USUI, Yuuko ITOU, Yuka WATANABE, Takuma IWASAKA, Youhei TAKAKURA, Yuuki YOTSUMOTO, Satoshi TOKUNO, Ryohei DEGUCHI
  • Publication number: 20230139313
    Abstract: The propagation of a disproportionation reaction of a refrigerant is suppressed. Disclosed is a method that uses a composition as a refrigerant in a compressor, in which the composition includes one or more compounds selected from the group of ethylene-based fluoroolefins, 2,3,3,3-tetrafluoropropene, and 1,3,3,3-tetrafluoropropene, and the flow rate of the refrigerant flowing through a discharge pipe of the compressor under a predetermined high-pressure condition is greater than or equal to 1 m/s.
    Type: Application
    Filed: December 29, 2022
    Publication date: May 4, 2023
    Applicant: DAIKIN INDUSTRIES, LTD.
    Inventors: Tomoyuki GOTOU, Takashi YOSHIMURA, Takashi USUI, Yuuko ITOU, Yuka WATANABE, Takuma IWASAKA, Youhei TAKAKURA, Yuuki YOTSUMOTO, Satoshi TOKUNO, Ryohei DEGUCHI
  • Publication number: 20230110292
    Abstract: A novel low-GWP mixed refrigerant is provided. A composition comprising a refrigerant, the refrigerant comprising trans-1,2-difluoroethylene (HFO-1132(E)), difluoromethane (R32), and 2,3,3,3-tetrafluoropropene (HFO-1234yf), is provided, wherein when the mass % of HFO-1132(E), R32, and R1234yf based on their sum is respectively represented by x, y, and z, coordinates (x,y,z) in a ternary composition diagram in which the sum of HFO-1132(E), R32, and R1234yf is 100 mass % are within the range of a figure surrounded by straight lines C1D, DG, GH, HB?, and B?C1 that connect the following 5 points: point C1 (52.0, 36.9, 11.1), point D (44.0, 0.0, 56.0), point G (12.2, 0.0, 87.8), point H (0.0, 8.2, 91.8), and point B? (0.0, 36.6, 63.4), or on the straight lines C1D and B?C1 (excluding points D and B?).
    Type: Application
    Filed: December 12, 2022
    Publication date: April 13, 2023
    Applicant: DAIKIN INDUSTRIES, LTD.
    Inventors: Mitsushi ITANO, Tomoyuki GOTOU, Takashi YOSHIMURA, Takashi USUI, Tatsumi TSUCHIYA, Tsubasa NAKAUE