Patents by Inventor Takashi YAKUSHIJI

Takashi YAKUSHIJI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240043874
    Abstract: Provided is an electric perforating device 10 including a flow passage 20 through which liquid flows, a first electrode 30A that forms a first electric field region 60A in the flow passage 20 by being supplied with a pulse voltage, a second electrode 30B that forms a second electric field region 60B on a downstream side of the first electric field region 60A, which is in the flow passage 20, in a flowing direction of the liquid, by being supplied with a pulse voltage, a cooling portion 40 that forms a cooling region 70, which cools the liquid flowing through the flow passage 20, between the first electric field region 60A and the second electric field region 60B in the flow passage 20, and a voltage output portion 50 that outputs a pulse voltage for forming the first electric field region 60A and the second electric field region 60B.
    Type: Application
    Filed: October 18, 2023
    Publication date: February 8, 2024
    Applicant: FUJIFILM Corporation
    Inventors: Yuka KOBAYASHI, Takashi YAKUSHIJI
  • Publication number: 20180120706
    Abstract: Provided are a pattern forming method including (1) a step of forming a resist underlayer film on a substrate to be processed, (2) a step of forming a resist film on the resist underlayer film, using a resist composition containing (A) a resin having a repeating unit containing a Si atom, and (B) a compound which generates an acid upon irradiation with actinic rays or radiation, (3) a step of exposing the resist film, (4) a step of developing the exposed resist film using a developer including an organic solvent, thereby forming a negative tone resist pattern, and (5) a step of processing the resist underlayer film and the substrate to be processed, using the resist pattern as a mask, thereby forming a pattern, in which the content of the resin (A) is 20% by mass or more with respect to the total solid content of the resist composition.
    Type: Application
    Filed: December 21, 2017
    Publication date: May 3, 2018
    Applicant: FUJIFILM Corporation
    Inventors: Michihiro SHIRAKAWA, Keiyu OU, Naoya HATAKEYAMA, Akiyoshi GOTO, Keita KATO, Takashi YAKUSHIJI, Tadashi OMATSU
  • Publication number: 20170197390
    Abstract: In a gas barrier film having a laminated structure of an organic layer and an inorganic layer, an identification mark is formed on a forming surface of the organic layer. Accordingly, the gas barrier film having the laminated structure of the organic layer and the inorganic layer includes the identification mark which is used for preparing an electronic device, or the like, and can prevent a breakage of the inorganic layer due to the identification mark.
    Type: Application
    Filed: March 24, 2017
    Publication date: July 13, 2017
    Applicant: FUJIFILM Corporation
    Inventor: Takashi YAKUSHIJI