Takatoshi Iida has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
Abstract: An ointment containing a compound represented by formula (I): [wherein R1 represents any group of a group represented by the formula: —(CH2)4—S—CH2—CO2H, a group represented by the formula: —(CH2)4—S—CH2—CO2CH3, a group represented by the formula: —(CH2)4—C?C—CO2H, a group represented by the formula: —CH2—S—(CH2)2—S—CH2—CO2H, and a group represented by the formula: —CH2—S—(CH2)4—CO2H], and an oleaginous base, is an ointment containing a compound which is effective for atopic symptoms, and is an ointment having low skin irritancy and excellent storage stability, thus, can be used as a pharmaceutical product effective for the pruritus caused by atopy or the like.
Abstract: An ointment containing a compound represented by formula (I): [wherein R1 represents any group of a group represented by the formula: —(CH2)4—S—CH2—CO2H, a group represented by the formula: —(CH2)4—S—CH2—CO2CH3, a group represented by the formula: —(CH2)4—C?C—CO2H, a group represented by the formula: —CH2—S—(CH2)2—S—CH2—CO2H, and a group represented by the formula: —CH2—S—(CH2)4—CO2H], and an oleaginous base, is an ointment containing a compound which is effective for atopic symptoms, and is an ointment having low skin irritancy and excellent storage stability, thus, can be used as a pharmaceutical product effective for the pruritus caused by atopy or the like.
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