Abstract: A power steering system, which is disposed in the forward part of a vehicle, allows an electric motor to boost the steering torque applied by a driver, and transmits the steering torque to wheels via a steering transmission mechanism. The power steering system includes an impact detection device that detects the impact of an object on a rack housing that houses a rack bar constituting the steering transmission mechanism to detect the impact on the power steering system more accurately.

Abstract: A liquid-applying device is provided, which does not allow the contents to touch the skin of the head when the contents are applied to the hair. The volume of liquid to be discharged from this device can be controlled. The comb attachment is small and can be dismounted. After the use, inside flow passage can be closed. Even if this device is used with a tubular container having the force of recovery, the container is prevented from taking in outside air (oxygen, etc.), and thus, is protected against dust and/or bacteria in the air. The liquid-applying device comprises a tubular container, a connecting/discharging unit, and a comb attachment. The connecting/discharging unit has a cylindrical passage and a fitting cylinder that can be fitted to the neck of the tubular container. The comb attachment comprises a comb shaft fitted detachably to the connecting/discharging unit and a row of teeth disposed along one side of the comb shaft and extending laterally.

Abstract: An exhaust system for an internal combustion engine having a plurality of cylinders is disclosed. The exhaust system comprises a plurality of exhaust branch passages, an intermediate exhaust pipe section, a partition plate and a downstream pipe section. Each exhaust branch passage is in communication with a respective cylinder. The intermediate exhaust pipe section forms a passage that is in communication with the exhaust branch passages. The partition plate is provided in the intermediate passage and divides the intermediate passage into first and second flow paths. The partition plate further includes a projection positioned on a first surface thereof that is oriented so as to be generally perpendicular to the direction of exhaust flow. The partition plate is disposed within the intermediate passage so as to position the projection in the first flow path.

Abstract: A liquid-applying device is provided, which does not allow the contents to touch the skin of the head when the contents are applied to the hair. The volume of liquid to be discharged from this device can be controlled. The comb attachment is small and can be dismounted. After the use, inside flow passage can be closed. Even if this device is used with a tubular container having the force of recovery, the container is prevented from taking in outside air (oxygen, etc.), and thus, is protected against dust and/or bacteria in the air. The liquid-applying device comprises a tubular container, a connecting/discharging unit, and a comb attachment. The connecting/discharging unit has a cylindrical passage and a fitting cylinder that can be fitted to the neck of the tubular container. The comb attachment comprises a comb shaft fitted detachably to the connecting/discharging unit and a row of teeth disposed along one side of the comb shaft and extending laterally.

Abstract: A catalytic converter comprising a catalyst carrier, a casing accommodating therewithin the catalyst carrier, a catalyst mat interposed between the catalyst carrier and the casing, and an annular stopper at an end of the catalyst carrier, wherein the catalyst mat has an extension portion compressed between the casing and the stopper for holding the stopper in place within the casing. A method of making a catalytic converter is also provided.

Abstract: The present invention, there is provided a liquid applicator in which an application member is attached to a mouth portion of a container in order to apply contents such as cosmetics, chemicals or the like. The mouth portion of the container has a barrel part formed with threads. The container mouth portion is fitted therein with an inner plug formed therein with a passage hole communicated with the inside of the container. The application member includes a discharge barrel for opening and closing the passage hole in the inner plug, an application element holder fitted therein with the discharge barrel and holding an application element, and an attachment cap formed with threads adapted to be threadedly engaged with the thread of the barrel part.

Abstract: The present invention, there is provided a liquid applicator in which an application member is attached to a mouth portion of a container in order to apply contents such as cosmetics, chemicals or the like. The mouth portion of the container has a barrel part formed with threads. The container mouth portion is fitted therein with an inner plug formed therein with a passage hole communicated with the inside of the container. The application member includes a discharge barrel for opening and closing the passage hole in the inner plug, an application element holder fitted therein with the discharge barrel and holding an application element, and an attachment cap formed with threads adapted to be threadedly engaged with the thread of the barrel part.

Abstract: Disclosed herein is a polishing device including a polishing plate having an upper surface on which a polishing pad is attached, a polishing head having a lower surface opposed to an upper surface of the polishing pad on the polishing plate, for holding a substrate to be polished on the lower surface, and a pressure source for applying a polishing pressure to the polishing head, whereby the substrate held by the polishing head is pressed against the upper surface of the polishing pad under the polishing pressure applied from the pressure source to perform polishing of the substrate. The polishing head is provided with a contact pressure adjusting mechanism capable of adjusting an in-plane contact pressure of the substrate against the upper surface of the polishing pad on the polishing plate at every area of the substrate. Accordingly, the uniformity and the planarity in the plane of the substrate surface to be polished can be improved with a high throughput.

Abstract: Disclosed herein is a polishing device including a polishing plate having an upper surface on which a polishing pad is attached, a polishing head having a lower surface opposed to an upper surface of the polishing pad on the polishing plate, for holding a substrate to be polished on the lower surface, and a pressure source for applying a polishing pressure to the polishing head, whereby the substrate held by the polishing head is pressed against the upper surface of the polishing pad under the polishing pressure applied from the pressure source to perform polishing of the substrate. The polishing head is provided with a contact pressure adjusting mechanism capable of adjusting an in-plane contact pressure of the substrate against the upper surface of the polishing pad on the polishing plate at every area of the substrate. Accordingly, the uniformity and the planarity in the plane of the substrate surface to be polished can be improved with a high throughput.

Abstract: Disclosed herein is a polishing including a polishing plate having an upper surface on which a polishing pad is attached, a polishing head having a lower surface opposed to an upper surface of the polishing pad on the polishing plate, for holding a substrate to be polished on the lower surface, and a pressure source for applying a polishing pressure to the polishing head, whereby the substrate held by the polishing head is pressed against the upper surface of the polishing pad under the polishing pressure applied from the pressure source to perform polishing of the substrate. The polishing head is provided with a contact pressure adjusting mechanism capable of adjusting an in-plane contact pressure of the substrate against the upper surface of the polishing pad on the polishing plate at every area of the substrate. Accordingly, the uniformity and the planarity in the plane of the substrate surface to be polished can be improved with a high throughput.