Patents by Inventor Takatsugu Kawano

Takatsugu Kawano has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9612532
    Abstract: Provided is a photosensitive coloring composition of the present invention including a polymerization initiator (a) with an absorption coefficient at 365 nm in methanol of 1.0×103 mL/gcm or more, a polymerization initiator (b) with an absorption coefficient at 365 nm in methanol of 1.0×102 mL/gcm or less and an absorption coefficient at 254 nm in methanol of 1.0×103 mL/gcm or more, a compound (c) which has an unsaturated double bond, an alkali-soluble resin (d), and a coloring material (e), in which, in the total solid content of the photosensitive coloring composition, the content of the polymerization initiator (a) is 1.5 mass % to 10 mass % and the content of the polymerization initiator (b) is 1.5 mass % to 7.5 mass %.
    Type: Grant
    Filed: January 28, 2016
    Date of Patent: April 4, 2017
    Assignee: FUJIFILM Corporation
    Inventors: Yoshinori Taguchi, Kazuya Oota, Takatsugu Kawano
  • Publication number: 20160355705
    Abstract: A laminate for a touch panel includes a resin substrate which has a thermal expansion factor of 2 ppm/° C. to 200 ppm/° C.; a conductive portion which is arranged on the resin substrate, and has a mesh pattern formed of a plurality of metal thin wires; and an adhesive layer which is arranged to cover a surface of the resin substrate on the conductive portion side and the conductive portion, in which thermal stress obtained by a predetermined expression is less than or equal to 1,800 Pa, and peeling strength of the adhesive layer with respect to the resin substrate under an environment of a temperature of 85° C. and humidity of 85% is greater than or equal to 0.40 N/25 mm.
    Type: Application
    Filed: August 19, 2016
    Publication date: December 8, 2016
    Applicant: FUJIFILM Corporation
    Inventors: Takatsugu KAWANO, Yohei ISHIJI, Yuya YAMAMOTO
  • Publication number: 20160139505
    Abstract: Provided is a photosensitive coloring composition of the present invention including a polymerization initiator (a) with an absorption coefficient at 365 nm in methanol of 1.0×103 mL/gcm or more, a polymerization initiator (b) with an absorption coefficient at 365 nm in methanol of 1.0×102 mL/gcm or less and an absorption coefficient at 254 nm in methanol of 1.0×103 mL/gcm or more, a compound (c) which has an unsaturated double bond, an alkali-soluble resin (d), and a coloring material (e), in which, in the total solid content of the photosensitive coloring composition, the content of the polymerization initiator (a) is 1.5 mass % to 10 mass % and the content of the polymerization initiator (b) is 1.5 mass % to 7.5 mass %.
    Type: Application
    Filed: January 28, 2016
    Publication date: May 19, 2016
    Applicant: FUJIFILM Corporation
    Inventors: Yoshinori TAGUCHI, Kazuya OOTA, Takatsugu KAWANO
  • Patent number: 8293846
    Abstract: A composition including a polymer, the polymer having a non-dissociative functional group that interacts with a plating catalyst or a precursor thereof, a radical polymerizable group, and an ionic polar group; a method of producing a metal pattern material using the same: and a metal pattern material produced by the method.
    Type: Grant
    Filed: July 21, 2009
    Date of Patent: October 23, 2012
    Assignee: FUJIFILM Corporation
    Inventors: Takeyoshi Kano, Masataka Sato, Takatsugu Kawano
  • Publication number: 20110104454
    Abstract: The present invention provide a composition for forming a layer to be plated, including a solution in which from 1% by mass to 20% by mass of a polymer having a functional group that forms an interaction with a plating catalyst or a precursor thereof and a radical polymerizable group, and a water-insoluble photopolymerization initiator are dissolved in a mixed solvent comprising from 20% by mass to 99% by mass of a water-soluble flammable liquid and water; a method of producing a metal pattern material using the composition for forming a layer to be plated; and a metal pattern material produced by the method.
    Type: Application
    Filed: October 25, 2010
    Publication date: May 5, 2011
    Applicant: FUJIFILM CORPORATION
    Inventors: Takatsugu KAWANO, Takeyoshi KANO
  • Publication number: 20100080964
    Abstract: A composition including a polymer, the polymer having a non-dissociative functional group that interacts with a plating catalyst or a precursor thereof, a radical polymerizable group, and an ionic polar group; a method of producing a metal pattern material using the same: and a metal pattern material produced by the method.
    Type: Application
    Filed: July 21, 2009
    Publication date: April 1, 2010
    Applicant: FUJIFILM CORPORATION
    Inventors: Takeyoshi KANO, Masataka SATO, Takatsugu KAWANO
  • Patent number: 3939279
    Abstract: A feed comprising a culture product of strains of marine or halophilic yeasts in which the COD rising index of the strain is not more than 150 and the RNA excretion rate is not more than 20% in a medium containing waste molasses and an inorganic nitrogen compound, and a method for cultivating aquianimals with the feed. Typical example of the yeasts is Torulopsis candida var. marina NRRL Y-7345. The feed is particularly useful for breeding, for example, Brachionus, Copepoda, Brine Shrimp and Stage of Zoea, Mysis and Post Larva of shrimps.
    Type: Grant
    Filed: June 27, 1973
    Date of Patent: February 17, 1976
    Assignee: Asahi Kasei Kogyo Kabushiki Kaisha
    Inventors: Takatsugu Kawano, Hiroshige Kojima, Hiroshi Ohosawa, Kazuto Morinaga