Patents by Inventor Takatsugu Yoshida

Takatsugu Yoshida has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Exposure system and method of manufacturing a semiconductor device
    Patent number: 8081292
    Abstract: In an exposure system and semiconductor device manufacturing method relating to the present invention, an image of spatial image mark body through a reduction projection lens is projected onto a spatial image projection plate arranged on a wafer stage by irradiating the spatial image mark body arranged on a reticle stage with an exposure light. The spatial image mark body has a plurality of spatial image marks arranged in a same plane. At projection positions of images of each spatial image mark on the spatial image projection plate, spatial image openings are equipped with differing positions in an optical axis direction of the exposure light. A focus curve with a single exposure can be obtained, without moving the wafer stage in the optical axis direction, by respective measurements of optical intensities of images of each spatial image mark through each opening thereby enabling to calculate the best focus position.
    Type: Grant
    Filed: September 9, 2008
    Date of Patent: December 20, 2011
    Assignee: Panasonic Corporation
    Inventors: Katsuhiro Nishino, Takatsugu Yoshida
  • EXPOSURE SYSTEM AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
    Publication number: 20090073409
    Abstract: In an exposure system and semiconductor device manufacturing method relating to the present invention, an image of spatial image mark body through a reduction projection lens is projected onto a spatial image projection plate arranged on a wafer stage by irradiating the spatial image mark body arranged on a reticle stage with an exposure light. The spatial image mark body has a plurality of spatial image marks arranged in a same plane. At projection positions of images of each spatial image mark on the spatial image projection plate, spatial image openings are equipped with differing positions in an optical axis direction of the exposure light. A focus curve with a single exposure can be obtained, without moving the wafer stage in the optical axis direction, by respective measurements of optical intensities of images of each spatial image mark through each opening thereby enabling to calculate the best focus position.
    Type: Application
    Filed: September 9, 2008
    Publication date: March 19, 2009
    Inventors: Katsuhiro Nishino, Takatsugu Yoshida
  • Planetarium or similar article
    Patent number: D294715
    Type: Grant
    Filed: September 27, 1985
    Date of Patent: March 15, 1988
    Assignee: Minolta Camera Kabushiki Kaisha
    Inventors: Masamitsu Hattori, Kenji Shiba, Takatsugu Yoshida