Patents by Inventor Takaya Maehashi

Takaya Maehashi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10414918
    Abstract: A method for preparing a polymer compound including copolymerizing a monomer (m0-1) and a monomer (m0-2) to obtain a first polymer compound and causing the first polymer compound and an acid component to react with each other to obtain a second polymer compound. In the formulae, R1 and R2 are each a hydrogen atom, an alkyl group having 1 to 5 carbon atoms and a halogenated alkyl group having 1 to 5 carbon atoms, Va01 is a divalent hydrocarbon group which may have an ether bond, na01 is an integer of 0 to 2, Ra10 is a tertiary alkyl ester-type acid dissociable group, Va02 is a divalent linking group containing a heteroatom, or a single bond, Ra07 is a monovalent organic group, na021 is an integer of 0 to 3, Ra20 is an acid dissociable group, and na022 is an integer of 1 to 3.
    Type: Grant
    Filed: July 5, 2017
    Date of Patent: September 17, 2019
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Yoshitaka Komuro, Masatoshi Arai, Koshi Onishi, KhanhTin Nguyen, Masahiro Shiosaki, Takuya Ikeda, Takaya Maehashi
  • Patent number: 10295905
    Abstract: A resist composition which generates an acid upon exposure and whose solubility on a developing solution changes under the action of the acid, including a polymer compound having units represented by formulas (a0-1), (a0-2), and (a0-3) in an amount of 0 to 10 mol %. In the formulas, R is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms, Va01 and Va03 are a divalent hydrocarbon group, na01 and na03 each are an integer of 0 to 2, Ra0? is a specific acid dissociable group, Va02 is a divalent linking group containing a hetero atom or a single bond, Ra07 is a monovalent organic group, na021 is an integer of 0 to 3, and na022 is an integer of 1 to 3.
    Type: Grant
    Filed: July 17, 2017
    Date of Patent: May 21, 2019
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Yoshitaka Komuro, Masatoshi Arai, Koshi Onishi, KhanhTin Nguyen, Takaya Maehashi
  • Patent number: 10179866
    Abstract: A resin composition for forming a phase-separated structure, including: a block copolymer, and an ion liquid containing a compound (IL) having a cation moiety and an anion moiety, the cation moiety of the compound (IL) having a dipole moment of 3 debye or more.
    Type: Grant
    Filed: February 18, 2016
    Date of Patent: January 15, 2019
    Assignees: TOKYO OHKA KOGYO CO., LTD., THE UNIVERSITY OF CHICAGO
    Inventors: Akiya Kawaue, Takehiro Seshimo, Takaya Maehashi, Tasuku Matsumiya, Ken Miyagi, Hitoshi Yamano, Xuanxuan Chen, Paul Franklin Nealey
  • Publication number: 20180149973
    Abstract: A resist composition including a base component which exhibits changed solubility in a developing solution under action of acid, and a compound (B1) having an anion moiety and a cation moiety and being represented by general formula (b1) (wherein R01 to R014 each independently represents a hydrogen atom or a hydrocarbon group which may have a substituent, or two or more of R01 to R014 may be mutually bonded to form a ring structure, provided that at least two of R01 to R014 are mutually bonded to form a ring structure, and at least one of R01 to R014 has an anion group, and the anion moiety as a whole forms an anion having a valency of n; n represents an integer of 1 or more; represents an integer of 1 or more; and Mm+ represents an organic cation having a valency of m).
    Type: Application
    Filed: November 27, 2017
    Publication date: May 31, 2018
    Inventors: Masatoshi ARAI, Takaya MAEHASHI, Takuya IKEDA
  • Publication number: 20180072564
    Abstract: A resin composition for forming a phase-separated structure includes a block copolymer having a block (b1) having a repeating structure of styrene units; a block (b2) having a repeating structure of methyl methacrylate units partially substituted with a constituent unit represented by general formula (h1); and a number average molecular weight of less than 28,000. In general formula (h1), Rh0 is a hydrophilic functional group.
    Type: Application
    Filed: July 18, 2017
    Publication date: March 15, 2018
    Inventors: Ken MIYAGI, Takehiro SESHIMO, Takaya MAEHASHI, Takahiro DAZAI, Hitoshi YAMANO, Toshifumi SATOH, Takuya ISONO
  • Patent number: 9914847
    Abstract: A resin composition for forming a phase-separated structure, including: a block copolymer, and an ion liquid containing a compound (IL) having a cation moiety and an anion moiety, the energy of the LUMO of the cation moiety being ?4.5 eV or more, and the energy difference between the LUMO and the HOMO of the cation moiety being 10.0 ev or more, or the Log P value of the anion moiety being 1 to 3.
    Type: Grant
    Filed: June 17, 2016
    Date of Patent: March 13, 2018
    Assignees: TOKYO OHKA KOGYO CO., LTD., THE UNIVERSITY OF CHICAGO
    Inventors: Akiya Kawaue, Takehiro Seshimo, Takaya Maehashi, Tasuku Matsumiya, Ken Miyagi, Hitoshi Yamano, Xuanxuan Chen, Paul Franklin Nealey
  • Publication number: 20180024433
    Abstract: A resist composition which generates an acid upon exposure and whose solubility on a developing solution changes under the action of the acid, including a polymer compound having units represented by formulas (a0-1), (a0-2), and (a0-3) in an amount of 0 to 10 mol %. In the formulas, R is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms, Va01 and Va03 are a divalent hydrocarbon group, na01 and na03 each are an integer of 0 to 2, Ra0? is a specific acid dissociable group, Va02 is a divalent linking group containing a hetero atom or a single bond, Ra07 is a monovalent organic group, na021 is an integer of 0 to 3, and na022 is an integer of 1 to 3.
    Type: Application
    Filed: July 17, 2017
    Publication date: January 25, 2018
    Inventors: Yoshitaka KOMURO, Masatoshi ARAI, Koshi ONISHI, KhanhTin NGUYEN, Takaya MAEHASHI
  • Publication number: 20180022916
    Abstract: A method for preparing a polymer compound including copolymerizing a monomer (m0-1) and a monomer (m0-2) to obtain a first polymer compound and causing the first polymer compound and an acid component to react with each other to obtain a second polymer compound. In the formulae, R1 and R2 are each a hydrogen atom, an alkyl group having 1 to 5 carbon atoms and a halogenated alkyl group having 1 to 5 carbon atoms, Va01 is a divalent hydrocarbon group which may have an ether bond, na01 is an integer of 0 to 2, Ra10 is a tertiary alkyl ester-type acid dissociable group, Va02 is a divalent linking group containing a heteroatom, or a single bond, Ra07 is a monovalent organic group, na021 is an integer of 0 to 3, Ra20 is an acid dissociable group, and na022 is an integer of 1 to 3.
    Type: Application
    Filed: July 5, 2017
    Publication date: January 25, 2018
    Inventors: Yoshitaka KOMURO, Masatoshi ARAI, Koshi ONISHI, KhanhTin NGUYEN, Masahiro SHIOSAKI, Takuya IKEDA, Takaya MAEHASHI
  • Publication number: 20170362460
    Abstract: A resin composition for forming a phase-separated structure, including: a block copolymer, and an ion liquid containing a compound (IL) having a cation moiety and an anion moiety, the energy of the LUMO of the cation moiety being ?4.5 eV or more, and the energy difference between the LUMO and the HOMO of the cation moiety being 10.0 ev or more, or the Log P value of the anion moiety being 1 to 3.
    Type: Application
    Filed: June 17, 2016
    Publication date: December 21, 2017
    Inventors: Akiya KAWAUE, Takehiro SESHIMO, Takaya MAEHASHI, Tasuku MATSUMIYA, Ken MIYAGI, Hitoshi YAMANO, Xuanxuan CHEN, Paul Franklin NEALEY
  • Patent number: 9828519
    Abstract: A resin composition for forming a phase-separated structure, including a block copolymer, and an ion liquid containing a compound having a cation moiety and an anion moiety, the anion moiety being represented by general formula (a1), (a2) or (a3), in which X? represents an alkylene group of 2 to 6 carbon atoms in which at least one hydrogen atom is substituted with a fluorine atom; Y? and Z? each independently represents an alkyl group of 1 to 10 carbon atoms in which at least one hydrogen atom is substituted with a fluorine atom; R? represents an alkyl group of 1 to 5 carbon atoms in which at least one hydrogen atom is optionally substituted with a fluorine atom, m represents an integer of 1 to 6, and n represents an integer of 0 to 5, provided that m+n=6.
    Type: Grant
    Filed: February 18, 2016
    Date of Patent: November 28, 2017
    Assignees: TOKYO OHKA KOGYO CO., LTD., THE UNIVERSITY OF CHICAGO
    Inventors: Akiya Kawaue, Takehiro Seshimo, Takaya Maehashi, Tasuku Matsumiya, Ken Miyagi, Hitoshi Yamano, Xuanxuan Chen, Paul Franklin Nealey
  • Patent number: 9776208
    Abstract: A brush composition used for phase-separation of a layer containing a block copolymer having plural kinds of blocks bonded formed on a substrate, the brush composition including a resin component, the resin component having a structural unit (u1) represented by genera formula (u1-1), and having a hydroxy group on at least one terminal portion of the main chain thereof: in formula (u1-1), R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; R1 represents a halogen atom, or a linear, branched or cyclic hydrocarbon group of 1 to 20 carbon atoms optionally containing an oxygen atom, a halogen atom or a silicon atom, or a combination of the linear, branched or cyclic hydrocarbon group; and p represents an integer of 1 to 5.
    Type: Grant
    Filed: December 3, 2015
    Date of Patent: October 3, 2017
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Masahito Yahagi, Takaya Maehashi, Akiya Kawaue, Issei Suzuki, Tasuku Matsumiya, Tsuyoshi Kurosawa, Hitoshi Yamano
  • Publication number: 20170240766
    Abstract: A resin composition for forming a phase-separated structure, including: a block copolymer, and an ion liquid containing a compound (IL) having a cation moiety and an anion moiety, the cation moiety of the compound (IL) having a dipole moment of 3 debye or more.
    Type: Application
    Filed: February 18, 2016
    Publication date: August 24, 2017
    Inventors: Akiya KAWAUE, Takehiro SESHIMO, Takaya MAEHASHI, Tasuku MATSUMIYA, Ken MIYAGI, Hitoshi YAMANO, Xuanxuan CHEN, Paul Franklin NEALEY
  • Publication number: 20170240767
    Abstract: A resin composition for forming a phase-separated structure, including a block copolymer, and an ion liquid containing a compound having a cation moiety and an anion moiety, the anion moiety being represented by general formula (a1), (a2) or (a3), in which X? represents an alkylene group of 2 to 6 carbon atoms in which at least one hydrogen atom is substituted with a fluorine atom; Y? and Z? each independently represents an alkyl group of 1 to 10 carbon atoms in which at least one hydrogen atom is substituted with a fluorine atom; R? represents an alkyl group of 1 to 5 carbon atoms in which at least one hydrogen atom is optionally substituted with a fluorine atom, m represents an integer of 1 to 6, and n represents an integer of 0 to 5, provided that m+n=6.
    Type: Application
    Filed: February 18, 2016
    Publication date: August 24, 2017
    Inventors: Akiya KAWAUE, Takehiro SESHIMO, Takaya MAEHASHI, Tasuku MATSUMIYA, Ken MIYAGI, Hitoshi YAMANO, Xuanxuan CHEN, Paul Franklin NEALEY
  • Patent number: 9644110
    Abstract: A method of producing a structure containing a phase-separated structure, including forming a layer containing a block copolymer on a substrate; applying a top coat material to the layer containing the block copolymer to form a top coat film; and subjecting the layer including the block copolymer having the top coat film formed thereon to annealing treatment so as to conduct a phase separation of the layer, the top coat material including an organic solvent component and a polymeric compound containing a structural unit having either a dicarboxylic acid or a salt of a dicarboxylic acid, and the organic solvent component containing water and an alcohol having 3 or more carbon atoms.
    Type: Grant
    Filed: March 31, 2015
    Date of Patent: May 9, 2017
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Takehiro Seshimo, Takaya Maehashi, Takahiro Dazai, Yoshiyuki Utsumi
  • Patent number: 9567477
    Abstract: An undercoat agent used for phase separating a layer containing a block copolymer having a block of a structural unit derived from an (?-substituted) acrylate ester on a substrate, and which contains a resin component including a structural unit represented by formula (ba0-1), and/or a structural unit represented by formula (ba0-2), and a structural unit (ba0-3) having a substrate interacting group, wherein R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms, R1 and R2 represent a halogen atom or an organic group of 1 to 20 carbon atoms which may contain an oxygen atom, a halogen atom, or a silicon atom, and n is 1 to 5.
    Type: Grant
    Filed: July 7, 2014
    Date of Patent: February 14, 2017
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Takehiro Seshimo, Tasuku Matsumiya, Takaya Maehashi, Takahiro Dazai, Yoshiyuki Utsumi
  • Patent number: 9557647
    Abstract: A resist composition including a base component which exhibits changed solubility in a developing solution under action of acid and an acid generator which generates acid upon exposure, the base component containing a polymeric compound containing a structural unit represented by general formula (a0-1) and the acid generator containing a compound represented by general formula (b1). In the formulae, R represents H, an alkyl group of C1 to 5 or a halogenated alkyl group of C1 to 5; Ya1 represents a single bond or a divalent linking group; La1 and La2 represents —SO2— or —C(?O)—; Ra1 represents a cyclic group which may have a substituent and the like; n1 and n2 represents 0 or 1; R11 represents a cyclic group of C5 to 30 which may have a substituent; V11 represents a single bond or an alkylene group of C1 to 6; L11 represents an ester bond; Y11 represents an alkylene group of C1 to 5 which may have a fluorine atom; m represents an integer of 1 or more; and Mm+ represents an organic cation having a valency of m.
    Type: Grant
    Filed: April 22, 2014
    Date of Patent: January 31, 2017
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Yoshitaka Komuro, Takaya Maehashi, Takashi Nagamine
  • Patent number: 9442371
    Abstract: A method of producing a structure containing a phase-separated structure, including a step in which a layer including an Si-containing block copolymer having a plurality of blocks bonded is formed between guide patterns on a substrate; a step in which a solution of a top coat material is applied to the layer and the guide patterns so as to form a top coat film; and a step in which the layer including the Si-containing block copolymer and having the top coat film formed thereon is subjected to annealing treatment so as to conduct a phase separation of the layer; in which a solvent of the solution of the top coat material contains no basic substance.
    Type: Grant
    Filed: January 22, 2015
    Date of Patent: September 13, 2016
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Takehiro Seshimo, Takaya Maehashi, Takahiro Dazai, Yoshiyuki Utsumi, Tasuku Matsumiya, Ken Miyagi, Daiju Shiono, Tsuyoshi Kurosawa
  • Publication number: 20160194751
    Abstract: A brush composition used for phase-separation of a layer containing a block copolymer having plural kinds of blocks bonded formed on a substrate, the brush composition including a resin component, the resin component having a structural unit (u1) represented by genera formula (u1-1), and having a hydroxy group on at least one terminal portion of the main chain thereof: in formula (u1-1), R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; R1 represents a halogen atom, or a linear, branched or cyclic hydrocarbon group of 1 to 20 carbon atoms optionally containing an oxygen atom, a halogen atom or a silicon atom, or a combination of the linear, branched or cyclic hydrocarbon group; and p represents an integer of 1 to 5.
    Type: Application
    Filed: December 3, 2015
    Publication date: July 7, 2016
    Inventors: Masahito YAHAGI, Takaya MAEHASHI, Akiya KAWAUE, Issei SUZUKI, Tasuku MATSUMIYA, Tsuyoshi KUROSAWA, Hitoshi YAMANO
  • Patent number: 9206307
    Abstract: A method of producing a structure containing a phase-separated structure, including: forming a layer including a neutralization film on a substrate; forming a layer containing a block copolymer on the layer including the neutralization film, the PA block and PB block being mutually bonded in the block copolymer, and the PB block including a structural unit other than a structural unit constituting the PA block; and subjecting the layer containing the block copolymer to an annealing treatment, such that, in the case where a surface free energy of the PA block, a surface free energy of the PB block and a surface free energy of the neutralization film are represented by a coordinate point A of the PA block, a coordinate point B of the PB block and a coordinate point N of the neutralization film, respectively in the plane of coordinates, the coordinate point N of the neutralization film is within the predetermined range.
    Type: Grant
    Filed: July 30, 2014
    Date of Patent: December 8, 2015
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Tasuku Matsumiya, Takehiro Seshimo, Ken Miyagi, Takaya Maehashi, Takahiro Dazai, Yoshiyuki Utsumi
  • Patent number: 9188869
    Abstract: A method of forming a structure containing a phase-separated structure, the method including: a step of forming a layer containing a block copolymer having a plurality of blocks bonded and a purity of 98% or more, and a step of phase-separating the layer containing the block copolymer.
    Type: Grant
    Filed: July 29, 2014
    Date of Patent: November 17, 2015
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Takehiro Seshimo, Takahiro Dazai, Takaya Maehashi, Ken Miyagi, Yoshiyuki Utsumi