Patents by Inventor Takayasu Komatsu

Takayasu Komatsu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Shadow mask for a cathode ray tube
    Patent number: 6922010
    Abstract: The present invention provides a shadow mask having an improved resistance to an impact such as vibration or dropping so as to keep a constant quality of a color cathode-ray tube.
    Type: Grant
    Filed: September 26, 2001
    Date of Patent: July 26, 2005
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Takayasu Komatsu, Hirofumi Hideshima, Akira Makita, Yutaka Matsumoto, Takuya Ogio
  • Shadow mask, plate member therefor and method of manufacturing shadow mask
    Patent number: 6722938
    Abstract: A shadow mask is formed from a plate member comprising an outer frame portion, a body portion of a shadow mask having an outer peripheral line formed through an etching process and a plurality of connection portions through which the body portion of the shadow mask is supported by the outer frame portion. The shadow mask is formed from the plate member by removing the outer frame portion from the body portion of the shadow mask. In this process, a break portion is formed to the shadow mask by removing the outer frame portion so as to be recessed inward from the outer peripheral line of the shadow mask.
    Type: Grant
    Filed: September 5, 2000
    Date of Patent: April 20, 2004
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Takayasu Komatsu, Hiromitsu Ochiai, Akira Makita, Hirofumi Hideshima, Takuya Ogio, Toshimu Watanabe
  • Etching substrate material, etching process and article obtained by etching
    Publication number: 20040018372
    Abstract: A process of forming a high-definition pattern by etching is provided. A photosensitive resin layer is formed on a metal substrate material having a center line-average surface roughness Ra of up to 0.10 &mgr;m and a maximum surface roughness Rmax of up to 1.0 &mgr;m to form a resist pattern. Then, the photosensitive resin layer provided on the metal substrate material is exposed to light to form a resist pattern. Finally, etching is carried out to form a pattern on the metal substrate material.
    Type: Application
    Filed: July 18, 2003
    Publication date: January 29, 2004
    Applicant: DAI NIPPON PRINTING CO., LTD.
    Inventors: Takayasu Komatsu, Daisuke Hashimoto, Akira Makita, Koji Fujiyama
  • Etching substrate material, etching process, and article obtained by etching
    Patent number: 6620554
    Abstract: A process of forming a high-definition pattern by etching is provided. A photosensitive resin layer is formed on a metal substrate material having a center line-average surface roughness Ra of up to 0.10 &mgr;m and a maximum surface roughness Rmax of up to 1.0 &mgr;m to form a resist pattern. Then, the photosensitive resin layer provided on the metal substrate material is exposed to light to form a resist pattern. Finally, etching is carried out to form a pattern on the metal substrate material.
    Type: Grant
    Filed: November 12, 1998
    Date of Patent: September 16, 2003
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Takayasu Komatsu, Daisuke Hashimoto, Akira Makita, Koji Fujiyama
  • Shadow mask
    Publication number: 20020036456
    Abstract: The present invention provides a shadow mask having an improved resistance to an impact such as vibration or dropping so as to keep a constant quality of a color cathode-ray tube.
    Type: Application
    Filed: September 26, 2001
    Publication date: March 28, 2002
    Inventors: Takayasu Komatsu, Hirofumi Hideshima, Akira Makita, Yutaka Matsumoto, Takuya Ogio
  • Liquid application method and application apparatus
    Patent number: 5965209
    Abstract: In an apparatus and method for forming an applied layer of a photosensitive resin on a large glass substrate for an LCD color filter, a substrate (S) is suctioned and held by a movable holder (8) with a main surface thereof to be processed oriented downward. The movable holder (8) is at an angle of inclination (.theta.) to the horizontal and is capable of moving along a guide rail (7). An application head (H) having an upward-pointing linear slit (13) through which an application liquid is supplied is provided below a region through which the substrate (S) moves supported by the holder (8). When the substrate (S) having a constant clearance (I.sub.2) with the application head (H) is moved diagonally upward, an application liquid bead (B) is formed between the slit (13) and the downward-pointing main surface of the substrate (S), by surface tension. The application liquid bead (B) is moved gradually diagonally downward along the main surface of the substrate to form an application layer (Ra). A meniscus (L.
    Type: Grant
    Filed: July 15, 1997
    Date of Patent: October 12, 1999
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Takayasu Komatsu, Shunji Miyakawa, Kazuo Watanabe